Abstract: A process chamber assembly for use with a substrate and a flow of process fluid includes a vessel and a spray member. The vessel defines a chamber. The spray member includes at least one spray port formed therein adapted to distribute the flow of process fluid onto the substrate in the chamber. The spray member is operative to rotate about a rotational axis relative to the vessel responsive to a flow of the process fluid out of the spray member through the at least one spray port.

Abstract: According to method embodiments of the present invention, a method for cleaning a microelectronic substrate includes placing the substrate in a pressure chamber. A process fluid including dense phase CO2 is circulated through the chamber such that the process fluid contacts the substrate. The phase of the CO2 is cyclically modulated during at least a portion of the step of circulating the process fluid.

Abstract: The present invention provides a method for the pumpless transfer of liquid carbon dioxide cleaning medium in a carbon dioxide dry cleaning apparatus having a wash vessel, a working vessel, a vapor vessel, and a compressor. The apparatus is preferably overpressurized with an overpressurization gas such as air.

Abstract: A method of cleaning and removing water, entrained solutes and particulate matter during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing a partially fabricated integrated circuit, MEM's device, or optoelectronic device having water and entrained solutes on the substrate; (b) providing a densified (e.g., liquid or supercritical) carbon dioxide cleaning composition, the cleaning composition comprising carbon dioxide and, optionally but preferably, a cleaning adjunct; (c) immersing the surface portion in the densified carbon dioxide drying composition, and subjecting the densified carbon dioxide drying composition to cyclical phase modulation during at least a portion of the immersing step to thereby facilitating cleaning; and then (d) removing the cleaning composition from the surface portion.

Abstract: A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon dioxide vapor in the vapor tank; and charging the wash tank with carbon dioxide vapor from the vapor tank. The method may be performed as part of a wash cycle that includes filling the wash tank with cleaning solution, washing articles to be cleaned in the wash tank, and emptying the cleaning solution out of the wash tank.

Abstract: A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon dioxide vapor in the vapor tank; and charging the wash tank with carbon dioxide vapor from the vapor tank. The method may be performed as part of a wash cycle that includes filling the wash tank with cleaning solution, washing articles to be cleaned in the wash tank, and emptying the cleaning solution out of the wash tank.

Abstract: A carbon dioxide dry cleaning apparatus and system for the control thereof is disclosed. The apparatus comprises a wash vessel, a working vessel containing a carbon dioxide cleaning medium and operatively associated with the wash vessel, a pump operatively associated with the wash vessel, a condenser connected to the working vessel, a still operatively associated with the working vessel (which still may be a separate still or incorporated into other system components as explained below), a compressor operatively associated with the wash vessel, and a pressure release valve operatively associated with said working vessel. At least one filter is included in the system, but the filter and still may be consolidated together in a single vessel.

Abstract: A mat is used as a ground engagement platform for supporting heavy equipment or as a road surface for supporting vehicular traffic. The use is intended to be temporary, with the mats being reusable. The mat, in its basic construction, includes a flat plate-like structure having a thickness and planar extent and an opening defined in the flat plate-like structure which extends in the thickness direction and is dimensioned to receive a lifting device for lifting and transporting the mat.