Patents by Inventor Michael J. Renn
Michael J. Renn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100255209Abstract: Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.Type: ApplicationFiled: March 9, 2010Publication date: October 7, 2010Applicant: OPTOMEC, INC.Inventors: Michael J. Renn, Bruce H. King, Jason A. Paulsen
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Publication number: 20100192847Abstract: A miniaturized aerosol jet, or an array of miniaturized aerosol jets for direct printing of various aerosolized materials. In the most commonly used embodiment, an aerosol stream is focused and deposited onto a planar or non-planar target, forming a pattern that is thermally or photochemically processed to achieve physical, optical, and/or electrical properties near that of the corresponding bulk material. The apparatus uses an aerosol jet deposition head to form an annularly propagating jet composed of an outer sheath flow and an inner aerosol-laden carrier flow. Miniaturization of the deposition head facilitates the fabrication and operation of arrayed deposition heads, enabling construction and operation of arrays of aerosol jets capable of independent motion and deposition. Arrayed aerosol jets provide an increased deposition rate, arrayed deposition, and multi-material deposition.Type: ApplicationFiled: April 15, 2010Publication date: August 5, 2010Applicant: OPTOMEC, INC.Inventors: Michael J. Renn, Bruce H. King, Jason A. Paulsen
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Patent number: 7674671Abstract: Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.Type: GrantFiled: December 12, 2005Date of Patent: March 9, 2010Assignee: Optomec Design CompanyInventors: Michael J. Renn, Marcelino Essien, Bruce H. King, Jason A. Paulsen
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Patent number: 7658163Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.Type: GrantFiled: July 20, 2006Date of Patent: February 9, 2010Assignee: Optomec Design CompanyInventors: Michael J. Renn, Bruce H. King, Manampathy G. Giridharan, Jyh-Cherng Sheu
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Publication number: 20090114151Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.Type: ApplicationFiled: January 6, 2009Publication date: May 7, 2009Applicant: OPTOMEC, INC. FKA OPTOMEC DESIGN COMPANYInventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
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Publication number: 20090061089Abstract: A deposition apparatus comprising one or more atomizers structurally integrated with a deposition head. The entire head may be replaceable, and prefilled with material. The deposition head may comprise multiple nozzles. Also an apparatus for three dimensional materials deposition comprising a tiltable deposition head attached to a non-tiltable atomizer. Also methods and apparatuses for depositing different materials either simultaneously or sequentially.Type: ApplicationFiled: September 2, 2008Publication date: March 5, 2009Applicant: OPTOMEC, INC.Inventors: Bruce H. King, Gregory J. Marquez, Michael J. Renn
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Patent number: 7485345Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.Type: GrantFiled: December 22, 2005Date of Patent: February 3, 2009Assignee: Optomec Design CompanyInventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Gregory J. Marquez, Manampathy G. Giridharan, Jyh-Cherng Sheu
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Patent number: 7294366Abstract: A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like.Type: GrantFiled: September 27, 2004Date of Patent: November 13, 2007Assignee: Optomec Design CompanyInventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Manampathy G. Giridharan, Jyh-Cherng Sheu
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Patent number: 7270844Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.Type: GrantFiled: September 20, 2004Date of Patent: September 18, 2007Assignee: Optomec Design CompanyInventor: Michael J. Renn
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Patent number: 7108894Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.Type: GrantFiled: February 5, 2002Date of Patent: September 19, 2006Assignee: Optomec Design CompanyInventor: Michael J. Renn
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Patent number: 7059371Abstract: A security handbag system comprising a purse with a detachable portion removably coupled to the side of the purse and attached to the waist of a user. The detachable portion has pockets to hold the users valuables including cash, credit cards, defensive chemical spray and cellular phone. Upon extraordinary pulling away of the purse, the detachable portion remains attached to the user and uncouples from the purse.Type: GrantFiled: September 3, 2004Date of Patent: June 13, 2006Inventor: Michael J. Renn
