Patents by Inventor Michael Flugel

Michael Flugel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Visible radiation sensitive composition
    Patent number: 6664025
    Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.
    Type: Grant
    Filed: February 12, 2002
    Date of Patent: December 16, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Harald Baumann, Michael Flugel
  • Visible radiation sensitive composition
    Publication number: 20030180635
    Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.
    Type: Application
    Filed: February 12, 2002
    Publication date: September 25, 2003
    Inventors: Harald Baumann, Michael Flugel
  • Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
    Patent number: 6596456
    Abstract: Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formula The copolymer contains about 0.5 to 25 mol % of unit B which has the formula wherein R1 is selected from the group consisting of alkyl, aryl and aralkyl. The copolymer contains about 0.5 to 40 mol % of unit C which has the formula wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of —COOH, —SO3H, —SO2NR9R10 with R9 and R10 independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH.
    Type: Grant
    Filed: April 11, 2002
    Date of Patent: July 22, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Harald Baumann, Michael Flugel, Eduard Kottmair
  • Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
    Publication number: 20030091925
    Abstract: Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates.
    Type: Application
    Filed: April 11, 2002
    Publication date: May 15, 2003
    Inventors: Harald Baumann, Michael Flugel, Eduard Kottmair