Abstract: A cleaning device for cleaning substrates is provided. The device comprises a cleaning brush having an outer cleaning surface surrounding a hollow bore and positioned around a first central axis al defining a first rotational direction ?; and a plurality of cantilevered nodules formed on the outer cleaning surface, each nodule having a mounting portion connected with the outer cleaning surface, a cleaning portion connected with the mounting portion, and a contact member for engaging the substrate. The cleaning portion extends in a first direction D1 from the mounting portion to the contact member, wherein a radial direction Dr is defined as extending radially from the central axis a1 towards the outer cleaning surface and normal to the rotational direction ?, and wherein the first direction D1 intersects with the radial direction Dr at an angle ?. Angle ? is greater than 0° and less than 180°.

Abstract: A cleaning device for cleaning substrates is provided. The device comprises a cleaning brush having an outer cleaning surface surrounding a hollow bore and positioned around a first central axis al defining a first rotational direction ?; and a plurality of cantilevered nodules formed on the outer cleaning surface, each nodule having a mounting portion connected with the outer cleaning surface, a cleaning portion connected with the mounting portion, and a contact member for engaging the substrate. The cleaning portion extends in a first direction D1 from the mounting portion to the contact member, wherein a radial direction Dr is defined as extending radially from the central axis a1 towards the outer cleaning surface and normal to the rotational direction ?, and wherein the first direction D1 intersects with the radial direction Dr at an angle ?. Angle ? is greater than 0° and less than 180°.

Abstract: A solvent fume exhaust scrubber (100) for recovering organic vapor from exhaust air which is produced during the manufacture of semiconductors includes a throttling chamber (180) containing a plurality of planar baffles (112, 114, 116, 118 and 120), a planar condenser (130) and a cooling coil (138) which engages and substantially traverses the planar surface of the condenser. The throttling chamber intersects an exhaust duct (152) so that an exhaust stream (182) flows in a flow direction (184) through the chamber. Each baffle and condenser has a planar surface which is disposed at right angles to the flow direction. The surface extends partially across the exhaust stream. The baffles are arranged sequentially along the flow direction and have offsetting planar surfaces across the exhaust stream so that the baffles in combination extend across the exhaust stream. A baffle includes a baffle frame (302) for holding a plurality of carbon beads (306).