Abstract: Microelectronic integrated circuit package structures include a package structure comprising two or more first integrated circuit (IC) dies directly on and electrically coupled to a substrate. A bridge die is adjacent to the two or more first IC dies and directly on the substrate. A second IC die is directly on the bridge die and on at least one of the two or more first IC dies, and a third IC die is directly on the bridge die, adjacent to the second IC die. A mold material at least partially surrounds the two or more first IC dies and the second and third IC dies.

Abstract: An IC device comprises a composite die structure that includes a base layer of comprising bulk silicon and a first chiplet integral with the base layer. The first chiplet includes first interconnects in first interconnect layers. A second chiplet is bonded to the base layer and horizontally adjacent to the first chiplet. The second chiplet includes second interconnects in second interconnect layers. A first dielectric material is between the first and second chiplets. Third interconnect layers extend over both the first and second interconnect layers. The third interconnect layers include third interconnects and a surface comprising conductive contacts opposite the base layer of the composite die structure. The third interconnects are coupled with the first interconnects, the second interconnects, and the conductive contacts. The third interconnect layers comprise a second dielectric material different from the first dielectric material.

Abstract: Bridge die interposer packages, and related apparatuses, systems, and techniques are discussed. An interposer package includes a bridge die having a routing structure to interconnect multiple integrated circuit (IC) dies of the package. Power is provided to the IC dies by a mesh power supply metallization and a mesh ground metallization that extend from outside a perimeter of the bridge die to within the perimeter and over the routing structure. The bridge die may be absent through silicon vias (TSVs) and may be hanging such that it is exposed at the bottom of the package.

Abstract: IC devices including BPRs with integrated decoupling capacitance are disclosed. An example IC device includes a first layer comprising a transistor and a support structure adjoining the first layer. The support structure includes BPRs, which are power rails buried in the support structure, and a decoupling capacitor based on the BPRs. The conductive cores of the BPRs are the electrodes of the decoupling capacitor. The dielectric barriers of the BPRs can be the dielectric of the decupling capacitor. The dielectric of the decupling capacitor may also include a dielectric element between the BPRs. Additionally or alternatively, the IC device includes another decoupling capacitor at the backside of the support structure. The other decoupling capacitor is coupled to the BPRs and can provide additional decoupling capacitance for stabilizing power supply facilitated by the BPRs.

Abstract: Various examples relate to an apparatus, a device, a method, and a computer program for an integrated development environment. The apparatus comprises processing circuitry configured to provide a first user interface component of the integrated development environment for editing code written in a programming language, provide a second user interface component of the integrated development environment for selecting an intermediate language to use for displaying the code in the first user interface component, and translate keywords of the code between the selected intermediate language and corresponding keywords of the programming language when loading code for editing in the first user interface component from a file and when saving code edited in the first user interface component to a file, with the programming language being based on a language that is different from the selected intermediate language.

Abstract: Systems, apparatus, articles of manufacture, and methods for optical chip-to-chip communications are disclosed. An example apparatus includes a package substrate, and a first semiconductor die carried by the package substrate. The first semiconductor die includes a first waveguide. The first waveguide includes a first end associated with a first exterior surface of the first semiconductor die. The example apparatus further includes a second semiconductor die carried by the package substrate. The second waveguide includes a second end associated with a second exterior of the second semiconductor die. The second waveguide is optically coupled to the first waveguide.

Abstract: Waveguide structures are built into integrated circuit devices using standard processing steps for semiconductor device fabrication. A waveguide may include a base, a top, and two side walls. At least one of the walls (e.g., the base or the top) may be formed in a metal layer. The base or top may be patterned to provide a transition to a planar transmission line, such as a coplanar waveguide. The side walls may be formed using vias.

Abstract: Described herein are integrated circuit devices that include conductive structures formed by direct bonding of different components, e.g., direct bonding of two dies, or of a die to a wafer. The conductive structures are formed from a top metallization layer of each of the components. For example, elongated conductive structures at the top metallization layer may be patterned and bonded to form large interconnects for high-frequency and/or high-power signals. In another example, the bonded conductive structures may form radio frequency passive devices, such as inductors or transformers.

Abstract: A non-transitory computer readable medium is provided having instructions stored therein that when executed by a processor cause the processor to select a device interface component layout from a plurality of device interface component layouts based on a set of parameters, wherein each device interface component layout corresponds to an interface structure of a shared integrated circuit semiconductor device component; perform at least one compatibility verification process for the selected device interface component layout with regard to an environment of the device interface component at a predetermined position in the integrated circuit semiconductor device; and output a compatibility verification information indicating a result of the at least one compatibility verification process for the selected device interface component layout.

