Abstract: A basic cell circuit architecture having plurality of cells with fixed transistors configurable for the formation of logic devices and single and dual port memory devices within a structured ASIC is provided. Different configurations of ensuing integrated circuits are achieved by forming variable interconnect layers above the fixed structures. The circuit architecture can achieve interconnection of transistors within a single cell or across multiple cells. The interconnection can be configured to form basic logic gates as well as more complex digital and analog subsystems. In addition, each cell contains a layout of transistors that can be variably coupled to achieve a memory device, such as a SRAM device. By having the capability of forming a logic circuit element, a memory device, or both, the circuit architecture is both memory-centric and logic-centric, and more fully adaptable to modern-day SoCs.

Abstract: A basic cell circuit architecture having plurality of cells with fixed transistors configurable for the formation of logic devices and single and dual port memory devices within a structured ASIC is provided. Different configurations of ensuing integrated circuits are achieved by forming variable interconnect layers above the fixed structures. The circuit architecture can achieve interconnection of transistors within a single cell or across multiple cells. The interconnection can be configured to form basic logic gates as well as more complex digital and analog subsystems. In addition, each cell contains a layout of transistors that can be variably coupled to achieve a memory device, such as a SRAM device. By having the capability of forming a logic circuit element, a memory device, or both, the circuit architecture is both memory-centric and logic-centric, and more fully adaptable to modern-day SoCs.

Abstract: A basic cell circuit architecture having plurality of cells with fixed transistors configurable for the formation of logic devices and/or single/dual port memory devices within a structured ASIC is provided. Different configurations of ensuing integrated circuits are achieved by forming variable interconnect layers above the fixed structures. The circuit architecture can achieve interconnection of transistors within a single cell and/or across multiple cells. The interconnection can be configured to form basic logic gates as well as more complex digital and analog subsystems. In addition, each cell contains a layout of transistors that can be variably coupled to achieve a memory device, such as a SRAM device. By having the capability of forming either a logic circuit element, a memory device, or both, the circuit architecture is both memory-centric and logic-centric, and more fully adaptable to modern-day SoCs.

Abstract: An integrated circuit structure for distributing power to one or more standard cells in an integrated circuit includes a first plurality of standard cells and a power mesh power connection structure coupled to the cells. Each of the standard cells includes first and second power rails adapted for connection to a voltage supply and a voltage return, respectively, of the standard cells. Each standard cell in a subset of the standard cells is arranged in direct abutment with at least two other standard cells, and at least first and second end cells are arranged in direct abutment with at least one other standard cell of the first plurality of standard cells. The power mesh power connection structure includes a plurality of conductive elements formed in a plurality of different conductive layers in the integrated circuit.

Abstract: An integrated circuit structure for distributing power to one or more standard cells in an integrated circuit includes a first plurality of standard cells and a power mesh power connection structure coupled to the cells. Each of the standard cells includes first and second power rails adapted for connection to a voltage supply and a voltage return, respectively, of the standard cells. Each standard cell in a subset of the standard cells is arranged in direct abutment with at least two other standard cells, and at least first and second end cells are arranged in direct abutment with at least one other standard cell of the first plurality of standard cells. The power mesh power connection structure includes a plurality of conductive elements formed in a plurality of different conductive layers in the integrated circuit.

Abstract: A basic cell circuit architecture having plurality of cells with fixed transistors configurable for the formation of logic devices and/or single/dual port memory devices within a structured ASIC is provided. Different configurations of ensuing integrated circuits are achieved by forming variable interconnect layers above the fixed structures. The circuit architecture can achieve interconnection of transistors within a single cell and/or across multiple cells. The interconnection can be configured to form basic logic gates as well as more complex digital and analog subsystems. In addition, each cell contains a layout of transistors that can be variably coupled to achieve a memory device, such as a SRAM device. By having the capability of forming either a logic circuit element, a memory device, or both, the circuit architecture is both memory-centric and logic-centric, and more fully adaptable to modern-day SoCs.

Abstract: A system and method for mapping Intellectual Property (IP) components onto a pre-fabricated chip slice allows a user to select a target location for placement of an IP component onto a slice. A slice definition of the pre-fabricated chip slice is searched for a legal location for the IP component that is near to the target location. The IP component is mapped to the legal location.

Abstract: A disclosed memory, such as a random access memory (RAM) has multiple banks including a first bank and a second bank each having multiple latch cells configured to store data. The first bank has a first bit line, and the second bank has a second bit line. A first tri-state buffer has an input node coupled to the first bit line, an enable node coupled to receive a first enable signal, and an output node coupled to a tri-state bit line. A second tri-state buffer has an input node coupled to the second bit line, an enable node coupled to receive a second enable signal, and an output node coupled to the tri-state bit line. Enable signal generation logic uses a portion of an address signal to generate the first and second enable signals such that the first and second enable signals are not in an active state simultaneously.

