Patents by Inventor Michael E. Malinowski

Michael E. Malinowski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6847463
    Abstract: The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.
    Type: Grant
    Filed: June 5, 2002
    Date of Patent: January 25, 2005
    Assignee: EUV, LLC
    Inventor: Michael E. Malinowski
  • Patent number: 6734422
    Abstract: A portable device for detecting surface outgas contaminants of an article includes: (i) a portable housing that has a chamber which is in communication with a port that is adapted to be sealably attached to a surface of the article; (ii) a mass spectrometer that is coupled to the chamber for analyzing gaseous materials in the chamber; and (iii) means for generating a vacuum within the chamber thereby drawing outgas contaminants from the surface of the article into the chamber for analysis by the mass spectrometer. By performing a mass spectrometric analysis of the surface of interest and comparing the data with mass spectrometric data ascertained with the device from a clean surface, the type and amount of outgas contaminants, if any, can be determined.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: May 11, 2004
    Assignee: EUV LLC
    Inventors: Steven Julian Haney, Michael E. Malinowski
  • Publication number: 20030064161
    Abstract: A method for reducing carbon contamination of surfaces and particularly the surfaces of multilayer mirrors used for extreme ultraviolet (EUV) lithography by manipulating the surface electric phase field to reduce photoemission. Manipulation of the surface electric phase field can be by depositing a film, such as Si, or other low absorber of EUV radiation, to form a capping layer whose thickness is such that the near-surface electric field is a minimum. For extreme ultraviolet applications, where a multilayer Mo/Si mirror is used as a reflective optic, a capping layer of Si in the range of about 2-4 nm, and preferably 3 nm, is used.
    Type: Application
    Filed: July 17, 2002
    Publication date: April 3, 2003
    Inventor: Michael E. Malinowski
  • Publication number: 20020134934
    Abstract: A portable device for detecting surface outgas contaminants of an article includes: (i) a portable housing that has a chamber which is in communication with a port that is adapted to be sealably attached to a surface of the article; (ii) a mass spectrometer that is coupled to the chamber for analyzing gaseous materials in the chamber; and (iii) means for generating a vacuum within the chamber thereby drawing outgas contaminants from the surface of the article into the chamber for analysis by the mass spectrometer. By performing a mass spectrometric analysis of the surface of interest and comparing the data with mass spectrometric data ascertained with the device from a clean surface, the type and amount of outgas contaminants, if any, can be determined.
    Type: Application
    Filed: March 21, 2001
    Publication date: September 26, 2002
    Inventors: Steven Julian Haney, Michael E. Malinowski