Patents by Inventor Michael Lipschutz

Michael Lipschutz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230328899
    Abstract: An article and a method of making the article is disclosed where the article includes a sequence of metal layers arranged to inhibit adhesion failure between the metal layers. The metal layers include a topcoat of silver, an intermediate layer of silver, a silver-tin alloy layer and a nickel layer. The layers adhere to a substrate containing copper or copper alloy.
    Type: Application
    Filed: April 12, 2022
    Publication date: October 12, 2023
    Inventors: Adolphe FOYET, Margit CLAUSS, Michael LIPSCHUTZ
  • Publication number: 20230160085
    Abstract: Silver electroplating compositions deposit silver with low coefficients of friction on substrates, such as nickel, copper and copper alloys. The silver deposits have coefficients of friction of less than or equal to 1 in contrast to many conventional silver deposits which typically have coefficients of friction greater than 1, such as 1.5. The silver deposits also have improved wear resistance in contrast to silver deposited from many conventional silver electroplating baths. The low coefficients of friction and improved wear resistance of silver deposited from the silver electroplating compositions is especially suitable for connectors and electronics finishes. Preferably, the silver electroplating compositions are cyanide-free silver electroplating compositions.
    Type: Application
    Filed: January 11, 2023
    Publication date: May 25, 2023
    Inventors: Youngmin Yoon, Miguel A. Rodriguez, Michael Lipschutz, Jamie Y. C. Chen, Kristen Griffin
  • Patent number: 11578418
    Abstract: Silver electroplating compositions deposit silver with low coefficients of friction on substrates, such as nickel, copper and copper alloys. The silver deposits have coefficients of friction of less than or equal to 1 in contrast to many conventional silver deposits which typically have coefficients of friction greater than 1, such as 1.5. The silver deposits also have improved wear resistance in contrast to silver deposited from many conventional silver electroplating baths. The low coefficients of friction and improved wear resistance of silver deposited from the silver electroplating compositions is especially suitable for connectors and electronics finishes. Preferably, the silver electroplating compositions are cyanide-free silver electroplating compositions.
    Type: Grant
    Filed: February 3, 2022
    Date of Patent: February 14, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC (RHEM)
    Inventors: Youngmin Yoon, Miguel A. Rodriguez, Michael Lipschutz, Jamie Y. C. Chen, Kristen Griffin
  • Publication number: 20220307149
    Abstract: Silver electroplating compositions deposit silver with low coefficients of friction on substrates, such as nickel, copper and copper alloys. The silver deposits have coefficients of friction of less than or equal to 1 in contrast to many conventional silver deposits which typically have coefficients of friction greater than 1, such as 1.5. The silver deposits also have improved wear resistance in contrast to silver deposited from many conventional silver electroplating baths. The low coefficients of friction and improved wear resistance of silver deposited from the silver electroplating compositions is especially suitable for connectors and electronics finishes. Preferably, the silver electroplating compositions are cyanide-free silver electroplating compositions.
    Type: Application
    Filed: February 3, 2022
    Publication date: September 29, 2022
    Inventors: Youngmin Yoon, Miguel A. Rodriguez, Michael Lipschutz, Jamie Y. C. Chen, Kristen Griffin
  • Patent number: 11434577
    Abstract: Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include thiol terminal aliphatic compounds having carboxyl or sulfonic groups which enable deposition of silver rich binary silver-bismuth alloys having deposits which are matte to semi-bright, uniform and have a low coefficient of friction.
    Type: Grant
    Filed: September 1, 2020
    Date of Patent: September 6, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Miguel A. Rodriguez, Youngmin Yoon, Michael Lipschutz, Jamie Y. C. Chen
  • Publication number: 20220112619
    Abstract: Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include 5-membered heterocyclic nitrogen compounds with a thiol functionality which enable deposition of the silver rich binary silver-bismuth alloys. The silver rich silver-bismuth deposits are matte to semi-bright, uniform and have a low coefficient of friction.
    Type: Application
    Filed: December 20, 2021
    Publication date: April 14, 2022
    Inventors: Miguel A. Rodriguez, Michael Lipschutz, Jamie Y.C. Chen, Youngmin Yoon
  • Patent number: 11242609
    Abstract: Silver-nickel alloy electroplating compositions and methods enable electroplating silver rich silver-nickel deposits which are bright, uniform and have a relatively low coefficient of friction. The binary silver-nickel alloy is deposited from an aqueous acid silver-nickel alloy electroplating composition. The aqueous acid silver-nickel alloy electroplating composition includes thiol compounds which shift the reduction potential of silver ions toward the reduction potential of nickel ions such that a silver rich binary silver-nickel layer is deposited on a substrate.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: February 8, 2022
    Assignee: ROHM AND HASS ELECTRONIC MATERIALS LLC
    Inventors: Jamie Y. C. Chen, Michael Lipschutz, Miguel A. Rodriguez, Kin Cheung Lo
  • Publication number: 20210172082
    Abstract: Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include 5-membered heterocyclic nitrogen compounds with a thiol functionality which enable deposition of the silver rich binary silver-bismuth alloys. The silver rich silver-bismuth deposits are matte to semi-bright, uniform and have a low coefficient of friction.
