Patents by Inventor Michael Keitmann

Michael Keitmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6599687
    Abstract: A process for producing structured or patterned protective and insulating layers includes applying a solution of a photosensitive polyhydroxyamide or polyhydroxyimide to a substrate and drying. The layer is patterned or structured by irradiation with UV light or X-rays through the use of a mask or by guidance of a UV or electron beam and by subsequent aqueous-alkali development. The patterned or structured layer is irradiated over the whole area with UV light and then tempered or heat-treated.
    Type: Grant
    Filed: September 18, 1998
    Date of Patent: July 29, 2003
    Assignee: Osram Opto Semiconductor GmbH Co. OHG
    Inventors: Ewald Günther, Recai Sezi, Michael Keitmann
  • Patent number: 6437178
    Abstract: The invention relates to novel o-aminophenolcarboxylic acids or o-aminothiophenolcarboxylic acids of the following structure in which: A1 to A7 are—independently of one another—H, CH3, OCH3, CH2CH3 or OCH2CH3; T is O or S, and m is 0 or 1; Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: August 20, 2002
    Assignee: Infineon Technologies AG
    Inventors: Recai Sezi, Michael Keitmann
  • Publication number: 20010056203
    Abstract: The invention relates to novel o-aminophenolcarboxylic acids or o-aminothiophenolcarboxylic acids of the following structure 1
    Type: Application
    Filed: July 9, 2001
    Publication date: December 27, 2001
    Applicant: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann
  • Patent number: 6320081
    Abstract: The invention relates to novel o-nitrophenol derivatives and o-nitrothiophenol derivatives of the following structure: where: A1 to A3 are—independently of one another—H, F, CH3, CF3, OCH3, OCF3, CH2CH3, CF2CF3, OCH2CH3 or OCF2CF3; T is O or S; R is an aliphatic or araliphatic radical; and R* is H or R.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: November 20, 2001
    Assignee: Infineon Technologies AG
    Inventors: Michael Keitmann, Recai Sezi, Andreas Weber
  • Patent number: 6310238
    Abstract: The invention relates to novel o-aminophenolcarboxylic acids or o-aminothiophenolcarboxylic acids of the following structure in which: A1 to A7 are—independently of one another—H, CH3, OCH3, CH2CH3 or OCH2CH3; T is O or S, and m is 0 or 1; Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: October 30, 2001
    Assignee: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann
  • Patent number: 6156902
    Abstract: The invention relates to novel bis-o-aminophenols, and bis-o-aminothiophenols of the following structure: ##STR1## where A.sup.1 to A.sup.3 are--independently of one another--H, CH.sub.3, OCH.sub.3, CH.sub.2 CH.sub.3, or OCH.sub.2 CH.sub.3T is O or S, andZ is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: December 5, 2000
    Assignee: Infineon Technologies AG
    Inventors: Recai Sezi, Michael Keitmann, Andreas Weber
  • Patent number: 6153350
    Abstract: The polybenzoxazole and polybenzothiazole precursors of the invention have the following partial structure: ##STR1## where: A.sup.1 to A.sup.6 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.3 CF.sub.3 ;T is O or S, and m is 1;Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 25, 1998
    Date of Patent: November 28, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann, Gunther Schmid
  • Patent number: 6150558
    Abstract: The invention relates to novel bis-o-aminophenols, and bis-o-aminothiophenols of the following structure: ##STR1## where A.sup.1 to A.sup.6 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.6 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: November 21, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann
  • Patent number: 6120970
    Abstract: The polybenzoxazole and polybenzothiazole precursors of the invention have the following partial structure: ##STR1## where: A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3 ;T is O or S, and m is 1;Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 25, 1998
    Date of Patent: September 19, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann
  • Patent number: 6096921
    Abstract: The invention relates to novel o-aminophenolcarboxylic acids, and o-aminothiophenolcarboxylic acids of the following structure: ##STR1## where A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.3 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 1, 1999
    Date of Patent: August 1, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann
  • Patent number: 5998662
    Abstract: The invention relates to novel o-aminophenolcarboxylic acids, and o-aminothiophenolcarboxylic acids of the following structure: ##STR1## where A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.3 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.
    Type: Grant
    Filed: September 25, 1998
    Date of Patent: December 7, 1999
    Assignee: Siemens Aktiengesellschaft
    Inventors: Recai Sezi, Michael Keitmann