Patents by Inventor Michael J. Parent

Michael J. Parent has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Amine-Containing Polymers, Dispersions Thereof and Methods of Making and Using the Same
    Publication number: 20200291144
    Abstract: Described herein is a polymer comprising: interpolymerized units of (i) a fluorinated terminal alkene monomer and (ii) a tertiary amine-containing fluorinated monomer comprising at least one of a vinyl amine, a substituted vinyl amine, an allyl amine, a substituted allyl amine, and combinations thereof, wherein the polymer can be amorphous or semi-crystalline with a melting point no greater than 325° C. Dispersions thereof and methods of making and using the same are also described.
    Type: Application
    Filed: June 2, 2020
    Publication date: September 17, 2020
    Inventors: Michael J. Bulinski, Michael G. Costello, Denis Duchesne, Klaus Hintzer, William M. Lamanna, Kai H. Lochhaas, Michael J. Parent, Sean M. Smith
  • Amine-containing polymers, dispersions thereof and methods of making and using the same
    Patent number: 10703833
    Abstract: Described herein is a polymer comprising: interpolymerized units of (i) a fluorinated terminal alkene monomer and (ii) a tertiary amine-containing fluorinated monomer comprising at least one of a vinyl amine, a substituted vinyl amine, an allyl amine, a substituted allyl amine, and combinations thereof; wherein the polymer can be amorphous or semi-crystalline with a melting point no greater than 325° C. Dispersions thereof and methods of making and using the same are also described.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: July 7, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Michael J. Bulinski, Michael G. Costello, Denis Duchesne, Klaus Hintzer, William M. Lamanna, Kai H. Lochhaas, Michael J. Parent, Sean M. Smith
  • Amine-Containing Polymers, Dispersions Thereof and Methods of Making and Using the Same
    Publication number: 20180319908
    Abstract: Described herein is a polymer comprising: interpolymerized units of (i) a fluorinated terminal alkene monomer and (ii) a tertiary amine-containing fluorinated monomer comprising at least one of a vinyl amine, a substituted vinyl amine, an allyl amine, a substituted allyl amine, and combinations thereof; wherein the polymer can be amorphous or semi-crystalline with a melting point no greater than 325C. Dispersions thereof and methods of making and using the same are also described.
    Type: Application
    Filed: December 13, 2016
    Publication date: November 8, 2018
    Inventors: Michael J. Bulinski, Michael G. Costello, Denis Duchesne, Klaus Hintzer, William M. Lamanna, Kai H. Lochhaas, Michael J. Parent, Sean M. Smith
  • Fluorinated sulfonamide surfactants for aqueous cleaning solutions
    Patent number: 7985723
    Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: July 26, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Patricia M. Savu, William M. Lamanna, Michael J. Parent
  • FLUORINATED SULFONAMIDE SURFACTANTS FOR AQUEOUS CLEANING SOLUTIONS
    Publication number: 20100320416
    Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
    Type: Application
    Filed: August 30, 2010
    Publication date: December 23, 2010
    Inventors: Patricia M. Savu, William M. Lamanna, Michael J. Parent
  • Fluorinated sulfonamide surfactants for aqueous cleaning solutions
    Patent number: 7811978
    Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: October 3, 2007
    Date of Patent: October 12, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Patricia M. Savu, William M. Lamanna, Michael J. Parent
  • METHOD OF MAKING A COMPOSITION AND AQUEOUS COMPOSITION PREPARABLE THEREBY
    Publication number: 20100160458
    Abstract: A method of making a composition comprises independently providing a first component comprising a first compound, and a second components comprising a second compound; and combining the first component and the second component, wherein: a) the first compound is represented by and b) the second compound is represented by Rf represents a perfluoroalkyl group having from 1 to 12 carbon atoms. R1, R2, R3, and R4 each independently represent H or an alkyl group having from 1 to 6 carbon atoms. R5 represents H, an alkyl group having from 1 to 6 carbon atoms, or a hydroxyalkyl group having from 1 to 6 carbon atoms. R6 and R7 each independently represent an alkyl group having from 1 to 6 carbon atoms, or a hydroxyalkyl group having from 1 to 6 carbon atoms. Compositions preparable according to the method are also disclosed.
