Abstract: A system for particle detection within a chamber includes a transmitter configured to generate a beam of light, one of a multipass configuration and beam shaping optics associated with the laser for generating a beam area within the chamber, the beam area configured to be arranged at an oblique angle relative to a longitudinal axis of the chamber and substantially confined to an imaging plane, and a detector configured to detect particles illuminated by the beam of light at the imaging plane. A method for detecting and measuring particles previously deposited on a surface of a semiconductor manufacturing chamber is also described.

Abstract: A particle detector includes at least one throttling element which defines an aerodynamic aperture. A light source illuminates a region of the aerodynamic aperture at about a focal point of an aerodynamic lens. A detector is configured to receive a light scattered from one or more particles which traverse the aerodynamic aperture. A method for detecting and measuring particles previously deposited on a surface of a semiconductor manufacturing chamber is also described.