Abstract: Screen capture mitigation is disclosed. The presence of a first finger is detected in a first area of a display. In response to the detection, content id displayed. A determination is made that the position of the first finger has changed. A determination is made that the distance by which the first finger has changed position exceeds a tolerance. The content is ceased to be displayed in response to the determination that the tolerance has been exceed.

Abstract: A method of compressing gas using the same gas as the working fluid, using a compressor comprising a reciprocating piston type compressor, a driving cylinder and a driven cylinder. The piston type compressor receives low pressure gas and fills the driven cylinder to a medium pressure target. A valve then directs the output from the piston type compressor to fill the driving cylinder, creating sufficient force to drive the connecting rod between the cylinders fully toward the driven cylinder. The connecting rod force compresses the gas in the driven cylinder and forces it out through a one way valve to a storage cylinder. A valve then directs the piston type compressor to fill the opposite side of the driving cylinder and the driven cylinder, forcing the connecting rod to retract. This cycle is repeated until the final output target high pressure is achieved in the storage vessel.

Abstract: An etching monitoring apparatus and related method for use in the manufacture of microstructures (and in particular MEMS) located within an etching chamber is described. The apparatus and related method operates by setting the temperature of the chamber within which the microstructure is located at a starting temperature, and maintaining the partial pressure of an etching gas within the chamber at a constant value. As a result the surface temperature of the micro structure within the chamber is primarily determined by the etch rate. Therefore, by employing a thermometer to monitor the change in etching surface temperature, a direct diagnostic for monitoring the etching process is provided.

Abstract: An etching monitoring apparatus and related method for use in the manufacture of microstructures (and in particular MEMS) located within an etching chamber is described. The apparatus and related method operates by setting the temperature of the chamber within which the microstructure is located at a starting temperature, and maintaining the partial pressure of an etching gas within the chamber at a constant value. As a result the surface temperature of the microstructure within the chamber is primarily determined by the etch rate. Therefore, by employing a thermometer to monitor the change in etching surface temperature, a direct diagnostic for monitoring the etching process is provided.

Abstract: An apparatus and method for providing an etching gas source for etching one or more microstructures located within a process chamber. the apparatus has a gas source supply line attached to a gas source and one or more chambers for containing an etching material. In use, the etching material is transformed into an etching material vapor within one or more of the chamber and the gas supply line provides a supply of carrier gas to the etching material vapor and also supplies the etching material vapor transported by the carrier gas to the process chamber. Advantageously, the apparatus of the invention does not require the incorporation of any expansion chambers or other complicated mechanical features in order to achieve a continuous flow of etching gas.

Abstract: Content obtained from a help file containing at least two interactive links in a sequence may be displayed in a help facility. Each interactive link may be associated with at least one user-activated step in a computer software application to perform in connection with a help topic according to the sequence so that once a user activates one of these links out of sequence, an operation in the computer software application may be invoked to effect the at least one user-activated step.