Patents by Inventor Michael Jozefa Mathijs Renkens

Michael Jozefa Mathijs Renkens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 7397040
    Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: July 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
  • Lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7084953
    Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: August 1, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
  • Lithographic apparatus and device manufacturing method
    Patent number: 7049592
    Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: May 23, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Pertrus Rutgerus Bartray, Marc Wilhelmus Maria Van Der Wijst, Michael Jozefa Mathijs Renkens, Gerard Van Schothorst, Johan Juliana Dries
  • Lithographic apparatus, device manufacturing method and device manufacturing thereby
    Publication number: 20040195527
    Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
    Type: Application
    Filed: April 16, 2004
    Publication date: October 7, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6740891
    Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: May 25, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
  • Lithographic apparatus and device manufacturing method
    Publication number: 20040065847
    Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
    Type: Application
    Filed: July 9, 2003
    Publication date: April 8, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Pertrus Rutgerus Bartray, Marc Wilhelmus Maria Van Der Wijst, Michael Jozefa Mathijs Renkens, Gerard Van Schothorst, Johan Juliana Dries
  • Lithographic projection apparatus and device manufacturing method
    Patent number: 6597431
    Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.
    Type: Grant
    Filed: July 6, 2001
    Date of Patent: July 22, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Jozef Petrus Henricus Benschop, Oscar Fransiscus Jozephus Noordman, Michael Jozefa Mathijs Renkens, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Antonius Johannes Josephus van Dijsseldonk
  • Lithographic apparatus, device manufacturing mehtod, and device manufactured thereby
    Publication number: 20020079464
    Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
    Type: Application
    Filed: November 21, 2001
    Publication date: June 27, 2002
    Applicant: ASM LITHOGRAPHY B.V.
    Inventors: Johannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
  • Lithographic projection apparatus and device manufacturing method
    Publication number: 20020018194
    Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.
    Type: Application
    Filed: July 6, 2001
    Publication date: February 14, 2002
    Inventors: Jozef Petrus Henricus Benschop, Oscar Fransiscus Jozephus Noordman, Michael Jozefa Mathijs Renkens, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Antonius Johannes Josephus Van Van Dijsseldonk