Patents by Inventor Michael F. Cronin

Michael F. Cronin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Copolymers and photoresist compositions comprising copolymer resin binder component
    Patent number: 6042997
    Abstract: The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
    Type: Grant
    Filed: January 23, 1998
    Date of Patent: March 28, 2000
    Assignees: IBM Corporation, Shipley Company, L.L.C.
    Inventors: George G Barclay, Michael F. Cronin, Ronald A. Dellaguardia, James W. Thackeray, Hiroshi Ito, Greg Breyta
  • Copolymers and photoresist compositions comprising copolymer resin binder component
    Patent number: 5861231
    Abstract: The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
    Type: Grant
    Filed: June 11, 1996
    Date of Patent: January 19, 1999
    Assignees: Shipley Company, L.L.C., IBM Corporation
    Inventors: George G. Barclay, Michael F. Cronin, Ronald A. Dellaguardia, James W. Thackeray, Hiroshi Ito, Greg Breyta
  • Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
    Patent number: 5731364
    Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.
    Type: Grant
    Filed: January 24, 1996
    Date of Patent: March 24, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin