Patents by Inventor Michael Kröll

Michael Kröll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8008201
    Abstract: Aqueous cerium oxide dispersion Aqueous cerium oxide dispersion, containing 5 to 60% by weight cerium oxide. It can be used to polish SiO2 in the semiconductor industry.
    Type: Grant
    Filed: March 8, 2006
    Date of Patent: August 30, 2011
    Assignee: Evonik Degussa GmbH
    Inventors: Michael Kröll, Stefan Heberer, Stipan Katusic, Michael Krämer, Wolfgang Lortz
  • Publication number: 20100029080
    Abstract: Aqueous cerium oxide dispersion Aqueous cerium oxide dispersion, containing 5 to 60% by weight cerium oxide. It can be used to polish SiO2 in the semiconductor industry.
    Type: Application
    Filed: March 8, 2006
    Publication date: February 4, 2010
    Inventors: Michael Kröll, Stefan Heberer, Stipan Katusic, Michael Krämer, Wolfgand Lortz
  • Publication number: 20090230347
    Abstract: Formulation comprising a polymerizable monomer and/or a polymer and, dispersed therein, a superparamagnetic powder, which comprises aggregated primary particles, the primary particles being built up from magnetic metal oxide domains having a diameter of from 2 to 100 nm in a nonmagnetic metal oxide or metalloid oxide matrix. Process for heating the formulation in a magnetic or electromagnetic alternating field. Use of the formulation as an adhesive composition.
    Type: Application
    Filed: November 29, 2005
    Publication date: September 17, 2009
    Applicant: DEGUSSA GmbH
    Inventors: Markus Pridöhl, Guido Zimmermann, Michael Kröll, Harald Häger
  • Patent number: 7365101
    Abstract: A dispersion of pyrogenically produced cerium oxide, which does not contain any particles larger than 1 ?m, is produced by dispersing a pyrogenically produced cerium oxide in water by means of a dissolver, centrifuging it, separating the supernatant from the bottom product, and again dispersing the supernatant by means of ultrasound. The dispersion can be used for chemical-mechanical polishing (CMP).
    Type: Grant
    Filed: September 15, 2004
    Date of Patent: April 29, 2008
    Assignee: Degussa AG
    Inventors: Michael Kröll, Günther Michael, Rainer Hahn, Stipan Katusic, Stefan Heberer, Ralph Brandes