Patents by Inventor Michael Feltsman
Michael Feltsman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7371285Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: GrantFiled: March 19, 2004Date of Patent: May 13, 2008Assignee: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Patent number: 7008517Abstract: The present invention generally provides a method and apparatus for use in a physical vapor deposition chamber. In one embodiment, invention provides a shutter disk mechanism that eliminates the need for axially orientating a shutter disk to a robot blade that transfers the shutter disk to a substrate support.Type: GrantFiled: July 24, 2003Date of Patent: March 7, 2006Assignee: Applied Materials, Inc.Inventor: Michael Feltsman
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Patent number: 6827825Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.Type: GrantFiled: November 6, 2003Date of Patent: December 7, 2004Assignee: Applied Materials, Inc.Inventors: Michael Feltsman, Allen Lau, Michael Rosenstein, Marc O. Schweitzer
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Publication number: 20040182698Abstract: The present invention generally provides a method and apparatus for use in a physical vapor deposition chamber. In one embodiment, invention provides a shutter disk mechanism that eliminates the need for axially orientating a shutter disk to a robot blade that transfers the shutter disk to a substrate support.Type: ApplicationFiled: July 24, 2003Publication date: September 23, 2004Applicant: APPLIED MATERIALS, INC.Inventor: Michael Feltsman
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Publication number: 20040173162Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: ApplicationFiled: March 19, 2004Publication date: September 9, 2004Applicant: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Patent number: 6776848Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: GrantFiled: January 17, 2002Date of Patent: August 17, 2004Assignee: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Publication number: 20040089536Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.Type: ApplicationFiled: November 6, 2003Publication date: May 13, 2004Applicant: Applied Materials, Inc.Inventors: Michael Feltsman, Allen Lau, Michael Rosenstein, Marc O. Schweitzer
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Patent number: 6669829Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.Type: GrantFiled: February 20, 2002Date of Patent: December 30, 2003Assignee: Applied Materials, Inc.Inventors: Michael Feltsman, Allen Lau, Michael Rosenstein, Marc O. Schweitzer
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Publication number: 20030155234Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.Type: ApplicationFiled: February 20, 2002Publication date: August 21, 2003Applicant: Applied Materials, Inc.Inventors: Michael Feltsman, Allen Lau, Michael Rosenstein, Marc O. Schweitzer
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Publication number: 20030131794Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: ApplicationFiled: January 17, 2002Publication date: July 17, 2003Applicant: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman