Abstract: This invention concerns a method of producing subsurface marking in a transparent body. According to the invention, the marking is done less than 500 ?m below the surface by applying a layer system with a high destruction threshold, compared to the substrate, to the surface of the substrate. If the layer system is designed as an anti-reflection coating system for the reading wavelength, it increases the contrast for reading. If the layer system is designed as a mirror for the writing wavelength, the writing can be done in reflection at a lower intensity.

Abstract: A handheld color measurement device includes a housing in which an optoelectronic measurement unit is located which receives measurement light originating from a measurement object, converts it into corresponding electrical measurement signals and processes these measurement signals into preferably digital measurement data characterizing the color of the measurement object. It further includes passive components required for the realization of different application functions, such as measurement windows and reference standards, which can be selectively positioned into the measurement beam path of the measurement unit. The passive components are positioned in a first housing block (100) and the opto-electronic measurement unit as a whole in a second housing block (200).

Abstract: A mask for photolithography methods comprises opaque and transparent areas as well as a surface structure. For the contact with a substrate (10) to be exposed at least a few opaque areas are incorporated and at least a few transparent areas are arranged in a spaced fashion and are deep-etched down to a structural depth. In a further embodiment at least one transparent area is designed as a positively resting area (12). The structural depth in the deep-etched areas is greater than the thickness of the surface structure, at least greater than or equal to 1 ?m.

Abstract: A handheld colour measurement device includes a housing in which an optoelectronic measurement unit is located which receives measurement light originating from a measurement object, converts it into corresponding electrical measurement signals and processes these measurement signals into preferably digital measurement data characterizing the colour of the measurement object. It further includes passive components required for the realization of different application functions, such as measurement windows and reference standards, which can be selectively positioned into the measurement beam path of the measurement unit. The passive components are positioned in a first housing block (100) and the opto-electronic measurement unit as a whole in a second housing block (200).

Abstract: This invention concerns a method of producing subsurface marking in a transparent body. According to the invention, the marking is done less than 500 ?m below the surface by applying a layer system with a high destruction threshold, compared to the substrate, to the surface of the substrate. If the layer system is designed as an anti-reflection coating system for the reading wavelength, it increases the contrast for reading. If the layer system is designed as a mirror for the writing wavelength, the writing can be done in reflection at a lower intensity.

Abstract: An arrayed waveguide grating (AWG) device is described in which there are a plurality of output waveguides (10) coupled at one end to the output side of an second optical interaction region (4) of the AWG, and wherein the output waveguides are substantially identically curved in at least a portion of the fan-out region of the AWG. This improves the channel (frequency) spacing accuracy of the AWG. In one embodiment input waveguides (2) of the AWG are also substantially identically curved in at least a portion of the fan-in region of the AWG, these being inversely curved to the substantially identically curved portions of the output waveguides, with respect to the direction of travel of light along the waveguides. This has been found to reduce asymmetry in the channel output response.

Abstract: A mask for photolithography methods comprises opaque and transparent areas as well as a surface structure. For the contact with a substrate (10) to be exposed at least a few opaque areas are incorporated and at least a few transparent areas are arranged in a spaced fashion and are deep-etched down to a structural depth. In a further embodiment at least one transparent area is designed as a positively resting area (12). The structural depth in the deep-etched areas is greater than the thickness of the surface structure, at least greater than or equal to 1 ?m.

Abstract: An arrayed waveguide grating (AWG) device is described in which there are a plurality of output waveguides (10) coupled at one end to the output side of an second optical interaction region (4) of the AWG, and wherein the output waveguides are substantially identically curved in at least a portion of the fan-out region of the AWG. This improves the channel (frequency) spacing accuracy of the AWG. In one embodiment input waveguides (2) of the AWG are also substantially identically curved in at least a portion of the fan-in region of the AWG, these being inversely curved to the substantially identically curved portions of the output waveguides, with respect to the direction of travel of light along the waveguides. This has been found to reduce asymmetry in the channel output response.