Abstract: A stand for a surgical microscope and a method for optimizing an assembly space of a surgical microscopy system are provided. The stand includes a base part, a stand part forming a c-shape structure, having a first end and a second end, and being mounted on the base part at the first end. The stand part has a hollow structure with reinforcements arranged within the hollow structure and the reinforcements extend vertically through the entire hollow structure. The stand part may include a first stand part element and a second stand part element, and the first and second stand part elements are arranged at a horizontal distance relative to one another and form together the c-shape structure. The method includes relocating electronic components from the arms to an area of the stand part thereby shifting a center of gravity of the stand.

Abstract: A stand for a surgical microscope and a method for optimizing an assembly space of a surgical microscopy system are provided. The stand includes a base part, a stand part forming a c-shape structure, having a first end and a second end, and being mounted on the base part at the first end. The stand part has a hollow structure with reinforcements arranged within the hollow structure and the reinforcements extend vertically through the entire hollow structure. The stand part may include a first stand part element and a second stand part element, and the first and second stand part elements are arranged at a horizontal distance relative to one another and form together the c-shape structure. The method includes relocating electronic components from the arms to an area of the stand part thereby shifting a center of gravity of the stand.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterised in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.

Abstract: An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterized in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.

Abstract: An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterized in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.

Abstract: There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment of a ring field, in which the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry and the extension is at least 20 mm. The objective comprises a first (S1), a second (S2), a third (S3), a fourth (S4), a fifth (S5) and a sixth mirror (S6) in centered arrangement relative to an optical axis. Each of these mirrors have an off-axis segment, in which the light beams traveling through the projection objective impinge. The diameter of the off-axis segment of the first, second, third, fourth, fifth and sixth mirrors as a function of the numerical aperture NA of the objective at the exit pupil is ?1200 mm * NA.

Abstract: In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

Abstract: An imaging device (7) in a projection exposure machine (1) for microlithography has at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41), having a linear drive (11), for manipulating the position of the optical element (10, 33, 34). The linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17). The subregions (14, 15) are interconnected at least temporarily via functional elements (18) with an active axis (17) [sic] and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).

Abstract: A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

Abstract: A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

Abstract: The invention regards to a microlithography projection objective for short wavelengths, preferably ≦193 nm, with an entrance pupil and an exit pupil for the imaging of an object field in an image field, which represents a segment of a ring field, wherein the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry, and the extension is at least 20, and preferably 25 mm.

Abstract: In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

Abstract: An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.