Patents by Inventor Michael Johannes Hendrika Wilhelmina RENDERS

Michael Johannes Hendrika Wilhelmina RENDERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and an object positioning system
    Patent number: 9939738
    Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: April 10, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent
  • A LITHOGRAPHIC APPARATUS AND AN OBJECT POSITIONING SYSTEM
    Publication number: 20170212429
    Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.
    Type: Application
    Filed: July 16, 2015
    Publication date: July 27, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik KOEVOETS, Christianus Wilhelmus Johannes BERENDSEN, Rogier Hendrikus Magdalena CORTIE, Jim Vincent OVERKAMP, Patricius Jacobus NEEFS, Putra SAPUTRA, Ruud Hendrikus Martinus Johannes BLOKS, Michael Johannes Hendrika Wilhelmina RENDERS, Johan Gertrudis Cornelis KUNNEN, Thibault Simon Mathieu LAURENT
  • Lithographic apparatus and an object positioning system
    Patent number: RE49142
    Abstract: A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: July 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent