Abstract: An improved wafer clamp retainer is provided. The retainer is used to movably secure a wafer clamp to an upper electrode within a parallel-plate reactor. When drawn downward, the wafer clamp is pressed by the retainer against an outer periphery of the wafer to hold the wafer against the lower electrode. When drawn upward, the retainer lifts the wafer clamp from the wafer so that the wafer can be accessed. The wafer clamp retainer includes one or more features formed about an outer surface of a shaft extending from one end of the retainer body. The feature can comprise one or more rings, or spiral threads which mate with a flexible washer. The washer can be pushed directly upon the shaft and snap-fitted with the features or, alternatively, threaded upon the shaft by employing mating features on the wall which surrounds the opening through the washer.