Patents by Inventor MICHAEL E. KHAU

MICHAEL E. KHAU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for drying a substrate
    Patent number: 8635784
    Abstract: In a first aspect, a method of drying at least a portion of a substrate located within a fluid is provided. The method includes contacting an edge of the substrate that is located within the fluid with a pusher pin. The pusher pin has (a) a shaft portion; and (b) a tip portion having a knife edge of a width of 0.42 inches or less, the tip portion adapted to contact and support the substrate with the knife edge. The method further includes lifting the substrate from the fluid with the pusher pin; and exposing the substrate to a drying vapor as the substrate is lifted from the fluid. Numerous other aspects are provided.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: January 28, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Gary C. Ettinger, Michael E. Khau, Ho Seon Shin
  • CMP PAD IDENTIFICATION AND LAYER RATIO MODELING
    Publication number: 20090305609
    Abstract: The present invention relates to methods and apparatus for improving productivity of chemical mechanical polishing (CMP) processes and lowering operating costs of CMP systems. Embodiments of the present invention provide a method for improving the ratio of the layer thickness of composite polishing pads for improved removal rates. Embodiments of the present also provide specific polishing pad identification for monitoring and controlling processes developed for the specific pad to improve overall productivity and reduce downtime of the CMP system.
    Type: Application
    Filed: June 3, 2009
    Publication date: December 10, 2009
    Applicant: APPLIED MATERIALS, INC.
    Inventors: MICHAEL E. KHAU, Nishal Shah, Ashish Bhatnagar