Abstract: In known methods for producing a glass component, a void-containing intermediate product containing doped or non-doped SiO2 is inserted into a sheath tube composed of glass, which has a longitudinal axis and an inner bore, and is thermally treated therein. In order to subject the intermediate product to a thermal and/or reactive treatment that is reproducible and uniform in its effect from this starting point, it is proposed in one embodiment that into the sheath tube's inner bore a first gas-permeable gas diffuser is inserted which is displaceable along the sheath tube's longitudinal axis and is pressed against the intermediate product during the thermal treatment.

Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. One aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

Abstract: One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index nK of each refractive index profile is greater than the refractive index nM1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

Abstract: A known method for homogenizing glass includes the following steps: providing a cylindrical blank composed of the glass, having a cylindrical outer surface which extends between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and moving the shear zone along the longitudinal axis of the blank. To reduce the risk of cracks and fractures during homogenizing, it is proposed that a thermal radiation dissipator is used that at least partially surrounds the shear zone, the lateral dimension of which in the direction of the longitudinal axis of the blank is greater than the shear zone and smaller than the length of the blank, the thermal radiation dissipator being moved synchronously with the shear zone along the longitudinal axis of the blank.

Abstract: A method for homogenizing glass includes the method: providing a cylindrical blank composed of the glass having a cylindrical outer surface that extends along a longitudinal axis of the blank between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and displacing the shear zone along the longitudinal axis of the blank. To enable a radial mixing within the shear zone in addition to the tangential mixing with the lowest possible time and energy input, starting from this method, cylindrical sections of the blank are adjacent to the shear zone on both sides, the first cylindrical section having a first central axis and the second cylindrical section having a second central axis, the first central axis and the second central axis being temporarily non-coaxial with each other.

Abstract: One aspect relates to a process for the preparation of a quartz glass body including: i.) providing a silicon dioxide granulate, ii.) making a first glass melt out of the silicon dioxide granulate, iii.) making a glass product out of at least one part of the glass melt, iv.) reducing the size of the glass product to obtain a quartz glass grain, v.) making a further glass melt from the quartz glass grain and vi.) making a quartz glass body out of at least one part of the further glass melt. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to a reactor, which is obtainable by further processing of the quartz glass body.

Abstract: The invention relates to a process for the preparation of a quartz glass grain comprising the process steps i.) Providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, ii.) Making a glass melt out of silicon dioxide granulate, iii.) Making a quartz glass body out of at least part of the glass melt and iv.) Reducing the size of the quartz glass body to obtain the quartz glass grain. The invention further relates to a quartz glass grain which is obtainable by this process. The invention further relates to opaque quartz glass bodies, which are obtainable by further processing of the quartz glass grain.

Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt out of silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The silicon dioxide granulate is obtained by providing and processing a silicon dioxide powder. One aspect also relates to silicon dioxide granulate, which is obtained by providing a silicon dioxide powder and processing it. One aspect further relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

Abstract: In a known method for pulling a semiconductor single crystal according to the Czochralski method, a semiconductor melt is produced in a silica glass crucible and the semiconductor single crystal is pulled from said melt. The inner wall of the silica glass crucible and the exposed melt surface are in contact with one another and with a respective melt atmosphere in the region of a contact zone running radially around the crucible inner wall, and primary oscillations of the melt are triggered in said contact zone. On this basis, in order to provide a method characterized by reduced melt vibrations and in particular by a simple, short accretion process, according to the invention primary oscillations are triggered which differ from one another in their frequency.

Abstract: A process for the production of a porous carbon product. The process includes the steps of (a) providing a substrate surface; (b) depositing silicon dioxide as a layer on the substrate surface, thereby obtaining a porous silicon di-oxide material; (c) contacting the porous silicon dioxide material on the substrate surface with a first carbon source thereby obtaining a first precursor comprising the porous silicon dioxide material and the first car-bon source; (d) heating the first precursor thereby obtaining a second precursor comprising the porous silicon dioxide material and carbon; and (e) at least partially removing the silicon dioxide in the second precursor, thereby obtaining the porous carbon product. Also disclosed are a porous carbon product and a device that uses a porous carbon product.

Abstract: One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, and making a quartz glass body out of at least part of the glass melt. The size of the quartz glass body is reduced to obtain a quartz glass grain. The quartz glass body is processed to make a preform and an opaque quartz glass body is made from the preform. One aspect further relates to an opaque quartz glass body which is obtainable by this process. One aspect further relates to a reactor and an arrangement, which are each obtainable by further processing of the opaque quartz glass body.

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt from the silicon dioxide granulate in an oven, and iii.) Making a quartz glass body from at least a part of the glass melt, wherein the oven comprises a hanging sinter crucible. The invention also relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body which are each obtainable by further processing the quartz glass body.

Abstract: One aspect relates to a process for the provision of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in an oven and making a quartz glass body from at least part of the glass melt. The oven includes a hanging metal sheet crucible. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body which are obtainable by processing the quartz glass body further.

Abstract: One aspect is a process for the preparation of a quartz glass body including providing a silicon dioxide granulate wherein the provision includes providing silicon dioxide powder, and processing the silicon dioxide powder to obtain a silicon dioxide granulate. The silicon dioxide granulate has a larger particle diameter than the silicon dioxide powder. The processing includes processing the silicon dioxide powder to obtain a silicon dioxide granulate I, wherein the silicon dioxide granulate I has a first carbon content wC(1), treating the silicon dioxide granulate I with a reactant to obtain a silicon dioxide granulate II with a further carbon content wC(2), wherein the further carbon content wC(2) is less than the first carbon content wC(1), making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt.

Abstract: One aspect relates to a process for preparing a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in a melting crucible, making a quartz glass body from at least a part of the glass melt, and treating the quartz glass body with at least one procedure selected from the group consisting of chemical, thermal or mechanical treatment to obtain a treated quartz glass body. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect also concerns a light guide, an illuminant and a formed body each obtainable by processing the quartz glass body further.

Abstract: The invention relates to a process for preparing a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt from the silicon dioxide granulate in a melting crucible, and iii.) Making a quartz glass body from at least a part of the glass melt, wherein the melting crucible is comprised in an oven and is made of at least one material comprising tungsten or molybdenum or a combination thereof. The invention further relates to a quartz glass body which can be obtained by this process. Further, the invention relates to a light guide, an illuminant and a formed body, each of which can be obtained by processing the quartz glass body further.

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of the silicon dioxide granulate and iii) Making a quartz glass body out of at least part of the glass melt, wherein the provision comprises the steps I. Providing a silicon dioxide powder with at least two particles made from a silicon-chlorine compound, II. Bringing the silicon dioxide powder into contact with steam to obtain a treated silicon dioxide powder and III. Granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate, and wherein the chorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a process for providing a silicon dioxide granulate.

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

Abstract: One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index nK of each refractive index profile is greater than the refractive index nM1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate obtainable from a silicon dioxide powder, wherein the silicon dioxide granulate has a larger particle size than the silicon dioxide powder, ii.) Making a glass melt out of silicon dioxide granulate and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the melting crucible has at least one inlet and at least one outlet, wherein at least part of the glass melt is removed via the melting crucible outlet. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.