    Type: Application
    Filed: December 10, 2019
    Publication date: June 10, 2021
    Inventors: Miguel A. Rodriguez, Michael Lipschutz, Jamie Y.C. Chen, Youngmin Yoon
  • Publication number: 20210115582
    Abstract: Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include thiol terminal aliphatic compounds having carboxyl or sulfonic groups which enable deposition of silver rich binary silver-bismuth alloys having deposits which are matte to semi-bright, uniform and have a low coefficient of friction.
    Type: Application
    Filed: September 1, 2020
    Publication date: April 22, 2021
    Inventors: Miguel A. Rodriguez, Youngmin Yoon, Michael Lipschutz, Jamie Y.C. Chen
  • Publication number: 20210108324
    Abstract: Silver-nickel alloy electroplating compositions and methods enable electroplating silver rich silver-nickel deposits which are bright, uniform and have a relatively low coefficient of friction. The binary silver-nickel alloy is deposited from an aqueous acid silver-nickel alloy electroplating composition. The aqueous acid silver-nickel alloy electroplating composition includes thiol compounds which shift the reduction potential of silver ions toward the reduction potential of nickel ions such that a silver rich binary silver-nickel layer is deposited on a substrate.
    Type: Application
    Filed: October 15, 2019
    Publication date: April 15, 2021
    Inventors: Jamie Y.C. Chen, Michael Lipschutz, Miguel A. Rodriguez, Kin Cheung Lo
  • Patent number: 10718059
    Abstract: Nickel electroplating compositions containing cationic polymers of a reaction product of an imidazole compound and a bisepoxide enable the electroplating of nickel deposits which have uniform bright surfaces over wide current density ranges.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: July 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael Lipschutz, Sen Kang
  • Patent number: 10711360
    Abstract: Nickel electroplating compositions containing copolymers of arginine and a bisepoxide enable the electroplating of nickel deposits which have uniform bright surfaces over wide current density ranges.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: July 14, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael Lipschutz
  • Publication number: 20190382900
    Abstract: Stable electroless copper plating baths include imidazolium compounds to improve rate of copper deposition on substrates. The copper from the electroless plating baths can be plated at low temperatures and at high plating rates.
    Type: Application
    Filed: May 1, 2019
    Publication date: December 19, 2019
    Inventors: Alejo M. Lifschitz Arribio, Patricia Gumbley, Michael Lipschutz, Feng Liu, Catherine Mulzer, Sarah Wen
  • Publication number: 20190382901
    Abstract: Stable electroless copper plating baths include pyridinium compounds to improve rate of copper deposition on substrates. The copper from the electroless plating baths can be plated at low temperatures and at high plating rates.
    Type: Application
    Filed: May 1, 2019
    Publication date: December 19, 2019
    Inventors: Alejo M. Lifschitz Arribio, Patricia Gumbley, Michael Lipschutz, Feng Liu, Catherine Mulzer, Sarah Wen
  • Patent number: 10508348
    Abstract: Environmentally friendly nickel electroplating compositions enable the electroplating of nickel deposits which are bright and uniform and inhibit corrosion of gold layers deposited on the bright and uniform nickel deposits. The environmentally friendly nickel electroplating compositions can be used to electroplate bright and uniform nickel deposits on various substrates over a wide current density range.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: December 17, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael Lipschutz
  • Patent number: 10458032
    Abstract: Environmentally friendly nickel electroplating compositions enable the electroplating of nickel deposits which are bright and uniform and inhibit corrosion of gold layers deposited on the bright and uniform nickel deposits. The environmentally friendly nickel electroplating compositions can be used to electroplate bright and uniform nickel deposits on various substrates over a wide current density range.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: October 29, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael Lipschutz
  • Publication number: 20190017187
    Abstract: Nickel electroplating compositions containing copolymers of arginine and a bisepoxide enable the electroplating of nickel deposits which have uniform bright surfaces over wide current density ranges.
    Type: Application
    Filed: May 9, 2018
    Publication date: January 17, 2019
    Inventor: Michael Lipschutz
  • Publication number: 20190010625
    Abstract: Nickel electroplating compositions containing cationic polymers of a reaction product of an imidazole compound and a bisepoxide enable the electroplating of nickel deposits which have uniform bright surfaces over wide current density ranges.
    Type: Application
    Filed: May 8, 2018
    Publication date: January 10, 2019
    Inventors: Michael Lipschutz, Sen Kang
  • Publication number: 20180363156
    Abstract: Environmentally friendly nickel electroplating compositions enable the electroplating of nickel deposits which are bright and uniform and inhibit corrosion of gold layers deposited on the bright and uniform nickel deposits. The environmentally friendly nickel electroplating compositions can be used to electroplate bright and uniform nickel deposits on various substrates over a wide current density range.
    Type: Application
    Filed: April 9, 2018
    Publication date: December 20, 2018
    Inventor: Michael Lipschutz
  • Publication number: 20180363157
    Abstract: Environmentally friendly nickel electroplating compositions enable the electroplating of nickel deposits which are bright and uniform and inhibit corrosion of gold layers deposited on the bright and uniform nickel deposits. The environmentally friendly nickel electroplating compositions can be used to electroplate bright and uniform nickel deposits on various substrates over a wide current density range.
    Type: Application
    Filed: April 10, 2018
    Publication date: December 20, 2018
    Inventor: Michael Lipschutz