Patents by Inventor MICHAEL EIDENBERGER-SCHOBER

MICHAEL EIDENBERGER-SCHOBER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11925984
    Abstract: A powder-metallurgical sintered molybdenum part which is present as a solid body has the following composition: a molybdenum content of ?99.93% by weight, a boron content “B” of ?3 ppmw and a carbon content “C” of ?3 ppmw, with a total content “BaC” of carbon and boron being in a range of 15 ppmw?“BaC”?50 ppmw, an oxygen content “O” in a range of 3 ppmw?“O”?20 ppmw, a maximum tungsten content of ?330 ppmw and a maximum proportion of other impurities of ?300 ppmw. A powder-metallurgical process for producing such a sintered molybdenum part is also provided.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: March 12, 2024
    Assignee: Plansee SE
    Inventors: Karl Huber, Michael O'Sullivan, Michael Eidenberger-Schober, Robert Storf
  • Publication number: 20240009722
    Abstract: A high-temperature forming tool is formed at least partly of a molybdenum-based alloy having a fraction of molybdenum of ?90 wt. %. The molybdenum-based alloy is in a pressed-and-sintered state and in the pressed-and-sintered state has a thermal shock resistance of at least 250 K. The thermal shock resistance is defined as the quotient of ReH/(?·E), where ReH is the yield point at room temperature in MPa, a is the thermal expansion coefficient in 1/K and E is the elasticity modulus in MPa.
    Type: Application
    Filed: October 22, 2021
    Publication date: January 11, 2024
    Inventors: Michael Androsch, Alexander Lorich, Michael Eidenberger-Schober, Robert Storf
  • Patent number: 11569075
    Abstract: A sputtering target containing molybdenum and at least one metal from the group tantalum and niobium. The average content of tantalum and/or niobium is from 5 to 15 at % and the molybdenum content is greater than or equal to 80 at %. The sputtering target has at least a matrix with an average molybdenum content of greater than or equal to 92 at % and particles which are composed of a solid solution containing at least one metal from the group of tantalum and niobium, and molybdenum, with an average molybdenum content of greater than or equal to 15 at % and are embedded in the matrix. There is also described a method of producing a sputtering target.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: January 31, 2023
    Assignee: Plansee SE
    Inventors: Michael Eidenberger-Schober, Joerg Winkler, Michael O'Sullivan
  • Publication number: 20200306832
    Abstract: A powder-metallurgical sintered molybdenum part which is present as a solid body has the following composition: a molybdenum content of ?99.93% by weight, a boron content “B” of ?3 ppmw and a carbon content “C” of ?3 ppmw, with a total content “BaC” of carbon and boron being in a range of 15 ppmw?“BaC”?50 ppmw, an oxygen content “O” in a range of 3 ppmw?“O”?20 ppmw, a maximum tungsten content of ?330 ppmw and a maximum proportion of other impurities of ?300 ppmw. A powder-metallurgical process for producing such a sintered molybdenum part is also provided.
    Type: Application
    Filed: September 7, 2018
    Publication date: October 1, 2020
    Inventors: KARL HUBER, MICHAEL O'SULLIVAN, MICHAEL EIDENBERGER-SCHOBER, ROBERT STORF
  • Publication number: 20190221408
    Abstract: A sputtering target containing molybdenum and at least one metal from the group tantalum and niobium. The average content of tantalum and/or niobium is from 5 to 15 at % and the molybdenum content is greater than or equal to 80 at %. The sputtering target has at least a matrix with an average molybdenum content of greater than or equal to 92 at % and particles which are composed of a solid solution containing at least one metal from the group of tantalum and niobium, and molybdenum, with an average molybdenum content of greater than or equal to 15 at % and are embedded in the matrix. There is also described a method of producing a sputtering target.
    Type: Application
    Filed: September 8, 2017
    Publication date: July 18, 2019
    Inventors: MICHAEL EIDENBERGER-SCHOBER, JOERG WINKLER, MICHAEL O'SULLIVAN