Patents by Inventor Michael Martin Radtke

Michael Martin Radtke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of depositing a coating utilizing a coating apparatus
    Patent number: 11820700
    Abstract: A method of depositing a coating utilizing a coating apparatus includes providing a coating apparatus above a glass substrate and forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus. The fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: November 21, 2023
    Assignee: Pilkington Group Limited
    Inventors: Michael Martin Radtke, Steven Edward Phillips
  • METHOD OF DEPOSITING A COATING UTILIZING A COATING APPARATUS
    Publication number: 20210101827
    Abstract: A method of depositing a coating utilizing a coating apparatus includes providing a coating apparatus above a glass substrate and forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus. The fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.
    Type: Application
    Filed: December 18, 2020
    Publication date: April 8, 2021
    Applicant: PILKINGTON GROUP LIMITED
    Inventors: MICHAEL MARTIN RADTKE, STEVEN EDWARD PHILLIPS
  • Chemical vapor deposition process for depositing a silica coating on a glass substrate
    Patent number: 10837108
    Abstract: A CVD process for depositing a silica coating is provided. The process includes providing a float glass ribbon in a float glass manufacturing process. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger. The gaseous mixture is directed toward and along the float glass ribbon and is reacted over the float glass ribbon to form the silica coating thereon. The silica coating comprises silicon dioxide.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: November 17, 2020
    Assignee: Pilkington Group Limited
    Inventors: Douglas Martin Nelson, Michael Martin Radtke, Steven Edward Phillips
  • CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A SILICA COATING ON A GLASS SUBSTRATE
    Publication number: 20160305021
    Abstract: A CVD process for depositing a silica coating is provided. The process includes providing a float glass ribbon in a float glass manufacturing process. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger. The gaseous mixture is directed toward and along the float glass ribbon and is reacted over the float glass ribbon to form the silica coating thereon. The silica coating comprises silicon dioxide.
    Type: Application
    Filed: June 29, 2016
    Publication date: October 20, 2016
    Inventors: Douglas Martin Nelson, Michael Martin Radtke, Steven Edward Phillips
  • Chemical vapor deposition process for depositing a silica coating on a glass substrate
    Patent number: 9404179
    Abstract: A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.
    Type: Grant
    Filed: February 18, 2013
    Date of Patent: August 2, 2016
    Assignee: PILKINGTON GROUP LIMITED
    Inventors: Douglas Martin Nelson, Michael Martin Radtke, Steven Edward Phillips
  • METHOD OF DEPOSITING A COATING UTILIZING A COATING APPARATUS
    Publication number: 20160016847
    Abstract: A method of depositing a coating utilizing a coating apparatus includes providing a coating apparatus above a glass substrate and forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus. The fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.
    Type: Application
    Filed: July 16, 2013
    Publication date: January 21, 2016
    Applicant: PILKINGTON GROUP LIMITED
    Inventor: Michael Martin Radtke
  • CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A SILICA COATING ON A GLASS SUBSTRATE
    Publication number: 20150140216
    Abstract: A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.
    Type: Application
    Filed: February 18, 2013
    Publication date: May 21, 2015
    Inventors: Douglas Nelson, Michael Martin Radtke, Steven Edward Phillips