Patents by Inventor Michael G. McMaster

Michael G. McMaster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for reworking printed circuit boards using surface coating and selective removal of an electrically conductive material
    Patent number: 5615387
    Abstract: A method of reworking a printed circuit board having a surface including areas needing to be reworked including the steps of covering the surface with a dielectric leaving uncovered at least the areas of the surface to be reworked, and selectively providing corrective circuitry on the dielectric interconnected to the uncovered areas of the surface needing to be reworked. In addition, a printed circuit board having a surface including reworked areas including a dielectric covering the surface leaving uncovered at least the reworked areas, and corrective circuitry on the dielectric interconnected to the uncovered reworked areas.
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: March 25, 1997
    Assignee: International Business Machines Corporation
    Inventors: Charles H. Crockett, Jr., Steven A. Duncan, Stephen A. Dunn, David W. Malone, Michael G. McMaster
  • Positive photoresist composition containing photoacid generator and use thereof
    Patent number: 5498765
    Abstract: A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.
    Type: Grant
    Filed: September 26, 1994
    Date of Patent: March 12, 1996
    Assignee: International Business Machines Corporation
    Inventors: Burton J. Carpenter, Jr., Michael G. McMaster, Joseph LaTorre, Logan L. Simpson
  • Positive photoresist composition containing photoacid generator and use thereof
    Patent number: 5374500
    Abstract: A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.
    Type: Grant
    Filed: April 2, 1993
    Date of Patent: December 20, 1994
    Assignee: International Business Machines Corporation
    Inventors: Burton J. Carpenter, Jr., Michael G. McMaster, Joseph LaTorre, Logan L. Simpson
  • Positive photoresist system for near-UV to visible imaging
    Patent number: 5272042
    Abstract: Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.
    Type: Grant
    Filed: September 17, 1991
    Date of Patent: December 21, 1993
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, William R. Brunsvold, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre, Michael G. McMaster, Melvin W. Montgomery, Wayne M. Moreau, Logan L. Simpson, Robert J. Tweig, Gregory M. Wallraff
  • Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition
    Patent number: 5266444
    Abstract: A method and composition are shown for producing a positive-acting photoimagible epoxy resin. In addition to the epoxy resin, the compositions include a dual component cross-linking system which combines a basic curing agent with an onium or arylonium salt. The onium or arylonium salt produces a protic acid upon exposure to irradiation causing a reaction with the basic curing agent which renders the agent ineffective as an epoxy curing agent during subsequent heating. During a subsequent bake operation, only the unexposed regions of the epoxy will cross-link. As a result, the exposed areas wash away, leaving only the cured reverse image.
    Type: Grant
    Filed: September 10, 1992
    Date of Patent: November 30, 1993
    Assignee: International Business Machines Corporation
    Inventors: Burton J. Carpenter, Jr., Joseph LaTorre, Michael G. McMaster, Logan L. Simpson