Abstract: A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.

Abstract: Described are optical apparatuses and methods for forming optical apparatuses. The optical apparatus includes a plurality of individually fabricated segments and a holder. Each of the plurality of individually fabricated segments include an inner annular surface and an outer contact surface opposite to the inner annular surface. Each of the inner annular reflecting surfaces define a longitudinal segment axis. The holder contacts each of the outer contact surfaces of the plurality of individually fabricated segments. Each of the longitudinal segment axes of the plurality of individually fabricated segments are linearly aligned.

Abstract: Described are optical apparatuses and methods for forming optical apparatuses. The optical apparatus includes a plurality of individually fabricated segments and a holder. Each of the plurality of individually fabricated segments include an inner annular surface and an outer contact surface opposite to the inner annular surface. Each of the inner annular reflecting surfaces define a longitudinal segment axis. The holder contacts each of the outer contact surfaces of the plurality of individually fabricated segments. Each of the longitudinal segment axes of the plurality of individually fabricated segments are linearly aligned.