Patents by Inventor Michael Frederik YPMA

Michael Frederik YPMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND METHOD FOR ILLUMINATION UNIFORMITY CORRECTION
    Publication number: 20240160108
    Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.
    Type: Application
    Filed: February 24, 2022
    Publication date: May 16, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Nikolaos SOTIROPOULOS, Albertus HARTGERS, Michael Frederik YPMA, Marco Matheus Louis STEEGHS
  • Projection system
    Patent number: 10248027
    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Raoul Maarten Simon Knops, Bob Streefkerk, Christiaan Louis Valentin, Jan Bernard Plechelmus Van Schoot, Wilhelmus Franciscus Johannes Simons, Leon Leonardus Franciscus Merkx, Robertus Johannes Marinus De Jongh, Roel Johannes Elisabeth Merry, Michael Frederik Ypma
  • PROJECTION SYSTEM
    Publication number: 20170363965
    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.
    Type: Application
    Filed: November 16, 2015
    Publication date: December 21, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Hans BUTLER, Raoul Maarten Simon KNOPS, Bob STREEFKERK, Christiaan Louis VALENTIN, Jan Bernard Plechelmus VAN SCHOOT, Wilhelmus Franciscus Johanne SIMONS, Leon Leonardus Franciscus MERKX, Robertus Johannes Marinus DE JONGH, Roel Johannes Elisabeth MERRY, Michael Frederik YPMA