Abstract: A process for producing a structured area of porous silicon on a substrate, in which silicon is etched and structured by means of illumination, includes selectively aiming the illumination during or after the formation of the porous silicon directly at a selected area of a p-doped substrate in order to effect etching and structuring of the porous silicon in another area. A device for carrying out the process includes an illuminating system for supporting the etching process and for structuring the porous silicon, in which the illuminating system is selectively aimed during or after the formation of the porous silicon directly at a selected area of p-doped substrate in order to effect etching and structuring of the porous silicon in another area.

Abstract: A three-dimensional structure of porous silicon considerably improves the anchorage of sensor-active material such as, for example, enzymes, antibodies, etc., on or in the substrate surface of chemical sensors, in particular silicon-based biosensors. This structure is produced by means of suitable etching which forms pore apertures adapted to the penetrability of the sensor-active material. The pore walls advantageously receive a non-conductive boundary layer which consists of oxides of Si and/or Al or Ta or silicon nitride and are preferably 1-100 nm thick. The porous layer is advantageously between 10 nm and 100 .mu.m thick and the pores are preferably in the form of branched ducts whose average diameter is 1 nm-10 .mu.m and in particular 10-1000 nm. The sensor-active material can optionally be distributed in a glass, solid, plastics or polymer membrane.

Abstract: An electronic component has electrically activatable layer, e.g. in electroluminescent layer of porous silicon on a body of which two multiarthogonal grids are buried. A conductive layer on the electrically activatable layer forms a drain and another conductor forms the source, the grid bars being independently energizable to form current channels through the electrically activatable layer.

Abstract: The invention relates to an optical component consisting of transparent thin layers of differing thickness and refractive indices. Such optical components are used, for example, as interference filters and mirrors. Optical components made of layers with gradually changing refractive indices are also known as waveguides of anti-reflective coatings. The invention achieves the aim of using, instead of layers of ordinary materials, another material by means of a component in which the layers consist of porous silicon. The special advantages of porous silicon as a coating material arises not only from the ease and economy of manufacture, but also in the facility for obtaining gradual refractive index transitions. It is therefore very easily possible to make waveguides on a silicon chip.