Abstract: Gate-all-around integrated circuit structures having pre-spacer-deposition cut gates are described. For example, an integrated circuit structure includes a first vertical arrangement of horizontal nanowires and a second vertical arrangement of horizontal nanowires. A first gate stack is over the first vertical arrangement of horizontal nanowires, and a second gate stack is over the second vertical arrangement of horizontal nanowires. An end of the second gate stack is spaced apart from an end of the first gate stack by a gap. The integrated circuit structure also includes a dielectric structure having a first portion forming a gate spacer along sidewalls of the first gate stack, a second portion forming a gate spacer along sidewalls of the second gate stack, and a third portion completely filling the gap, the third portion continuous with the first and second portions.

Abstract: Benzene derivatives of the formula (I); wherein R1 and R2, are the same or different and independently are selected from the group consisting of hydrogen, alkyl, aralkyl, —CHO, —CH2OR3, —CH(OR4)(OR5) and —COOR6, wherein R3, R4 and R5 are the same or different and are selected from hydrogen, alkyl, aryl, alkaryl, aralkyl, alkylcarbonyl or arylcarbonyl, or wherein R4 and R5 together form an alkylene group and wherein R6 is selected from hydrogen, alkyl and aryl, are prepared in a process, which comprises: reacting a furan derivative of formula (II): wherein R1 and R2 have the meanings above, with ethylene under cycloaddition reaction conditions in the presence of an acid solvent to produce the benzene derivative, wherein the acid solvent is a carboxylic acid and is present in a weight ratio acid solvent to furan derivative from 1:1 to 250:1.

Abstract: Benzene derivatives of the formula (I); wherein R1 and R2, are the same or different and independently are selected from the group consisting of hydrogen, alkyl, aralkyl, —CHO, —CH2OR3, —CH(OR4)(OR5) and —COOR6, wherein R3, R4 and R5 are the same or different and are selected from hydrogen, alkyl, aryl, alkaryl, aralkyl, alkylcarbonyl or arylcarbonyl, or wherein R4 and R5 together form an alkylene group and wherein R6 is selected from hydrogen, alkyl and aryl, are prepared in a process, which comprises: reacting a furan derivative of formula (II): wherein R1 and R2 have the meanings above, with ethylene under cycloaddition reaction conditions in the presence of an acid solvent to produce the benzene derivative, wherein the acid solvent is a carboxylic acid and is present in a weight ratio acid solvent to furan derivative from 1:1 to 250:1.

Abstract: The invention relates to an aircraft (1), preferably an unmanned aircraft (UAV), drone, or Unmanned Aerial System (UAS), comprising a rigid wing (2) which enables aerodynamic horizontal flight, and at least four rotors (4, 4?) which are driven by means of controllable electric motors (5) and which can be pivoted between a vertical starting position and a horizontal flight position by means of a pivoting mechanism (7), wherein all electric motors (5) and rotors (4) are arranged on the wing (2).