Abstract: A wavelength selective optical device for locking to a selected wavelength in an ITU grid includes a first waveguide, a second waveguide, a heating element and a control unit. The first waveguide includes a tunable filter formed in the first waveguide and the second waveguide includes a reference filter formed in the second waveguide. The heating element is in thermal contact with the tunable filter and the reference filter and the control unit is coupled to the heating element and the reference filter. The control unit varies a temperature of the heating element responsive to an indication signal provided by the reference filter to adjust the selected channel of the tunable filter.

Abstract: A wavelength selective optical device for locking to a selected wavelength in an ITU grid includes a first waveguide, a second waveguide, a heating element and a control unit. The first waveguide includes a tunable filter formed in the first waveguide and the second waveguide includes a reference filter formed in the second waveguide. The heating element is in thermal contact with the tunable filter and the reference filter and the control unit is coupled to the heating element and the reference filter. The control unit varies a temperature of the heating element responsive to an indication signal provided by the reference filter to adjust the selected channel of the tunable filter.

Abstract: A photopolymerizable composition for use in forming a photopolymer composition for use in forming the light transmissive regions of light transmissive devices, and such devices.

Abstract: A photopolymerizable composition for use in forming a photopolymer composition for use in forming the light transmissive regions of light transmissive devices, and such devices.

Abstract: A photopolymerizable composition for use in forming a photopolymer composition for use in forming the light transmissive regions of light transmissive devices, and such devices.The photopolymerizable composition comprises one or more ethylenically unsaturated monomers selected from the group consisting of aryl acrylates and aryl methacrylates and preferably multi-functional aryl acrylates and aryl methacrylates such as aryl triacrylates, aryl diacylates, and aryl tetraacrylates; and a photoinitiator that activates polymerization of the unsaturated monomers upon exposure to actinic radiation. The composition may be polymerized to form a photopolymer which on exposure to a temperature of 190.degree. C. in air for 24 hours exhibits a coloration on the Gardner Color Scale equal to or less than 8 as determined by ASTM D1544-80 and which exhibits no cracking or delamination from a glass substrate as defined by ASTM D4538-90A on exposure of the same to a temperature of 190.degree. C. for 24 hours in air.

Abstract: Optically active (optically non-linear or electro-optically active) waveguides are formed by depositing a layer of organic material, typically polymeric material, comprising one or more opticaly active components, and subjecting predetermined regions of the layer to actinic radiation to alter the refractive index of these regions.

Abstract: A direct view display including a light generating means for generating light, a modulating means for modulating light from said light generating means to form an image, and an image display means for displaying said image from said modulating means positioned adjacent to the light output surface of said modulating means, said display means comprising an array of tapered optical waveguides on a planar substrate the tapered end of each of said waveguides extending outward from said substrate and having a light input surface adjacent said substrate and a light output surface distal from said light input surface.

Abstract: The present invention is directed to a process for making an array of tapered photopolymerized waveguides. A photomask having opaque and transparent regions is placed in substantial contact with a substrate having a substantially uniform thickness of photopolymerizable mixture thereon. The photopolymerizable mixture is then exposed through the transparent regions of the photomask to substantially collimated actinic radiation for a time sufficient to form an array of tapered photopolymerized waveguides. The photomask and photopolymerizable mixture which was not substantially polymerized by the substantially collimated actinic radiation are then removed from the substrate. The tapered waveguides are useful as a display means in direct view devices and projection display devices.

Abstract: The present invention is directed to an optical coupling device for facilitating the coupling of an optical fiber to an optical waveguide and to a method for fabricating such coupling device. Another aspect of this invention relates to optical fiber to optical waveguide interconnect comprising the coupling device of this invention, and arrays comprising a plurality of such arrays.

Abstract: Solid bodies having a reflective surface are provided with an anti-reflection coating of a terpolymer composition derived from (a) perfluoroalkylalkyl acrylate or methacrylate, (b) acrylic, methacrylic or itaconic acid, and (c) hydroxyl- containing acrylate or methacrylate.

Abstract: A new monomer is used to prepare homo or copolymers containing blocked imide groups which are characterized by deblocking in two stages, first when acid catalyzed and thereafter in aqueous alkaline solutions. Such polymers are, therefore, especially useful in formulating positive photoresist compositions. The polymers are combined with a latent photoacid, which when exposed to actinic radiation removes the acid sensitive blocking moiety, preferably an acetal or ketal group, leaving a methylol group or substituted methylol group remaining attached to the nitrogen atom, which groups are subsequently removed by exposure to aqueous alkaline developing solutions, leaving only imide groups. ##STR1## The new monomer is a derivative of maleimide in which the imide hydrogen has been replaced with a methylol group, which is subsequently reacted to form an acetal or ketal. Preferred monomers include N-(2,4-dioxa-3,3-dimethylpentyl)-2H,5H-2,5-dioxopyrrole and related compounds.

Abstract: Azo-type optically active compounds and polymers are provided based on compounds of the general structure[substituted aryl]--N.dbd.N--[substituted aryl]wherein aryl substituents are introduced which hinder or prohibit rotation around the single bonds of the --N.dbd.-- central moiety (as well as around certain other single bonds), to provide "planarized" structures having improved optically active properties, especially electro-optically active properties. These compounds and polymers find use in optically active waveguides.

