Abstract: A polarization pattern assembly produces a polarization pattern. In an embodiment, a polarization pattern assembly includes a frame that supports a polarization pane in a central region of the frame. The polarization pane changes the polarization direction of light incident upon the polarization pane. Different polarization patterns in a pupil of a polarized illuminator can be generated.

Abstract: A lithographic system and method using an illumination system, a single pass pulse stretcher, an optical system, a patterning device and a projection system. The optical system is arranged around the single pass pulse stretcher. A beam enters the single pass stretcher and is reflected in a helical path using the optical system for multiple passes through the single pass pulse stretcher. The single pass pulse stretcher can include two 90° prisms, with a beam splitter located therebetween. The optical system can include first and second prisms. At least one of the first and second prisms can be a roof prism. The first and second prisms can have at least one surface oriented so as to direct the beam into the helical path. The optical system can have at least one mirror, or a plurality of mirrors.

Abstract: The present invention relates to an apparatus for polarizing an incident light beam. In embodiments, a tile wave plate assembly is provided. The tile wave plate includes a layered structure having a substrate plate and two layers of mosaic tiles. The layers of the apparatus are mechanically separated to form a controlled gap spacing. The mosaic tiles can be configured to form a pseudo or true zero order wave plate.

Abstract: A polarization pattern assembly produces a polarization pattern. In an embodiment, a polarization pattern assembly includes a frame that supports a polarization pane in a central region of the frame. The polarization pane changes the polarization direction of light incident upon the polarization pane. Different polarization patterns in a pupil of a polarized illuminator can be generated.

Abstract: A pulse stretcher includes a single pass pulse stretcher. An optical system is arranged around the single pass pulse stretcher. A beam enters the single pass stretcher and is reflected in a helical path using the optical system for multiple passes through the single pass pulse stretcher. The single pass pulse stretcher can include two 90° prisms, with a beam splitter located therebetween. The optical system can include first and second prisms. At least one of the first and second prisms can be a roof prism. The first and second prisms can have at least one surface oriented so as to direct the beam into the helical path. The optical system can have at least one mirror, or a plurality of mirrors.

Abstract: The invention relates to a patterned grid polarizer for use in lithography, comprising a substrate that is transparent to ultraviolet (UV) light; and an array of elements patterned on the substrate, wherein the elements polarize UV light. The array of elements can be patterned to produce tangentially or radially polarized UV light.

Abstract: A pulse stretcher includes a first prism and a second prism positioned opposite each other. A first coupling prism is optically coupled to the first prism with a partially reflective interface that directs a beam towards the second prism in a helical path. The first prism and the first coupling prism form a beamsplitter. A recirculating prism (or a reflective element) reflects the beam from the first prism into the second prism. Mirrors are positioned around the first and second prisms to permit recirculation of the beam through the first and second prisms. The beam recirculates through the first and second prisms using two or more helical paths. The pulse stretcher can be incorporated into a lithographic system.