Abstract: Adjacent interconnect features are in staggered, vertically spaced positions, which accordingly reduces their capacitive coupling within a level of interconnect metallization. Adjacent interconnect features may comprise a plurality of first interconnect lines with spaces therebetween. A dielectric material is over the first interconnect lines and within the spaces between the first interconnect lines. Resultant topography in the dielectric material defines a plurality of trenches between the first interconnect lines. The adjacent interconnect features further comprise a plurality of second interconnect lines interdigitated with the first interconnect lines that occupy at least a portion of the trenches between individual ones of the first interconnect lines.

Abstract: An automated cruise control system is disclosed. Sensors detect driving parameters associated with the ground vehicle as the ground vehicle maneuvers along a segment of the roadway. A ground vehicle control detector detects ground vehicle control inputs associated with an operation of the ground vehicle. The ground vehicle control inputs are generated from a longitudinal operation of the ground vehicle. A energy consumption cruise controller automatically adjusts the operation of the ground vehicle as the ground vehicle maneuvers along the segment of the roadway to maintain the operation of the ground vehicle within an operation threshold based on the detected driving parameters and ground vehicle control inputs. The operation threshold is the operation of the ground vehicle that decreases an amount of overall energy consumed by the ground vehicle and maintains a longitudinal speed of the ground vehicle within a longitudinal speed threshold.

Abstract: Transistors structures comprising a semiconductor features and dielectric material comprising silicon and oxygen in gaps or spaces between the features. The dielectric material may fill the gaps from bottom-up with an atomic layer deposition (ALD) process that includes a silicon deposition phase, and an oxidation phase augmented by N2:NH3 plasma activated nitrogen species. Being plasma activated, the nitrogen species have short mean free paths, and therefore preferentially passivate surfaces with low aspect ratios. This aspect-ratio dependent passivation may increase an energy barrier to surface reactions with a silicon precursor, resulting in a concomitant differential in deposition rate. With N2:NH3 plasma passivation, deposited dielectric material may have a nitrogen concentration that varies by at least order of magnitude as a function of the aspect ratio of the filled gaps.

Abstract: Adjacent interconnect features are in staggered, vertically spaced positions, which accordingly reduces their capacitive coupling within a level of interconnect metallization. Adjacent interconnect features may comprise a plurality of first interconnect lines with spaces therebetween. A dielectric material is over the first interconnect lines and within the spaces between the first interconnect lines. Resultant topography in the dielectric material defines a plurality of trenches between the first interconnect lines. The adjacent interconnect features further comprise a plurality of second interconnect lines interdigitated with the first interconnect lines that occupy at least a portion of the trenches between individual ones of the first interconnect lines.

Abstract: Transistors structures comprising a semiconductor features and dielectric material comprising silicon and oxygen in gaps or spaces between the features. The dielectric material may fill the gaps from bottom-up with an atomic layer deposition (ALD) process that includes a silicon deposition phase, and an oxidation phase augmented by N2:NH3 plasma activated nitrogen species. Being plasma activated, the nitrogen species have short mean free paths, and therefore preferentially passivate surfaces with low aspect ratios. This aspect-ratio dependent passivation may increase an energy barrier to surface reactions with a silicon precursor, resulting in a concomitant differential in deposition rate. With N2:NH3 plasma passivation, deposited dielectric material may have a nitrogen concentration that varies by at least order of magnitude as a function of the aspect ratio of the filled gaps.

Abstract: A ground vehicle control system including a plurality of sensors and one or more predictive controllers. The sensors can be configured to detect environment information and vehicle operating information. The one or more predictive controllers can be configured to self-train for an energy consumption solution based on one or more control parameters including the environment information and the vehicle operating information.

Abstract: Reinforcement learning based ground vehicle control techniques adapted to reduce energy consumption, braking, shifting, travel distance, travel time, and or the like. The reinforcement learning techniques can include training a reinforcement learning controller based on a simulated ground vehicle environment during a simulation mode, and then further training the reinforcement learning controller based on a ground vehicle environment during an operating mode of a ground vehicle.

Abstract: Ground vehicle control techniques adapted to reduce energy consumption, braking, shifting, travel distance, travel time, and or the like. The techniques can generate a target speed window and a target vehicle performance plan for controlling operation of a ground vehicle along a current and one or more upcoming segments of a roadway responsive to the dynamic driving environment.

Abstract: Reinforcement learning based ground vehicle control techniques adapted to reduce energy consumption, braking, shifting, travel distance, travel time, and or the like. The reinforcement learning techniques can include training a reinforcement learning controller based on a simulated ground vehicle environment during a simulation mode, and then further training the reinforcement learning controller based on a ground vehicle environment during an operating mode of a ground vehicle.

Abstract: A ground vehicle control system including a plurality of sensors and one or more predictive controllers. The sensors can be configured to detect environment information and vehicle operating information. The one or more predictive controllers can be configured to self-train for an energy consumption solution based on one or more control parameters including the environment information and the vehicle operating information.

Abstract: Ground vehicle control techniques adapted to reduce energy consumption, braking, shifting, travel distance, travel time, and or the like. The techniques can generate a target speed window and a target vehicle performance plan for controlling operation of a ground vehicle along a current and one or more upcoming segments of a roadway responsive to the dynamic driving environment.

Abstract: Ground vehicle control techniques adapted to reduce energy consumption, braking, shifting, travel distance, travel time, and or the like. The techniques can generate a target speed window and a target vehicle performance plan for controlling operation of a ground vehicle along a current and one or more upcoming segments of a roadway responsive to the dynamic driving environment.

Abstract: Disclosed are curable powder coating compositions that include a film-forming resin composition that includes (a) a first film-forming resin, (b) a second film-forming resin that is different from and incompatible with the first film-forming resin, and (c) a compatibilizing agent that includes a first portion that is compatible with the first film-forming resin and a second portion that is compatible with the second film-forming resin. The compatibilizing agent is present in such compositions in an amount sufficient to result in a coating composition that, when deposited onto at least a portion of a substrate and cured, produces a mid-gloss coating.

Abstract: A coating composition, formed of a film-forming component comprising a functional group-containing resinous binder and, optionally, a crosslinking agent having at least two functional groups that are reactive with the functional groups of the film-forming component, wherein, when the composition is applied and cured to form a cured coating, the cured coating is characterized as having a bicontinuous morphology. Methods of making the coating composition and coatings prepared therefrom are also provided. The coating composition can provide improved physical properties, such as chip resistance, when incorporated into a coating.