Abstract: A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

Abstract: A re-hydration supplement composition particularly suitable to counteract dehydration stresses in mature bovine mammals in the form of a pelletized feed supplement is disclosed which includes relatively large fractions of carbohydrates including saccharides, cationic and anionic electrolytes and a minor amount of betaine osmolyte. A process for pelleting is also disclosed.

Abstract: A re-hydration supplement composition particularly suitable to counteract dehydration stresses in mature bovine mammals in the form of a pelletized feed supplement is disclosed which includes relatively large fractions of carbohydrates including saccharides, cationic and anionic electrolytes and a minor amount of betaine osmolyte. A process for pelleting is also disclosed.

Abstract: An effervescent acidified rehydration preparation for administration in the drinking water of mammals and poultry includes an amount of a dry generally water soluble acidified electrolyte composition for treatment of dehydration in animals including mammals and poultry by oral administration in the drinking water of animals of interest and an amount of a pH balanced effervescent composition including an amount of one or more compatible water soluble organic acid species and an amount of one or more water soluble effervescent agents wherein effervescence occurs immediately upon the rehydration preparation being added to water.

Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Abstract: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Abstract: A system for adjusting a deformable mirror including a reaction plate, a plurality of pneumatic actuators coupled to the reaction plate, and a plurality of push-pull flexures coupled on a first end to the pneumatic actuators, and coupled on a second end to the non-reflective side the deformable mirror, the plurality of push-pull flexures being disposed at various locations on the back of the deformable mirror. The respective pairs of push-pull flexures and pneumatic actuators are operated to support and alter the shape of the deformable mirror to allow for correction of a plurality of optical aberrations.

Abstract: An apparatus for processing a palletized container (411), the palletized container (411) including a container (413) affixed to a pallet (415). The apparatus includes a receptacle (412) arranged and configured for receiving the palletized container (411). A shearing mechanism is incorporated within the receptacle (412). The shearing mechanism is constructed and arranged for generating relative movement between the container (413) and the pallet (415) such that the container (413) is sheared from the pallet (415). The shearing mechanism includes support structure (428) for supporting the palletized container (411) within the receptacle (412) by engaging the pallet (415) of the palletized container (411). The shearing mechanism also includes a shearing member (440) having an edge (456) spaced a predetermined distance (D1) from the support structure (428).

Abstract: A roof scaffolding system of the type for use on a pitched roof that may be moved both longitudinally and laterally is provided. The roof scaffolding system includes: a peak anchor having a carrying assembly connected atop thereof, the peak anchor being adapted for connecting to a pitched roof; a side rail assembly having a base member, a top member and a load support member adapted to support an elongated scaffold member, the load support member interconnecting the base member and the top member; and an elongated flexible member operationally connecting the side rail assembly and the peak anchor in a manner such that the side rail assembly may be moved longitudinally and laterally upon a roof. The roof scaffolding system may include a cross rail member connected between to side rail assemblies to serve as a safety rail for a user. The roof scaffolding system may further include a net connectable between the side rail assemblies to prevent objects from falling from the work area.

Abstract: The present invention provides a grating-grating interferometric wafer alignment system, sensor and method for microlithography. It includes: (1) an electromagnetic radiation source with collimating optics delivering a collimated beam of a coherent single or multiple discrete wavelengths or in some cases broadband electromagnetic radiation; (2) a detector of the intensity of the collimated return electromagnetic radiation; (3) x- and y-oriented independent linear gratings for the mask-mark; (3) a "checkerboard pattern" grating for the wafer-mark; and (4) software including an algorithm for determining alignment from the return electromagnetic radiation intensity measured as a function of the relative position of the wafer and mask grating, and a means such as a Fourier transform determining phase and amplitude of a known frequency component of the intensity.