Abstract: A positioning system for moving or positioning a moveable object, the system including: a dynamic support system including a reaction mass, a first support, a first spring system to support the reaction mass from the first support, a second support, a second spring system to support the first support from the second support, and a damping system to provide damping to the dynamic support system; and an actuator for generating a driving force between the moveable object and the reaction mass for moving or position the object, wherein a first eigenfrequency and a second eigenfrequency of the dynamic support system are substantially the same.

Abstract: A projection exposure apparatus has a vibration damper with a holder and a mass that is connected to the holder via a damping element. The vibration damper comprises a temperature control device for the temperature control of the damping element. The disclosure also relates to a method for designing a vibration damper.

Abstract: A weight compensating device includes a stator and a translator. The translator is movable relative to the stator along a movement axis. The translator includes a first permanent magnet arrangement with an axial magnetization. The stator includes a second permanent magnet arrangement radially surrounding the first permanent magnet arrangement. The stator includes a third permanent magnet arrangement that is coaxially below the first permanent magnet arrangement and that has an axial magnetization aligned in inverse fashion with respect to the axial magnetization of the first permanent magnet arrangement. The stator includes a magnetic body arrangement that is coaxially above the first permanent magnet arrangement. The first permanent magnet arrangement, the second permanent magnet arrangement, the third permanent magnet arrangement and the magnetic body arrangement form a magnetic unit and, in interaction with one another, form a compensating force that counteracts the weight acting on the translator.

Abstract: An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

Abstract: An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

Abstract: A weight compensating device includes a stator and a translator. The translator is movable relative to the stator along a movement axis. The translator includes a first permanent magnet arrangement with an axial magnetization. The stator includes a second permanent magnet arrangement that radially surrounds the first permanent magnet arrangement. The stator includes a third permanent magnet arrangement that is arranged coaxially below the first permanent magnet arrangement and that has an axial magnetization that is aligned in inverse fashion with respect to the axial magnetization of the first permanent magnet arrangement. The stator includes a magnetic body arrangement that is arranged coaxially above the first permanent magnet arrangement.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

Abstract: An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

Abstract: The disclosure provides a device for aligning a component via a guide member. A head region of the guide member is secured at a fixing point of the component, and a foot region of the guide member is secured at a fixing point of an actuating element of an actuating facility. The actuating facility is configured to hold the guide member moveably in a movement axis for the purpose of transmitting a force to the component. An adjusting facility is provided to adjust the fixing point of the actuating element so that an angle between the movement axis and the course of the guide member between the fixing points is variable.

Abstract: The disclosure provides a device for aligning a component via a guide member. A head region of the guide member is secured at a fixing point of the component, and a foot region of the guide member is secured at a fixing point of an actuating element of an actuating facility. The actuating facility is configured to hold the guide member moveably in a movement axis for the purpose of transmitting a force to the component. An adjusting facility is provided to adjust the fixing point of the actuating element so that an angle between the movement axis and the course of the guide member between the fixing points is variable.

Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.

Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device (103) for exerting a compensation force on the optical element (101), wherein said compensation force at least partly compensates for the weight force acting on the optical element (101), wherein the weight force compensation device (103) has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element (101), and wherein at least one adjustment element (880) is provided by means of which the force component generated by the passive magnetic circuit is continuously adjustable.

Abstract: A flame atomization device, especially for an atom absorption spectrometer, is disclosed. The flame atomization device includes at least one mixer chamber and an atomizer leading into the mixer chamber, and a burner head mounted on the mixer chamber's burner connection piece. A slip casing is mounted so that it can slide between a closed position and an open position in relation to the burner connection piece while, in the open position, at least one pressure reduction outlet is opened in the burner connection piece.

Abstract: Torch glassware for use with inductively coupled plasma-optical emission spectrometers is provided. The glassware includes an outer tube and a stream of cool inert gas flowing radially within the inner surface thereof such that the cool inert gas creates a cushion between the tube and hot plasma contained within the stream of cool inert gas. The outer tube includes a sidewall having an open end and having a slot passing therethrough. The slot extends longitudinally along the sidewall from the open end thereof and is defined at least in part by a first longitudinal edge and a second longitudinal edge. The first longitudinal edge is offset radially inwardly from the second longitudinal edge. Stated another way, the tube includes a fixed center, and a distance between the fixed center and the first longitudinal edge is smaller than a distance between the fixed center and the second longitudinal edge.

Abstract: A flame atomization device, especially for an atom absorption spectrometer, is disclosed. The flame atomization device includes at least one mixer chamber and an atomizer leading into the mixer chamber, and a burner head mounted on the mixer chamber's burner connection piece. A slip casing is mounted so that it can slide between a closed position and an open position in relation to the burner connection piece while, in the open position, at least one pressure reduction outlet is opened in the burner connection piece.

Abstract: The present invention relates to a unit for a plasma atomizer device comprising a supply means for supplying a gas for generating a plasma, an atomizer means for atomizing a sample to be analyzed, an injection means for injecting the atomized sample into a plasma generated with the supplied gas, and a support means for holding the supply means, the atomizer means and the injection means. The invention is characterized in that the support means is connectable to a generator chamber wall of the atomizer device in such a manner that the supply means and the injection means are arranged inside the generator chamber.

Abstract: Torch glassware for use with inductively coupled plasma-optical emission spectrometers is provided. The glassware includes an outer tube and a stream of cool inert gas flowing radially within the inner surface thereof such that the cool inert gas creates a cushion between the tube and hot plasma contained within the stream of cool inert gas. The outer tube includes a sidewall having an open end and having a slot passing therethrough. The slot extends longitudinally along the sidewall from the open end thereof and is defined at least in part by a first longitudinal edge and a second longitudinal edge. The first longitudinal edge is offset radially inwardly from the second longitudinal edge. Stated another way, the tube includes a fixed center, and a distance between the fixed center and the first longitudinal edge is smaller than a distance between the fixed center and the second longitudinal edge.