Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.

Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.

Abstract: A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

Abstract: A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

Abstract: A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

Abstract: Actuator arrangement with an actuator (8), a reference mass (22), a spring (24) and a first sensor (26; 42, 43; 32, 36). The actuator (8) applies a force between a first object (2) relative to a second object (16; 54). The reference mass (22) is, in use, supported by a third object (16; 56) by means of the spring (24). The first sensor (26; 42, 43; 32, 36) generates a first distance signal that depends on a first distance (z2; z5,z6; z3,z4) between the reference mass (22) and the first object (2) and is provided to a controller (6) to actuate the actuator (8).

Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.

Abstract: A position control system configured to control the position of a movable object, includes: a position measurement system configured to determine a position of a sensor or sensor target on the movable object, a comparator configured to provide an error signal by comparing a set-point position and a position feed-back signal based on the measured position, a controller to provide a control signal based on the error signal, a feed-forward device to provide a feed-forward signal on the basis of a first signal related to the desired position, and one or more actuators configured to act on the movable object based on the control signal and the feed-forward signal, wherein the position control system further includes a compliance compensation device providing a compliance compensation signal, wherein the compliance compensation signal is subtracted from a measured position of the position measurement system to obtain the feed-back position signal.

Abstract: A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

Abstract: Actuator arrangement with an actuator (8), a reference mass (22), a spring (24) and a first sensor (26; 42, 43; 32, 36). The actuator (8) applies a force between a first object (2) relative to a second object (16; 54). The reference mass (22) is, in use, supported by a third object (16; 56) by means of the spring (24). The first sensor (26; 42, 43; 32, 36) generates a first distance signal that depends on a first distance (z2; z5,z6; z3,z4) between the reference mass (22) and the first object (2) and is provided to a controller (6) to actuate the actuator (8).

Abstract: Actuator arrangement with an actuator (8), a reference mass (22), a spring (24) and a first sensor (26; 42, 43; 32, 36). The actuator (8) applies a force between a first object (2) and to a second object (16; 54). The reference mass (22) is, in use, supported by a third object (16; 56) by means of the spring (24). The first sensor (26; 42, 43; 32, 36) generates a first distance signal that depends on a first distance (z2; z5, z6; z3, z4) between the reference mass (22) and the first object (2) and is applied to a controller (6) to actuate the actuator (8).

Abstract: A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.

Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.

Abstract: A position control system configured to control the position of a movable object, includes: a position measurement system configured to determine a position of a sensor or sensor target on the movable object, a comparator configured to provide an error signal by comparing a set-point position and a position feed-back signal based on the measured position, a controller to provide a control signal based on the error signal, a feed-forward device to provide a feed-forward signal on the basis of a first signal related to the desired position, and one or more actuators configured to act on the movable object based on the control signal and the feed-forward signal, wherein the position control system further includes a compliance compensation device providing a compliance compensation signal, wherein the compliance compensation signal is subtracted from a measured position of the position measurement system to obtain the feed-back position signal.

Abstract: A lithographic apparatus includes a bearing configured to support a first part with respect to a second part of the apparatus in a first direction such that the first part is moveable in a second direction relative to the second part. The bearing passively supports the first part in three degrees of freedom. The first part is coupled to at least one permanent magnet, and the second part is coupled to at least two permanent magnets. The permanent magnet of the first part is positioned substantially between the permanent magnets of the second part. A field orientation of the permanent magnets is substantially parallel to the first direction and the permanent magnet of the first part has a substantially opposite polarity to at least one of the magnets of the second part.

Abstract: System for and method of active vibration isolation to isolate a payload (57) from earth movements. The system has a body (16; 51), a mass (41) supported by the body (51) by means of at least one spring (45), a further mass (39) supported by the mass (41) by means of at least one further spring (43). A sensor senses a distance between the mass (41) and the further mass (39) and generates a distance signal. A controller (49) receives the distance signal and generates a control signal based on the distance signal. An actuator (47) actuates a position of said mass (41) based on the control signal, whereas the further mass supports the payload to be isolated from earth (16).

Abstract: System for and method of active vibration isolation to isolate a payload (57) from earth movements. The system has a body (16; 51), a mass (41) supported by the body (51) by means of at least one spring (45), a further mass (39) supported by the mass (41) by means of at least one further spring (43). A sensor senses a distance between the mass (41) and the further mass (39) and generates a distance signal. A controller (49) receives the distance signal and generates a control signal based on the distance signal. An actuator (47) actuates a position of said mass (41) based on the control signal, whereas the further mass supports the payload to be isolated from earth (16).