Patents by Inventor Michael Honan
Michael Honan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230420275Abstract: Apparatus and methods to process one or more wafers are described. The apparatus comprises a chamber defining an upper interior region and a lower interior region. A heater assembly is on the bottom of the chamber body in the lower interior region and defines a process region. A wafer cassette assembly is inside the heater assembly and a motor is configured to move the wafer cassette assembly from the lower process region inside the heater assembly to the upper interior region.Type: ApplicationFiled: September 8, 2023Publication date: December 28, 2023Applicant: Applied Materials, Inc.Inventors: Michael Honan, David Blahnik, Robert Brent Vopat, Jeffrey Blahnik, Charles Carlson
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Patent number: 11791176Abstract: Apparatus and methods to process one or more wafers are described. The apparatus comprises a chamber defining an upper interior region and a lower interior region. A heater assembly is on the bottom of the chamber body in the lower interior region and defines a process region. A wafer cassette assembly is inside the heater assembly and a motor is configured to move the wafer cassette assembly from the lower process region inside the heater assembly to the upper interior region.Type: GrantFiled: October 28, 2019Date of Patent: October 17, 2023Assignee: Applied Materials, Inc.Inventors: Michael Honan, David Blahnik, Robert Brent Vopat, Jeffrey Blahnik, Charles Carlson
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Patent number: 11710617Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.Type: GrantFiled: July 16, 2021Date of Patent: July 25, 2023Assignee: APPLIED Materials, Inc.Inventors: Costel Biloiu, Michael Honan, Robert B. Vopat, David Blahnik, Charles T. Carlson, Frank Sinclair, Paul Murphy
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Patent number: 11665810Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.Type: GrantFiled: December 4, 2020Date of Patent: May 30, 2023Assignee: APPLIED Materials, Inc.Inventors: Frank Sinclair, Paul J. Murphy, Michael Honan, Charles T. Carlson
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Patent number: 11574796Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.Type: GrantFiled: July 21, 2021Date of Patent: February 7, 2023Assignee: Applied Materials, Inc.Inventors: Jun Lu, Frank Sinclair, Shane W. Conley, Michael Honan
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Publication number: 20230021619Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.Type: ApplicationFiled: July 21, 2021Publication date: January 26, 2023Inventors: Jun Lu, Frank Sinclair, Shane W. Conley, Michael Honan
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Publication number: 20220183137Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.Type: ApplicationFiled: December 4, 2020Publication date: June 9, 2022Applicant: Applied Materials, Inc.Inventors: Frank Sinclair, Paul J. Murphy, Michael Honan, Charles T. Carlson
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Publication number: 20210343500Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.Type: ApplicationFiled: July 16, 2021Publication date: November 4, 2021Applicant: APPLIED Materials, Inc.Inventors: Costel Biloiu, Michael Honan, Robert B. Vopat, David Blahnik, Charles T. Carlson, Frank Sinclair, Paul Murphy
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Patent number: 11094504Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.Type: GrantFiled: January 6, 2020Date of Patent: August 17, 2021Assignee: APPLIED Materials, Inc.Inventors: Costel Biloiu, Michael Honan, Robert B Vopat, David Blahnik, Charles T. Carlson, Frank Sinclair, Paul Murphy
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Publication number: 20210210307Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.Type: ApplicationFiled: January 6, 2020Publication date: July 8, 2021Applicant: APPLIED Materials, Inc.Inventors: Costel Biloiu, Michael Honan, Robert B. Vopat, David Blahnik, Charles T. Carlson, Frank Sinclair, Paul Murphy
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Publication number: 20200135508Abstract: Apparatus and methods to process one or more wafers are described. The apparatus comprises a chamber defining an upper interior region and a lower interior region. A heater assembly is on the bottom of the chamber body in the lower interior region and defines a process region. A wafer cassette assembly is inside the heater assembly and a motor is configured to move the wafer cassette assembly from the lower process region inside the heater assembly to the upper interior region.Type: ApplicationFiled: October 28, 2019Publication date: April 30, 2020Inventors: Michael Honan, David Blahnik, Robert Brent Vopat, Jeffrey Blahnik, Charles Carlson
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Patent number: 9490153Abstract: A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.Type: GrantFiled: July 3, 2014Date of Patent: November 8, 2016Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Aaron P. Webb, Charles T. Carlson, Michael Honan, Luigi G. Amato, Christopher Neil Grant, James D. Strassner
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Publication number: 20150026953Abstract: A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.Type: ApplicationFiled: July 3, 2014Publication date: January 29, 2015Inventors: Aaron P. Webb, Charles T. Carlson, Michael Honan, Luigi G. Amato, Christopher Neil Grant, James D. Strassner
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Patent number: 7163107Abstract: In-situ cleaning of the bilgewater processing plates of stacks within a treatment tank chamber of a 50-gpm oil/water separator is performed by an injected chemical cleaning agent dispersed by diverted flow of pressurized air introduced into the tank chamber below the plate stacks by emergence of air bubbles from plural branches of an air sparging array system positioned in underlying alignment with crest formations on the processing plates. The air sparging array system consists of an upper and lower tank arrays.Type: GrantFiled: October 28, 2004Date of Patent: January 16, 2007Assignee: The United States of America as represented by the Secretary of the NavyInventors: Stephan J. Verosto, Mario DiValentin, David O. Ferchau, Michael Honan, J. William Citino, III, David E. Freshcoln