Abstract: Solid bodies having a reflective surface are provided with an anti-reflection coating of a terpolymer composition derived from (a) perfluoroalkylalkyl acrylate or methacrylate, (b) acrylic, methacrylic or itaconic acid, and (c) hydroxyl- containing acrylate or methacrylate.

Abstract: A new monomer is used to prepare homo or copolymers containing blocked imide groups which are characterized by deblocking in two stages, first when acid catalyzed and thereafter in aqueous alkaline solutions. Such polymers are, therefore, especially useful in formulating positive photoresist compositions. The polymers are combined with a latent photoacid, which when exposed to actinic radiation removes the acid sensitive blocking moiety, preferably an acetal or ketal group, leaving a methylol group or substituted methylol group remaining attached to the nitrogen atom, which groups are subsequently removed by exposure to aqueous alkaline developing solutions, leaving only imide groups, ##STR1## The new monomer is a derivative of maleimide in which the imide hydrogen has been replaced with a methylol group. which is subsequently reacted to form an acetal or ketal. Preferred monomers include N-(2,4-dioxa-3,3-dimethylpentyl)-2H,5H-2,5-dioxopyrrole and related compounds.

Abstract: Azo-type optically active compounds and polymers are provided based on compounds of the general structure[substituted aryl]--N.dbd.N--[substituted aryl]wherein aryl substituents are introduced which hinder or prohibit rotation around the single bonds of the --N.dbd.N-- central moiety (as well as around certain other single bonds), to provide "planarized" structures having improved optically active properties, especially electro-optically active properties. These compounds and polymers find use in optically active waveguides.

Abstract: Actinic (deep ultraviolet, ultraviolet and visible) light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of CO--NH--CO groups, such as maleimide and especially maleimide--substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or .alpha.-methylstyrene in a 1:1 molar ratio. The preferred methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-B in Table I.

Abstract: Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are attached. These compositions provide high resolution, high contrast and high sensitivity in the deep UV (wavelength of 250-300 nm), mid-UV (wavelength of 300-350 nm) or conventional (wavelength of 350-450 nm) exposure bands. The compositions are also suitable for exposure at wavelengths commonly associated with excimer laser sources (248, 308 nm) or for exposure by X-radiation.In the compositions disclosed, the imide group ##STR1## can be blocked with certain groups, X, to form compounds containing the structure ##STR2## which have solubility properties different from the unblocked imide. These groups, X, can be cleaved by acid under the proper conditions to regenerate the unblocked imide.

Abstract: A new monomer is used to prepare homo or copolymers containing blocked imide groups which are characterized by deblocking in two stages, first when acid catalyzed and thereafter in aqueous alkaline solutions. Such polymers are, therefore, especially useful in formulating positive photoresist compositions. The polymers are combined with a latent photoacid, which when exposed to actinic radiation removes the acid sensitive blocking moiety, preferably an acetal or ketal group, leaving a methylol group or substituted methylol group remaining attached to the nitrogen atom, which groups are subsequently removed by exposure to aqueous alkaline developing solutions, leaving only imide groups, ##STR1## The new monomer is a derivative of maleimide in which the imide hydrogen has been replaced with a methylol group, which is subsequently reacted to form an acetal or ketal. Preferred monomers include N-(2,4-dioxa-3,3-dimethylpentyl)-2H,5H-2,5-dioxopyrrole and related compounds.

Abstract: Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are attached.The imide group ##STR1## can be blocked with certain groups, X, to form compounds containing the structure ##STR2## which have solubility properties different from the unblocked imide. These groups, X, can be cleaved by acid under the proper conditions to regenerate the unblocked imide. Where the imide group is incorporated in a polymer, the polymer with blocked imide groups can be made to function as a resist when compounded with a substance capable of forming an acid upon exposure to radiation.Preferred polymers are those in which at least 80% of the imide groups are blocked. When less than 50% of the imide groups are blocked, performance in a photoresist becomes unacceptable.

Abstract: Disclosed are substituted derivatives of 5-diazobarbituric acid selected from those having the formulas: ##STR1## wherein R.sub.1 and R.sub.2 are substituents selected from the group consisting of C.sub.3 to C.sub.12 alkyl, cyclohexyl, benzyl and C.sub.2 to C.sub.6 aralkyl groups, wherein R.sub.3 and R.sub.4 are substituents selected from the group consisting of C.sub.1 to C.sub.12 alkyl, cyclohexyl, benzyl or other C.sub.2 to C.sub.6 aralkyl groups and R.sub.5 is selected from the group consisting of .alpha.,.omega.-disubstituted C.sub.2 to C.sub.12 alkyl, methylene dicyclohexyl, or C.sub.1 to C.sub.6 dialkylphenylene.These compounds provide DUV response with an absorption maximum near 260 nm. The substituents are chosen to be nonabsorbing alkyl groups that allow efficient photobleaching of the sensitizer during exposure.The sensitizers of the present invention are designed to function in the DUV region and are useful in the manufacture of semi-conductor devices.