Patents by Inventor Michael Douglas Feit

Michael Douglas Feit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for deterministic control of surface figure during full aperture pad polishing
    Patent number: 9782871
    Abstract: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: October 10, 2017
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Tayyab Ishaq Suratwala, Michael Douglas Feit, William Augustus Steele
  • APPARATUS AND METHOD FOR DETERMINISTIC CONTROL OF SURFACE FIGURE DURING FULL APERTURE PAD POLISHING
    Publication number: 20170190016
    Abstract: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
    Type: Application
    Filed: October 16, 2013
    Publication date: July 6, 2017
    Inventors: Tayyab Ishaq Suratwala, Michael Douglas Feit, William Augustus Steele
  • APPARATUS AND METHOD FOR DETERMINISTIC CONTROL OF SURFACE FIGURE DURING FULL APERTURE PAD POLISHING
    Publication number: 20140335767
    Abstract: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
    Type: Application
    Filed: October 16, 2013
    Publication date: November 13, 2014
    Inventors: Tayyab Ishaq Suratwala, Michael Douglas Feit, William Augustus Steele