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Patent number: 7045015Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.Type: GrantFiled: January 17, 2003Date of Patent: May 16, 2006Assignee: Optomec Design CompanyInventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Lemna J. Hunter
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Patent number: 6823124Abstract: A method and device for using laser light to trap non-atomic particles optically within a hollow region of a hollow core optical fiber.Type: GrantFiled: May 19, 2000Date of Patent: November 23, 2004Assignee: Optomec Design CompanyInventors: Michael J. Renn, David J. Odde, Robert L. Pastel
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Publication number: 20040197493Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.Type: ApplicationFiled: December 23, 2003Publication date: October 7, 2004Applicant: Optomec Design CompanyInventors: Michael J. Renn, Bruce H. King, Marcelino Essien, David Keicher
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Publication number: 20040179808Abstract: Methods and apparatus are disclosed for using a beam of energy, specifically laser light (46), to transport, suspend or trap non-atomic size particles (59) within a hollow-core optical fiber (50), manipulating the particles (59) along the fiber (50) over distances and depositing them on a substrate (58). A laser generates a beam (46) focused on a fiber (50) entrance (56). A source (54) delivers particles (52) to the entrance (56). Particles (52) are drawn into the beam (46) and propelled through the core (48) of the fiber (50). Forces (F1-F4) on a particle (12) generated by reflection, absorption and refraction of laser light (20) keep the particle (12) close to the fiber's center and propel it along the fiber's length. A variety of micron-size particles, including solids, solid dielectrics, semiconductors, liquids, aerosols and living cells are conveyed.Type: ApplicationFiled: October 21, 2003Publication date: September 16, 2004Applicant: Optomec Design CompanyInventor: Michael J. Renn
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Publication number: 20030228124Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.Type: ApplicationFiled: January 17, 2003Publication date: December 11, 2003Inventors: Michael J. Renn, Bruce H. King, Marcelino Essien, Lemna J. Hunter
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Patent number: 6636676Abstract: Methods and apparatus are disclosed for using a beam of energy, specifically laser light (46), to transport, suspend or trap non-atomic size particles (59) within a hollow-core optical fiber (50), manipulating the particles (59) along the fiber (50) over distances and depositing them on a substrate (58). A laser generates a beam (46) focused on a fiber (50) entrance (56). A source (54) delivers particles (52) to the entrance (56). Particles (52) are drawn into the beam (46) and propelled through the core (48) of the fiber (50). Forces (F1-F4) on a particle (12) generated by reflection, absorption and refraction of laser light (20) keep the particle (12) close to the fiber's center and propel it along the fiber's length. A variety of micron-size particles, including solids, solid dielectrics, semiconductors, liquids, aerosols and living cells are conveyed.Type: GrantFiled: June 1, 2000Date of Patent: October 21, 2003Assignee: Optomec Design CompanyInventor: Michael J. Renn
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Publication number: 20030048314Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.Type: ApplicationFiled: February 5, 2002Publication date: March 13, 2003Applicant: Optomec Design CompanyInventor: Michael J. Renn
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Publication number: 20030020768Abstract: Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.Type: ApplicationFiled: January 30, 2002Publication date: January 30, 2003Inventor: Michael J. Renn
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Patent number: 5615558Abstract: A device and method for laser cooling of a solid to extremely low temperature is disclosed, the device including an active cooling structure having a high purity surface passivated direct band gap semiconductor crystal of less than about 3 microns thick and a transparent hemispherical body in optical contact with the crystal. The crystal is itself cooled when illuminated with a laser beam tuned to a frequency no greater than the band gap edge frequency of the crystal. Cooling is caused by emission of photons of higher energy than photons entering the crystal, the additional energy being accounted for by process of absorption of thermal phonons from the crystal lattice.Type: GrantFiled: September 25, 1995Date of Patent: April 1, 1997Inventors: Eric A. Cornell, Michael J. Renn