Abstract: A method of encapsulating materials to protect circuit components from the stress of thermal cycling includes applying a first substance to cover Wire bonds on a first layer, applying a second substance to wire bonds on a second layer, and curing the first and second substances by application of heat or radiation to bond the first and second substances together. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or the meaning of the claims.

Abstract: A system and method for reducing periodic intensity variation in a video image includes applying input signals representing video image data to multiple circuit components by sequentially shifting the input signals through the circuit components to produce output signals that match corresponding input signals. Matching the output signals to the input signals overcomes the effect of inherent differences in characteristics of analog circuit components. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or the meaning of the claims.

Abstract: A method and apparatus for enhancing performance of a projection system by blocking incident angle light rays without increasing the F-number of the system includes a skew filter having a shaped aperture. The skew filter blocks a substantial portion of the skew light rays while allowing other light rays to pass through the projection system. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or the meaning of the claims.

Abstract: A method and system for providing compliance with a management scheme, such as the Individuals with Disabilities Education Act, and a method and system for tailoring the management scheme to management entity requirements. One variation allows inclusion of multiple management entities in an application/database, with configuring and processing for each individually. More than one management scheme can be extant for each management entity. The management scheme allows information input regarding entities subject to the scheme, requirements identification regarding each entity, and iterative generation of additional input to ensure compliance with the management scheme. One entity can be subject to more than one management schemes.

Abstract: A computerized method and system for analyzing data relating to a mandated program or an individualized instructional program. The method includes receiving a query, accessing a repository of data relating to the mandated program; and identifying data responsive to the query. The system includes: a network; a terminal coupled to the network; and a server coupled to the network that comprises a program that receives a query, accesses a repository of data relating to the mandated program; and identifies data responsive to the query. The data includes special education-related data such as tenth suspension and related meeting data, annual meeting status data, reevaluation meeting status data, referral processing status data, gap analysis data, individual education plan implementation delay data, drop out and other exit reason data, individual education plan assessment completion status data, and least restrictive environment data.

Abstract: Multilayer film stacks and gray scale processing methods are employed for fabricating phase-shifting masks (PSMs) utilized in lithography. Desired optical transmission and phase-shifting functions of the mask are achieved by controlling the optical properties and thickness of constituent film layers. The mask can be tuned for optimal performance at various wavelengths to an extent beyond that obtainable using a single layer film to control both attenuation and phase shifting of incident light. The processing methods exploit multi-level electron beam or optical beam lithography techniques, and the etch selectivity afforded by selection of appropriate materials for the film stack, to obtain improved yields and reduced processing costs for fabrication of PSMs. In particular, diamond-like carbon (DLC) materials formed by ion beam deposition and having a stress of 1 GPa or less are utilized as etch stop layers.