Patents by Inventor Michael Joseph Rooks

Michael Joseph Rooks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7037638
    Abstract: A high sensitivity, organic solvent developable, high resolution photoresist composition for use in E-beam lithography is disclosed. The composition of the present invention comprises a high sensitivity, soluble, film forming photoresist composition of dendrimeric calix [4]arene derivatives and processes for forming lithographic patterns with a crosslinker selected from glycoluril derivatives capable of reacting with these dendrimer under acid catalysis, a photoacid generator and an organic solvent. The composition of the present invention is particularly useful for production of negative tone images of high resolution (less than 100 nanometers).
    Type: Grant
    Filed: October 10, 2000
    Date of Patent: May 2, 2006
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Tricia Lynn Breen, Jeffrey Donald Gelorme, David Brian Mitzi, Michael Joseph Rooks
  • Patent number: 6280908
    Abstract: A method of improving the etch resistance of a patterned imageable resist prior to patterning an underlying substrate layer is provided. Specifically, the method employed by the present invention comprises applying a layer of an imageable resist to a substrate layer; patterning the layer of imageable resist by removing selective areas thereof; and treating the patterned imageable resist with an atmosphere comprising molecules of a hardening agent so as to obtain a hardened resist surface which etches at a slower rate than that of the untreated resist.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, Michael Joseph Rooks