Abstract: The present application relates to methods for the reduction of halogenated hydrocarbons using compounds of Formula (I): wherein the reduction of the halogenated compounds is carried out, for example, under ambient conditions without the need for a transition metal containing co-factor. The present application also relates to methods of recovering precious metals using compounds of Formula (I) that are absorbed onto a support material.

Abstract: The invention provides an organometallic complex, containing oxygen free organic ligands, for the deposition of a metal, preferably copper, silver or gold, and preferably by way of chemical vapor deposition. The organometallic complex having the formula [(Do)nMLx]k where M is a metal preferably selected from the group consisting of Cu, Ag and Au; Do is selected from the group comprising ethers, phosphines, olefins, sulfides, pyridines, carbonyl, hydroxyl, cyclopentadiene, benzene derivatives, allyls, alkyls, amines, polyamines, aniline derivatives, cyclooctadiene and combinations thereof; n is an integer having a value from 0 to 4; k is an integer having a value from 1 to 4; x is an integer having a value from 1 to 4; and L is an amidinate ligand of the formula R1—NC(R2)N—R3 where R1, R2 and R3 are selected from the group consisting of alkyls, allyls, aryls, heteroaryls, hydrogen, non-metals and metalloids; and where R1, R2 and R3 are different or the same.