Patents by Inventor Michael Lee Rudolph
Michael Lee Rudolph has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9201314Abstract: The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.Type: GrantFiled: June 11, 2012Date of Patent: December 1, 2015Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V Patel, Robert A McMillen
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Patent number: 9063437Abstract: A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.Type: GrantFiled: June 20, 2012Date of Patent: June 23, 2015Assignee: E I DU PONT DE NEMOURS AND COMPANYInventor: Michael Lee Rudolph
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Patent number: 8899148Abstract: The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than 250 lines per inch on the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form a relief structure having a plurality of raised surfaces with a line screen resolution equal to or greater than 250 lines per inch. Printing is accomplished by applying an imaging material to the plurality of raised surfaces and contacting to transfer the imaging material to the substrate. The method is suitable for printing high resolution graphic images, as well as for forming a uniform layer of imaging material on the substrate.Type: GrantFiled: July 1, 2010Date of Patent: December 2, 2014Assignee: E I du Pont de Nemours and CompanyInventor: Michael Lee Rudolph
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Publication number: 20130148089Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.Type: ApplicationFiled: June 11, 2012Publication date: June 13, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: MICHAEL LEE RUDOLPH, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
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Publication number: 20120258406Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.Type: ApplicationFiled: June 20, 2012Publication date: October 11, 2012Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: MICHAEL LEE RUDOLPH, JOSEPH ANTHONY PERROTTO, DHIREN V. PATEL, ROBERT A. MCMILLEN
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Publication number: 20120255454Abstract: The invention provides a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask for the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.Type: ApplicationFiled: June 20, 2012Publication date: October 11, 2012Applicant: E I DU PONT DE NEMOURS AND COMPANYInventor: MICHAEL LEE RUDOLPH
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Patent number: 8241835Abstract: A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.Type: GrantFiled: March 10, 2009Date of Patent: August 14, 2012Assignee: E I du Pont de Nemours and CompanyInventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
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Patent number: 8236479Abstract: A pattern of ink is printed on a substrate, such as corrugated paperboard with a relief printing form made from a photosensitive element. An in-situ mask is formed for the photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.Type: GrantFiled: January 7, 2009Date of Patent: August 7, 2012Assignee: E I du Pont de Nemours and CompanyInventor: Michael Lee Rudolph
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Publication number: 20120060711Abstract: The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than 250 lines per inch on the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form a relief structure having a plurality of raised surfaces with a line screen resolution equal to or greater than 250 lines per inch. Printing is accomplished by applying an imaging material to the plurality of raised surfaces and contacting to transfer the imaging material to the substrate. The method is suitable for printing high resolution graphic images, as well as for forming a uniform layer of imaging material on the substrate.Type: ApplicationFiled: July 1, 2010Publication date: March 15, 2012Applicant: E.I. Du Pont De Nemours and CompanyInventor: Michael Lee Rudolph
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Publication number: 20090191482Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a lo photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.Type: ApplicationFiled: January 21, 2009Publication date: July 30, 2009Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: MICHAEL LEE RUDOLPH, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
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Publication number: 20090191483Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.Type: ApplicationFiled: March 10, 2009Publication date: July 30, 2009Applicant: E. I. DU PONT DE NEMOURS AND COMPANYInventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
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Publication number: 20090186308Abstract: The invention provides a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask for the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.Type: ApplicationFiled: January 7, 2009Publication date: July 23, 2009Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventor: Michael Lee RUDOLPH
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Patent number: 6886932Abstract: This invention pertains to ink jet printing and more particularly to inkjet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing, wherein ink set including a first magenta ink; a second magnetic ink; a first cyan ink; a second cyan ink; a yellow ink; an orange ink; a green ink; and black ink.Type: GrantFiled: April 27, 2004Date of Patent: May 3, 2005Assignee: E.I. Du Pont de Nemours and CompanyInventor: Michael Lee Rudolph
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Publication number: 20040234886Abstract: A photosensitive element for use as a flexographic printing plate comprises a support, an elastomeric photopolymerizable layer having a surface opposite the support that defines a plane, and a matted layer disposed above the surface of the photopolymerizable layer comprising a polymeric binder and at least one matting agent which is capable of forming depressions from the plane into the photopolymerizable layer. Also described is a process for preparing such a photosensitive element and a process for preparing a flexographic printing plate from the photosensitive element.Type: ApplicationFiled: March 8, 2004Publication date: November 25, 2004Inventors: Michael Lee Rudolph, Gregory Scott Blackman, Udo Dietrich Bode, Violeta Lungu, John R. Shock
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Publication number: 20040196346Abstract: This invention pertains to ink jet printing and more particularly to ink jet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing.Type: ApplicationFiled: April 27, 2004Publication date: October 7, 2004Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Walfong Liew Anton, Hisanori Omura
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Publication number: 20040196347Abstract: This invention pertains to ink jet printing and more particularly to ink jet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing.Type: ApplicationFiled: April 27, 2004Publication date: October 7, 2004Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Waifong Liew Anton, Hisanori Omura
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Patent number: 6742869Abstract: A system and method are disclosed for ink jet printing of wide format substrates such as textiles in a manner to simulate screen printing, in which image data in one or more acceptable formats is input, transformed into a suitable L*a*b* file format, further converted into a driver format for a printer, then communicated to such printer. Optionally, the color gamut of the image in the L*a*b* file format is checked against an estimated screen gamut of a screen printer, and limited to the estimated screen gamut as required.Type: GrantFiled: October 4, 2002Date of Patent: June 1, 2004Assignee: E. I. du Pont de Nemours and CompanyInventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Waifong Liew Anton, Hisanori Omura
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Publication number: 20030128246Abstract: This invention pertains to ink jet printing and more particularly to ink jet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing.Type: ApplicationFiled: October 4, 2002Publication date: July 10, 2003Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Waifong Liew Anton, Hisanori Omura