Abstract: Examples described herein provide a circuit and methods for self-testing to detect damage to a device, which damage may be caused by an Electro-Static Discharge (ESD) event. In an example, an integrated circuit includes an input/output circuit, an ESD protection circuit, and a system monitor. The input/output circuit has an input/output node. The ESD protection circuit is connected to the input/output node. The system monitor has a driving/measurement node selectively connectable to the input/output node. The system monitor is configured to drive and measure a voltage of the driving/measurement node. The system monitor is further configured to determine, based on driving and measuring the voltage of the driving/measurement node, whether a damaged device is present. The damaged device is in the input/output circuit or the ESD protection circuit.

Abstract: A device comprising a plurality of transistors; interconnect elements coupled to the plurality of transistors is described. The interconnect elements enable the transfer of signals between the plurality of transistors. The device further includes a cooling element associated with the device, wherein the cooling element is configured to maintain a temperature of a circuit having the plurality of transistors and interconnect elements below a predetermined temperature; wherein one or more parameters of the device is optimized to operate at a temperature below the predetermined temperature. A method of implementing a circuit is also described.

Abstract: An integrated circuit (IC) chip having circuitry adapted to detect and unlatch a latched transistor, and methods for operating the same are provided. In one example, an IC chip includes a body, a power rail disposed in the body and coupled to at least one of a plurality of contact pads disposed on the body, and a first core circuit disposed in the body. The first core circuit includes a first current limiting circuit, a silicon controlled rectifier (SCR) device having a first transistor, a second transistor, and a first latch sensing circuit. The first current limiting circuit is coupled to the power rail. First terminals of the first and second transistors are coupled to the first current limiting circuit. The first latch sensing circuit has a first input terminal coupled to second terminals of the first and second transistors. The first latch sensing circuit also has an output terminal coupled to the first current limiting circuit.

Abstract: An electronics-harmful-radiation (EHR) monitoring system includes an EHR measurement circuit. The EHR measurement circuit includes a first device, a single event upset (SEU) detector circuit configured to determine a first number of SEUs of the first device during a first period, and an EHR measurement generator configured to generate a first EHR value based on the first number of SEUs and the first period.

Abstract: Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a circuit includes a semiconductor substrate, a first transistor, a second transistor, and a ballast resistor. The semiconductor substrate comprises a p-doped region and an n-doped region. The first transistor comprises an n+ doped source region disposed in the p-doped region of the semiconductor substrate. The second transistor comprises a p+ doped source region disposed in the n-doped region of the semiconductor substrate. The p+ doped source region, the n-doped region, the p-doped region, and the n+ doped source region form a PNPN structure. The ballast resistor is electrically connected in series with the PNPN structure between a power node and a ground node.

Abstract: Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a semiconductor structure includes a semiconductor substrate, a p-type transistor having p+ source/drain regions disposed in a n-doped region in the semiconductor substrate, an n-type transistor having n+ source/drain regions disposed in a p-doped region in the semiconductor substrate, a n+ guard ring disposed in the n-doped region and laterally around the p+ source/drain regions of the p-type transistor, and a p+ guard ring disposed laterally around the n-doped region. The p+ guard ring is disposed between the p-type transistor and the n-type transistor.

Abstract: FinFET, P-N junctions and methods for forming the same are described herein. In one example, a FinFET is described that includes a fin having a channel region wrapped by a gate, the channel region connecting a source and a drain. A first isolation layer is disposed on a first side of the fin and a second isolation layer is disposed on a second side of the fin, where the second side is opposite of the first side. The second isolation layer has a thickness greater than a thickness of the first isolation layer.

Abstract: An integrated circuit (IC) chip having circuitry adapted to detect and unlatch a latched transistor, and methods for operating the same are provided. In one example, an IC chip includes a body, a power rail disposed in the body and coupled to at least one of a plurality of contract pads disposed on the body, and a first core circuit disposed in the body. The first core circuit includes a first current limiting circuit, a silicon controlled rectifier (SCR) device having a first transistor, a second transistor, and a first latch sensing circuit. The first current limiting circuit is coupled to the power rail. First terminals of the first and second transistors are coupled to the first current limiting circuit. The first latch sensing circuit has a first input terminal coupled to second terminals of the first and second transistors. The first latch sensing circuit also has an output terminal coupled to the first current limiting circuit.

Abstract: Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a circuit includes a semiconductor substrate, a first transistor, a second transistor, and a ballast resistor. The semiconductor substrate comprises a p-doped region and an n-doped region. The first transistor comprises an n+ doped source region disposed in the p-doped region of the semiconductor substrate. The second transistor comprises a p+ doped source region disposed in the n-doped region of the semiconductor substrate. The p+ doped source region, the n-doped region, the p-doped region, and the n+ doped source region form a PNPN structure. The ballast resistor is electrically connected in series with the PNPN structure between a power node and a ground node.

