Abstract: A lithography system for forming geometric patterns on a workpiece is described herein. The lithography system may include a reflective liquid crystal display comprising an array of configurable pixels, a radiation source for directing radiation onto the reflective liquid crystal display, a projection system for reducing a radiation pattern reflected by the reflective liquid crystal display and projecting the reduced radiation pattern onto a workpiece, and a stage for holding the workpiece. The lithography system may be used to form geometric patterns on a substrate during semiconductor fabrication.

Abstract: Processes for fabricating a semiconductor device are described herein. In one aspect of the invention, an exemplary process includes forming an interface layer overlying the device substrate, forming a silver layer overlying the interface layer, annealing the substrate to form an intermetallic layer between the silver layer and the interface layer, the silver layer is in intimate contact with the intermetallic layer, and forming a protection layer overlying the silver layer. Other interconnect structures and processes are also described.

Abstract: Processes for fabricating a semiconductor device are described herein. In one aspect of the invention, an exemplary process includes forming an interface layer overlying the device substrate, forming a silver layer overlying the interface layer, annealing the substrate to form an intermetallic layer between the silver layer and the interface layer, the silver layer is in intimate contact with the intermetallic layer, and forming a protection layer overlying the silver layer. Other interconnect structures and processes are also described.

Abstract: Liquid crystal on silicon (LCOS) cells include a plurality of pixel elements formed between substrates. Spacers are formed on a portion of some of the pixel elements and positioned in the cell gap. The spacers on each of these LCOS cells reflecting different colors are formed in different locations in each cell. The result is that substantially none of the spacers create overlapping dead spots in a composite image. The spacers are further distributed among these pixel elements such that spacers are absent from some pixel elements and such that there is a substantially uniform thickness in the cell gaps. The reduced severity of the dead spots in the composite image as a result of the spacers in different locations, the reduced size and number of the spacers, and the uniformity in the cell gaps provide higher optical image quality.

Abstract: Liquid crystal on silicon (LCOS) cells include a plurality of pixel elements formed between substrates. Spacers are formed on a portion of some of the pixel elements and positioned in the cell gap. The spacers on each of these LCOS cells reflecting different colors are formed in different locations in each cell. The result is that substantially none of the spacers create overlapping dead spots in a composite image. The spacers are further distributed among these pixel elements such that spacers are absent from some pixel elements and such that there is a substantially uniform thickness in the cell gaps. The reduced severity of the dead spots in the composite image as a result of the spacers in different locations, the reduced size and number of the spacers, and the uniformity in the cell gaps provide higher optical image quality.

Abstract: Processes for fabricating a semiconductor device are described herein. In one aspect of the invention, an exemplary process includes forming an interface layer overlying the device substrate, forming a silver layer overlying the interface layer, annealing the substrate to form an intermetallic layer between the silver layer and the interface layer, the silver layer is in intimate contact with the intermetallic layer, and forming a protection layer overlying the silver layer. Other interconnect structures and processes are also described.

Abstract: A lithography system for forming geometric patterns on a workpiece is described herein. The lithography system may include a reflective liquid crystal display comprising an array of configurable pixels, a radiation source for directing radiation onto the reflective liquid crystal display, a projection system for reducing a radiation pattern reflected by the reflective liquid crystal display and projecting the reduced radiation pattern onto a workpiece, and a stage for holding the workpiece. The lithography system may be used to form geometric patterns on a substrate during semiconductor fabrication.

Abstract: Liquid crystal on silicon (LCOS) cells include a plurality of pixel elements formed between substrates. Spacers are formed on a portion of some of the pixel elements and positioned in the cell gap. The spacers on each of these LCOS cells reflecting different colors are formed in different locations in each cell. The result is that substantially none of the spacers create overlapping dead spots in a composite image. The spacers are further distributed among these pixel elements such that spacers are absent from some pixel elements and such that there is a substantially uniform thickness in the cell gaps. The reduced severity of the dead spots in the composite image as a result of the spacers in different locations, the reduced size and number of the spacers, and the uniformity in the cell gaps provide higher optical image quality.

Abstract: Optical components may be made with reflectors that increase the reflectivity of the resulting device. Increasing in the reflectivity may reduce the need for higher power light sources. In particular, the use of deposited silver layers may dramatically increase the reflectivity compared to aluminum and copper alloys. In addition, an absorptive layer may be positioned over the reflective layer to reduce the amount of blue light output from the reflector. This blue light absorber may be used to automatically rebalance light sources that produce an excessive proportion of blue light.

Abstract: Manufacture a spatial light modulator by fabricating a first set of micro-mirrors, then subsequently fabricating a second set of micro-mirrors interspersed with the first set, to reduce space between adjacent micro-mirrors versus what could be done by simultaneously fabricating all the micro-mirrors as one set.