Patents by Inventor Michael Lee Rudolph

Michael Lee Rudolph has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9201314
    Abstract: The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
    Type: Grant
    Filed: June 11, 2012
    Date of Patent: December 1, 2015
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V Patel, Robert A McMillen
  • Patent number: 9063437
    Abstract: A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: June 23, 2015
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventor: Michael Lee Rudolph
  • Patent number: 8899148
    Abstract: The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than 250 lines per inch on the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form a relief structure having a plurality of raised surfaces with a line screen resolution equal to or greater than 250 lines per inch. Printing is accomplished by applying an imaging material to the plurality of raised surfaces and contacting to transfer the imaging material to the substrate. The method is suitable for printing high resolution graphic images, as well as for forming a uniform layer of imaging material on the substrate.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: December 2, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventor: Michael Lee Rudolph
  • Publication number: 20130148089
    Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
    Type: Application
    Filed: June 11, 2012
    Publication date: June 13, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: MICHAEL LEE RUDOLPH, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
  • Publication number: 20120258406
    Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
    Type: Application
    Filed: June 20, 2012
    Publication date: October 11, 2012
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: MICHAEL LEE RUDOLPH, JOSEPH ANTHONY PERROTTO, DHIREN V. PATEL, ROBERT A. MCMILLEN
  • Publication number: 20120255454
    Abstract: The invention provides a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask for the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.
    Type: Application
    Filed: June 20, 2012
    Publication date: October 11, 2012
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventor: MICHAEL LEE RUDOLPH
  • Patent number: 8241835
    Abstract: A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: August 14, 2012
    Assignee: E I du Pont de Nemours and Company
    Inventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
  • Patent number: 8236479
    Abstract: A pattern of ink is printed on a substrate, such as corrugated paperboard with a relief printing form made from a photosensitive element. An in-situ mask is formed for the photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.
    Type: Grant
    Filed: January 7, 2009
    Date of Patent: August 7, 2012
    Assignee: E I du Pont de Nemours and Company
    Inventor: Michael Lee Rudolph
  • Publication number: 20120060711
    Abstract: The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than 250 lines per inch on the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form a relief structure having a plurality of raised surfaces with a line screen resolution equal to or greater than 250 lines per inch. Printing is accomplished by applying an imaging material to the plurality of raised surfaces and contacting to transfer the imaging material to the substrate. The method is suitable for printing high resolution graphic images, as well as for forming a uniform layer of imaging material on the substrate.
    Type: Application
    Filed: July 1, 2010
    Publication date: March 15, 2012
    Applicant: E.I. Du Pont De Nemours and Company
    Inventor: Michael Lee Rudolph
  • Publication number: 20090191482
    Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a lo photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
    Type: Application
    Filed: January 21, 2009
    Publication date: July 30, 2009
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: MICHAEL LEE RUDOLPH, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
  • Publication number: 20090191483
    Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
    Type: Application
    Filed: March 10, 2009
    Publication date: July 30, 2009
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Michael Lee Rudolph, Joseph Anthony Perrotto, Dhiren V. Patel, Robert A. McMillen
  • Publication number: 20090186308
    Abstract: The invention provides a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask for the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate.
    Type: Application
    Filed: January 7, 2009
    Publication date: July 23, 2009
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventor: Michael Lee RUDOLPH
  • Patent number: 6886932
    Abstract: This invention pertains to ink jet printing and more particularly to inkjet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing, wherein ink set including a first magenta ink; a second magnetic ink; a first cyan ink; a second cyan ink; a yellow ink; an orange ink; a green ink; and black ink.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: May 3, 2005
    Assignee: E.I. Du Pont de Nemours and Company
    Inventor: Michael Lee Rudolph
  • Publication number: 20040234886
    Abstract: A photosensitive element for use as a flexographic printing plate comprises a support, an elastomeric photopolymerizable layer having a surface opposite the support that defines a plane, and a matted layer disposed above the surface of the photopolymerizable layer comprising a polymeric binder and at least one matting agent which is capable of forming depressions from the plane into the photopolymerizable layer. Also described is a process for preparing such a photosensitive element and a process for preparing a flexographic printing plate from the photosensitive element.
    Type: Application
    Filed: March 8, 2004
    Publication date: November 25, 2004
    Inventors: Michael Lee Rudolph, Gregory Scott Blackman, Udo Dietrich Bode, Violeta Lungu, John R. Shock
  • Publication number: 20040196346
    Abstract: This invention pertains to ink jet printing and more particularly to ink jet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing.
    Type: Application
    Filed: April 27, 2004
    Publication date: October 7, 2004
    Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Walfong Liew Anton, Hisanori Omura
  • Publication number: 20040196347
    Abstract: This invention pertains to ink jet printing and more particularly to ink jet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing.
    Type: Application
    Filed: April 27, 2004
    Publication date: October 7, 2004
    Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Waifong Liew Anton, Hisanori Omura
  • Patent number: 6742869
    Abstract: A system and method are disclosed for ink jet printing of wide format substrates such as textiles in a manner to simulate screen printing, in which image data in one or more acceptable formats is input, transformed into a suitable L*a*b* file format, further converted into a driver format for a printer, then communicated to such printer. Optionally, the color gamut of the image in the L*a*b* file format is checked against an estimated screen gamut of a screen printer, and limited to the estimated screen gamut as required.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: June 1, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Waifong Liew Anton, Hisanori Omura
  • Publication number: 20030128246
    Abstract: This invention pertains to ink jet printing and more particularly to ink jet printing of wide format substrates such as textiles, and to inks and inks sets suitable for use in such printing.
    Type: Application
    Filed: October 4, 2002
    Publication date: July 10, 2003
    Inventors: Martin E. Redding, John Stephen Locke, Robert Clifton Strum, Tony Z. Liang, Michael Lee Rudolph, Waifong Liew Anton, Hisanori Omura