Abstract: A method and apparatus are provided for placing cells in an integrated circuit layout pattern. A base layer layout pattern defines an array of base cell locations and base layer elements, wherein at least portions of some rows in the array are reserved for decoupling capacitor cells. Each decoupling capacitor cell has a width, which is greater than that of a single base cell location and which is abstracted from the base layer layout pattern. A cell library defines a plurality of cells, including a macro cell having open rows consistent with the rows in the base layer layout pattern that are reserved for the decoupling capacitor cells. The width of each decoupling capacitor cell is abstracted from the macro cell. Cells from the cell library, including the macro cell, are placed within a design layout pattern relative to the base layer layout pattern. An area consumed by the macro cell within the design layout pattern is independent of the width of the decoupling capacitor cells.

Abstract: Base platforms customizable into ICs are designed by identifying a plurality of macros for placement on the platform, each macro being defined in part by a plurality of elements that perform respective functions of the macro. Identical elements in a plurality of macros are identified, and a common element is placed on the platform for an identical element of at least two macros. All other elements of the macros are placed at locations on the platform relative to the common element as to satisfy macro placement rules for each macro. Identical elements can be identified by identifying similar elements in a plurality of macros, and creating a common element generic to the similar elements. The user designs a metalization layer to select macros and configure common elements to the selected macros.

Abstract: An integrated circuit is provided, which includes first, second and third power supply conductors. The second power supply conductor has a higher voltage than the first power supply conductor, and the third power supply conductor has a higher voltage than the second power supply conductor. A high voltage power supply decoupling capacitor is coupled between the first and third power supply conductors. A low voltage power supply decoupling capacitor coupled between the first and second power supply conductors. A voltage reducer is coupled between the second and third power supply conductors. A plurality of semiconductor devices is biased between the first and second power supply conductors.

Abstract: A gate array integrated circuit is provided, which includes first and second voltage supply rails and a row of P-channel type transistors and adjacent N-channel type transistors located between first and second voltage supply rails. Adjacent ones of the P-channel and N-channel transistors have common control terminals. A multiple-bit memory cell is fabricated in the row and includes first and second latches, a read output, a first pass gate coupled between the first latch and the read output, and a second pass gate coupled between the second latch and the read output. The first pass gate includes a first one of the P-channel or N-channel transistors. The second pass gate includes a second one of the same type of the P-channel or N-channel transistors. The first and second same type transistors share a common diffusion region.

Abstract: A gate array integrated circuit is provided, which includes first and second voltage supply rails and a row of P-channel type transistors and adjacent N-channel type transistors located between first and second voltage supply rails. Adjacent ones of the P-channel and N-channel transistors have common control terminals. A multiple-bit memory cell is fabricated in the row and includes first and second latches, a read output, a first pass gate coupled between the first latch and the read output, and a second pass gate coupled between the second latch and the read output. The first pass gate includes a first one of the P-channel or N-channel transistors. The second pass gate includes a second one of the same type of the P-channel or N-channel transistors. The first and second same type transistors share a common diffusion region.

Abstract: A method is provided for fabricating an integrated circuit having a logical function. The method includes fabricating first and second routing layer masks and a first via mask. The first routing layer mask includes power supply segments and signal segments. The second routing layer mask includes signal segments and filler segments, wherein the filler segments are located in unused areas of the second routing layer mask. The first via mask defines vias that electrically couple the filler segments to the power supply segments. If the logical function is changed after the masks have been fabricated, a second via mask is fabricated. The second via mask decouples a filler segment from the power supply segments and couples the filler segment to a signal segment defined by the first routing layer mask to implement the logical function change. The integrated circuit is then fabricated with the first and second routing layer masks and the second via mask.

Abstract: A method is provided for fabricating an integrated circuit having a logical function. The method includes fabricating first and second routing layer masks and a first via mask. The first routing layer mask includes power supply segments and signal segments. The second routing layer mask includes signal segments and filler segments, wherein the filler segments are located in unused areas of the second routing layer mask. The first via mask defines vias that electrically couple the filler segments to the power supply segments. If the logical function is changed after the masks have been fabricated, a second via mask is fabricated. The second via mask decouples a filler segment from the power supply segments and couples the filler segment to a signal segment defined by the first routing layer mask to implement the logical function change. The integrated circuit is then fabricated with the first and second routing layer masks and the second via mask.

Abstract: A method of reducing power rail transients on integrated circuits. The power rail transients are reduced by controlling clock skew in a manner which minimizes dI/dT current demands. The method provides that the phase of the clock to latches/flip flops is shifted in order to spread out the number of simultaneous switching elements. By controlling the number of simultaneous switching devices, a significant reduction in time rate of current demanded from the power rails can be achieved, thereby reducing the magnitude of VSS/VDD voltage transients due to parasitic inductances and resistances supplying power to the integrated circuit. Theoretically, the entire timing spread of the slack graph for clock skew can be used to control the number of simultaneous switching devices.

Abstract: A method of forming a layout definition of a semiconductor integrated circuit includes generating a netlist of functionally committed standard cell instances and the electrical interconnections between the standard cell instances. The standard cell instances are then placed in a layout pattern. Also, functionally uncommitted base cells are place with the standard cell instances in the layout pattern. The base cell instances may be metalized, if needed, in later processing steps to implement design changes by adding additional logical functions.