    Type: Application
    Filed: November 25, 2009
    Publication date: June 24, 2010
    Inventors: Patricia M. Savu, Philip G. Clark, Michael J. Parent, Jason M. Kehren
  • Coatable composition
    Patent number: 7572848
    Abstract: A coatable composition that comprises water, a film-forming organic polymer, and a leveling agent comprising an anionic species represented by the formula wherein Rf represents a perfluoroalkyl group having from 4 to 6 carbon atoms, and R represents H or an alkyl group having from 1 to 18 carbon atoms.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: August 11, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Patricia M. Savu, Michael J. Parent, William M. Lamanna
  • Fluorinated sulfonamide surfactants for aqueous cleaning solutions
    Patent number: 7294610
    Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: November 13, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Patricia M. Savu, William M. Lamanna, Michael J. Parent
  • Fluorinated surfactants for buffered acid etch solutions
    Patent number: 7169323
    Abstract: The present invention is directed to certain fluorinated surfactants, and use thereof in acid etch solutions, such as in aqueous buffered acid etch solutions. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: January 30, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Michael J. Parent, Patricia M. Savu, Richard M. Flynn
  • Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
    Patent number: 7147767
    Abstract: The present invention provides plating solutions having either copper bis(perfluoroalkanesulfonyl) imides or copper tris(perfluoroalkanesulfonyl) methides and methods of electrochemically or chemically depositing copper interconnects using these plating solutions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: December 12, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Steven D. Boyd, Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera, Haiyan Zhang
  • Fluorinated surfactants for aqueous acid etch solutions
    Patent number: 7101492
    Abstract: Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: September 5, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Michael J. Parent, Patricia M. Savu, Richard M. Flynn, Zhongxing Zhang, William M. Lamanna, Zai-Ming Qiu, George G. I. Moore
  • Bis(perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor
    Patent number: 7030067
    Abstract: The present invention provides for the use of bis(perfluoroalkanesulfonyl)imide and its salts as surfactants or additives applications having an extreme environment.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: April 18, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: William M. Lamanna, Patricia M. Savu, Michael J. Parent, Lawrence A. Zazzera
  • Dyed fluoropolymers
    Patent number: 6894105
    Abstract: Dyed fluoropolymers that are useful, for example, as conformal coatings comprise the reaction product of one or more fluorochemical (meth)acrylate monomers and one or more (meth)acrylate functional dyes. Coating compositions comprise the dyed fluoropolymer and articles are coated with the coating composition.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: May 17, 2005
    Assignee: 3M Innovatives Properties Company
    Inventors: Michael J. Parent, Patricia M. Savu, Harry E. Johnson, David B. Olson
  • Fluorinated surfactants for aqueous acid etch solutions
    Patent number: 6890452
    Abstract: Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: May 10, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Michael J. Parent, Patricia M. Savu, Richard M. Flynn, Zhongxing Zhang, William M. Lamanna, Zai-Ming Qiu, George G. I. Moore
  • Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
    Patent number: 6884338
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids compositions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: April 26, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera
  • Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
    Patent number: 6858124
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: February 22, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Lawrence A. Zazzera, Michael J. Parent, William M. Lamanna, Susrut Kesari
  • Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
    Publication number: 20040112756
    Abstract: The present invention provides plating solutions having either copper bis(perfluoroalkanesulfonyl) imides or copper tris(perfluoroalkanesulfonyl) methides and methods of electrochemically or chemically depositing copper interconnects using these plating solutions.
    Type: Application
    Filed: December 16, 2002
    Publication date: June 17, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Steven D. Boyd, Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera, Haiyan Zhang
  • Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
    Publication number: 20040112759
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.
    Type: Application
    Filed: December 16, 2002
    Publication date: June 17, 2004
    Inventors: Lawrence A. Zazzera, Michael J. Parent, William M. Lamanna, Susrut Kesari
  • Methods for polishing and/or cleaning copper interconnects and/or film and compositons therefor
    Publication number: 20040112753
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids compositions.
    Type: Application
    Filed: December 16, 2002
    Publication date: June 17, 2004
    Inventors: Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera