Patents by Inventor Michael M. Feldman

Michael M. Feldman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene
    Patent number: 4788127
    Abstract: A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.
    Type: Grant
    Filed: November 17, 1986
    Date of Patent: November 29, 1988
    Assignee: Eastman Kodak Company
    Inventors: David B. Bailey, Michael M. Feldman