Abstract: An integrated circuit (IC), comprising: a first input pin for receiving a first input signal; a first converter configured to convert the first input signal to a first output signal; a first gain stage configured to apply a first gain to the first output signal; gain update circuitry configured to: output a first external gain control signal to a first output pin of the IC; and subsequently output a first internal gain control signal to the first gain stage to update the first gain of the first gain stage, wherein output of the first internal gain control signal is delayed relative to output of the first external gain control signal by a first predetermined delay, the first predetermined delay to compensate for signal chain delay between the first input pin and the first gain stage, wherein the gain update circuitry comprises level detection circuitry configured to determine a signal level of the first input signal or the first output signal.

Abstract: A computer system configured to autonomously provision at least a portion of a desktop as a service (DaaS) system is provided. The computer system includes a memory, a network interface, and a processor configured to receive, via the network interface, a request to add a catalog of virtual desktops to an account associated with a tenant of the computing service, and transmit, in response to reception of the request, a plurality of requests to the computing service. The plurality of requests comprise at least one request to create a first virtual network associated with the tenant within the computing service, at least one request to connect the first virtual network to a second virtual network within the computing service, and at least one request to create the catalog within the computing service.

Abstract: Plasma etching device and process in which a chamber is divided into two regions by a perforated screen. Objects to be etched are placed in one region, and a plasma is formed in the other region. Etching occurs in the first region, and structure is included for heating the etched objects in the first region to facilitate the removal of photoresist used to define the areas to be etched.