Abstract: Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a semiconductor structure includes a semiconductor substrate, a p-type transistor having p+ source/drain regions disposed in a n-doped region in the semiconductor substrate, an n-type transistor having n+ source/drain regions disposed in a p-doped region in the semiconductor substrate, a n+ guard ring disposed in the n-doped region and laterally around the p+ source/drain regions of the p-type transistor, and a p+ guard ring disposed laterally around the n-doped region. The p+ guard ring is disposed between the p-type transistor and the n-type transistor.

Abstract: A circuit for storing data in an integrated circuit is described. The circuit comprises an input adapted to receive the data; a memory element coupled to the input, the memory element comprising a storage node for storing the data; at least one node that is separate from the storage node for storing the data; and at least a portion of a dummy transistor coupled to the at least one node that is separate from the storage node for storing the data. A method of storing data in an integrated circuit is also described.

Abstract: FinFET, P-N junctions and methods for forming the same are described herein. In one example, a FinFET transistor is described that includes a fin having a channel region wrapped by a gate, the channel region connecting a source and a drain. A first isolation layer is disposed on a first side of the in and a second isolation layer is disposed on a second side of the fin, where the second side is opposite of the first side. The second oxide isolation layer has a thickness greater than a thickness of the first isolation layer.

Abstract: Methods and apparatus are described for detecting both single event latch-up (SEL) and electrical overvoltage stress (EOS) using a single, reconfigurable detection circuit. One example circuit capable of detecting a latch-up state and an overvoltage condition generally includes an impedance element coupled to a power supply node; a voltage divider coupled to the power supply node; a multiplexer having a first input coupled to a tap of the voltage divider, a second input coupled to a first portion of the impedance element, and a third input coupled to a second portion of the impedance element; a reference generator; and an analog-to-digital converter (ADC) having a first input coupled to an output of the multiplexer and a second input coupled to an output of the reference generator.

Abstract: A circuit for storing data in an integrated circuit is described. The circuit comprises an inverter comprising a first transistor having a first gate configured to receive input data and a first output configured to generate a first inverted data output and a second transistor having a second gate configured to receive the input data and a second output configured to generate a second inverted data output; a first pass gate coupled to the first output of the inverter; a second pass gate coupled to the second output of the inverter; and a storage element having an input coupled to receive an output of the first pass gate and an output of the second pass gate. A method of storing data in an integrated circuit is also described.

Abstract: A method includes receiving one or more node connections from a mesh network external to the data processing hardware. The mesh network includes a network of nodes each operative to transmit and/or receive directional beams containing packets of data. The method also includes identifying a route within the mesh network for providing a data packet from a source to a destination and determining schedule information associated with the identified route, the schedule information coordinating wireless communication between at least a first node and a second node along the route to transfer the data packet. The method also includes providing the schedule information to the first node and the second node.

Abstract: An integrated circuit enables the selection of a circuit. According to one implementation, a plurality of redundant circuits provide a predetermined function and a voltage sensor may be coupled to receive a reference voltage. A selection circuit may be coupled to the voltage sensor and the reference voltage, wherein the selection circuit selects one of the plurality of redundant circuits to be implemented in the integrated circuit based upon a detected voltage of the reference voltage of the reference voltage.

Abstract: A wafer includes a first interposer having a first patterned metal layer and a second interposer having a second patterned metal layer. The wafer includes a metal connection in a scribe region of the wafer that electrically couples the first patterned metal layer of the first interposer with the second patterned metal layer of the second interposer forming a global wafer network. The wafer further includes a probe pad located in the scribe region that is electrically coupled to the global wafer network.

Abstract: A method includes receiving at least a first node connection from a network external to the data processing hardware. The network includes a network of nodes each operative to transmit and/or receive directional beams containing packets of data. The method also includes identifying an open first communication link between a first node and a second node of the network and determining a first recommended set of beam vectors to constrain a first scanning range of the first node when initiating beam forming with the second node. The method also includes transmitting the first recommended set of beam vectors to the first node. The first recommended set of beam vectors cause the first node to execute beam forming training with the second node using the first recommended set of beam vectors to establish the first communication link with the second node.

Abstract: Embodiments herein describe techniques for wafer to wafer stacking of integrated circuit chips (e.g., dice) to form stacked IC devices. In one example, a stacked IC device is provided that includes a first wafer, a second wafer, and first conductive bridge. The second wafer is stacked on and secured to the first wafer. The second wafer has a plurality of IC dice that are communicatively coupled to a plurality of IC dice formed on the first wafer. The first conductive bridge has a first end that is sandwiched between the first and second wafers. The first conductive bridge shorts exposed pads of dice formed in the exclusion zones of the first and second wafers.

Abstract: A circuit for preventing multi-bit upsets induced by single event transients is described. The circuit comprises a clock generator configured to generate a first clock signal and a second clock signal; a first memory element configured to receive a first input signal and generate a first output signal, the first memory element having a first clock input configured to receive the first clock signal; and a second memory element configured to receive the first output signal and generate a second output signal, the second memory element having a second clock input configured to receive the second clock signal; wherein the first clock signal is the same as the second clock signal. A method of preventing multi-bit upsets induced by single event transients is also described.