Patents by Inventor Michael F. Leahy

Michael F. Leahy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250118590
    Abstract: In some embodiments, the present disclosure relates to workpiece handling system. The workpiece handling system includes a vacuum workpiece handler having a surface configured to receive a semiconductor workpiece. The surface has edges that form a plurality of vacuum suction holes along the surface. A plurality of vacuum conduits are respectively coupled to the plurality of vacuum suction holes, and a shared vacuum plenum is coupled to the plurality of vacuum conduits. The plurality of vacuum conduits are arranged between the shared vacuum plenum and the plurality of vacuum suction holes. A restrictor is configured to independently vary communication of the plurality of vacuum conduits between the shared vacuum plenum and the plurality of vacuum suction holes. The restrictor includes a plurality of self-regulated passive restricting units.
    Type: Application
    Filed: October 9, 2024
    Publication date: April 10, 2025
    Inventor: Michael F. Leahy
  • Patent number: 4818334
    Abstract: The present invention relates to a method of forming gate lines of polycrystalline silicon, polysilicon, which may have a layer of a metal silicide thereon. The gate lines are formed over islands of silicon on an insulating substrate with the islands being covered with a layer of silicon oxide. A polysilicon layer is coated over the silicon oxide layer on the silicon island and on the adjacent surface of the substrate. Resist masking strips are formed over the area of the polysilicon layer which are to form the gate lines. The exposed area of the polysilicon layer is first plasma etched in a gaseous mixture of nitrogen, chlorine and chloroform. The chlorine etches the polysilicon and the chloroform forms a protective coating of a polymer over the side walls of the formed gate lines. The device is then subjected to a second plasma etch in a gaseous mixture of helium, chlorine and carbon dioxide.
    Type: Grant
    Filed: March 15, 1988
    Date of Patent: April 4, 1989
    Assignee: General Electric Company
    Inventors: Stanley Shwartzman, Michael F. Leahy
  • Patent number: 4386850
    Abstract: A calibration device for an optical scanner for optically detecting microscopic defects on object surfaces is formed on a substrate having a characteristic pattern of a plurality of different arrays of artificially created defects. Each array is arranged by size and spacing of the artificial defects to represent an actual defect size. Each artificially created defect of a given array is of the same size. Each defect is provided with a surface which in response to an incident beam of light scatters the light. The response of the system to the scattered light forms a characteristic pattern which corresponds to actual defects.
    Type: Grant
    Filed: December 23, 1980
    Date of Patent: June 7, 1983
    Assignee: RCA Corporation
    Inventor: Michael F. Leahy