Abstract: Embodiments herein relate to systems, apparatuses, techniques or processes for reducing the capacitance of a package that includes a die by at least partially surrounding the die within a mold compound and a dielectric material with different dielectric constants. Other embodiments may be described and/or claimed.

Abstract: Glass layers and capacitors for use with integrated circuit packages are disclosed. An example integrated circuit (IC) package includes a semiconductor die, a glass layer, and a capacitor electrically coupled to the semiconductor die, at least one side of the capacitor enclosed by the glass layer, the capacitor positioned closer to the glass layer than the semiconductor die is to the glass layer.

Abstract: Integrated capacitors are described. In an example, an integrated capacitor structure includes alternating first metal lines and second metal lines in a dielectric layer of a metallization layer in a stack of metallization layers, the first metal lines coupled together, and the second metal lines coupled together. A metal plate is over or beneath the alternating first metal lines and second metal lines. A dielectric liner layer is between the alternating first metal lines and second metal lines and the metal plate.

Abstract: Integrated capacitors are described. In an example, an integrated capacitor structure includes alternating first metal lines and second metal lines in a dielectric layer of a metallization layer in a stack of metallization layers, the first metal lines coupled together, and the second metal lines coupled together. A metal plate is over or beneath the alternating first metal lines and second metal lines. The metal plate is coupled to the first metal lines or the second metal lines by vias.

Abstract: Methods and apparatus are disclosed for implementing capacitors in semiconductor devices. An example semiconductor die includes a first dielectric material disposed between a first metal interconnect and a second metal interconnect; and a capacitor positioned within a via extending through the first dielectric material between the first and second metal interconnects, the capacitor including a second dielectric material disposed in the via between the first and second metal interconnects.

Abstract: IC devices including inductors or transformers formed based on BPRs are disclosed. An example IC device includes semiconductor structures of one or more transistors, an electrically conductive layer, a support structure comprising a semiconductor material, and an inductor. The inductor includes an electrical conductor constituted by a power rail buried in the support structure. The inductor also includes a magnetic core coupled to the electrical conductor. The magnetic core includes magnetic rails buried in the support structure, magnetic TSVs buried in the support structure, and a magnetic plate at the backside of the support structure. The magnetic core includes a magnetic material, such as Fe, NiFe, CoZrTa, etc. In some embodiments, the IC device includes another power rail that is buried in the support structure and constitutes another electrical conductor coupled to the magnetic core. The two power rails and magnetic core can constitute a transformer.

Abstract: A semiconductor die is provided. The semiconductor die includes a plurality of transistors arranged at a front side of a semiconductor substrate and an electrically conductive structure and a trench extending from a backside of the semiconductor substrate into the semiconductor substrate. A length of the trench is equal or larger than a lateral dimension of the semiconductor substrate.

Abstract: IC devices including BPRs with integrated decoupling capacitance are disclosed. An example IC device includes a first layer comprising a transistor and a support structure adjoining the first layer. The support structure includes BPRs, which are power rails buried in the support structure, and a decoupling capacitor based on the BPRs. The conductive cores of the BPRs are the electrodes of the decoupling capacitor. The dielectric barriers of the BPRs can be the dielectric of the decupling capacitor. The dielectric of the decupling capacitor may also include a dielectric element between the BPRs. Additionally or alternatively, the IC device includes another decoupling capacitor at the backside of the support structure. The other decoupling capacitor is coupled to the BPRs and can provide additional decoupling capacitance for stabilizing power supply facilitated by the BPRs.

Abstract: IC devices including transformers that includes two electrically conductive layers are disclosed. An example IC device includes a transformer that includes a first coil, a second coil, and a magnetic core coupled to the two coils. The first coil includes a portion or the whole electrically conductive layers at the backside of a support structure. The second coil includes a portion or the whole electrically conductive layers at either the frontside or the backside of the support structure. The two coils may have a lateral coupling, vertical coupling, or other types of couplings. The transformer is coupled to a semiconductor device over or at least partially in the support structure. The semiconductor device may be at the frontside of the support structure. The transformer can be coupled to the semiconductor device by TSVs. The IC device may also include BPRs that facilitate backside power delivery to the semiconductor device.

Abstract: A semiconductor package comprises a semiconductor die and a wiring structure, which is electrically connected to the semiconductor die. Further, the semiconductor package comprises a magnetic material. The magnetic material embeds and/or encircles a portion of the wiring structure.

Abstract: A semiconductor device is disclosed, comprising a first semiconductor die comprising a plurality of transistors; a second semiconductor die comprising power supply circuitry configured to generate a supply voltage for the plurality of transistors of the first semiconductor die; and a heat spreader structure. A power supply routing for a reference voltage or a power supply voltage which extends from the heat spreader structure through the second semiconductor die to the first semiconductor die.