Patents by Inventor Michael Nahum
Michael Nahum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240102784Abstract: A micrometer head displacement system includes a micrometer head and an imaging portion. The micrometer head includes a coarse scale and a fine scale. The system is configured to: acquire at least one image of the micrometer head from the imaging portion; determine a coarse measurement based at least in part on the at least one image wherein the coarse measurement corresponds to a coarse relative position between the coarse scale and a coarse fiducial line; determine a fine measurement based at least in part on the at least one image and based on calculating an interpolated position of the a fiducial line wherein the fine measurement corresponds to a fine relative position between the fine scale and the fine fiducial line; and determine a micrometer head displacement based at least in part on summing the coarse measurement with the fine measurement.Type: ApplicationFiled: September 28, 2022Publication date: March 28, 2024Inventor: Michael NAHUM
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Patent number: 11745354Abstract: A supplementary metrology position coordinates determination (SMPD) system is used with a robot. “Robot accuracy” (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of its movable arm configuration) is based on robot position sensors included in the robot. The SMPD system includes an imaging configuration and an XY scale and an alignment sensor for sensing alignment/misalignment therebetween, and an image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the movable arm configuration and the other is coupled to a stationary element (e.g., a frame above the robot). The imaging configuration acquires an image of the XY scale with known alignment/misalignment, which is utilized to determine metrology position coordinates that are indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: GrantFiled: February 16, 2021Date of Patent: September 5, 2023Assignee: Mitutoyo CorporationInventors: Kim Atherton, Casey Edward Emtman, Michael Nahum
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Publication number: 20230204340Abstract: A metrology system is provided for use with a movement system that moves an end tool (e.g., a probe). The metrology system includes a sensor configuration, a light beam source configuration and a processing portion. The sensor configuration comprises a plurality of light beam sensors. The light beam source configuration directs light beams to the light beam sensors of the sensor configuration. One of the light beam source configuration or the sensor configuration is coupled to the end tool and/or an end tool mounting configuration of the movement system which moves the end tool. The light beams that are directed to the light beam sensors cause the light beam sensors to produce corresponding measurement signals. A processing portion processes the measurement signals from the light beam sensors which indicate the position and orientation of the end tool.Type: ApplicationFiled: December 27, 2021Publication date: June 29, 2023Inventors: Joseph Daniel Tobiason, Michael Nahum, Norman Laman, Ted Staton Cook
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Publication number: 20210162601Abstract: A supplementary metrology position coordinates determination (SMPD) system is used with a robot. “Robot accuracy” (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of its movable arm configuration) is based on robot position sensors included in the robot. The SMPD system includes an imaging configuration and an XY scale and an alignment sensor for sensing alignment/misalignment therebetween, and an image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the movable arm configuration and the other is coupled to a stationary element (e.g., a frame above the robot). The imaging configuration acquires an image of the XY scale with known alignment/misalignment, which is utilized to determine metrology position coordinates that are indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: ApplicationFiled: February 16, 2021Publication date: June 3, 2021Inventors: Kim Atherton, Casey Edward Emtman, Michael Nahum
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Patent number: 11002529Abstract: A supplementary metrology position determination system is provided for use with a robot. The robot includes a movable arm configuration and a motion control system configured to control an end tool position with a robot accuracy (i.e., based on sensors included in the robot). The supplementary system includes cameras and 2D scales, each of which is attached to the movable arm configuration (e.g., as attached on arm portions and/or rotary joints). The cameras are operated to acquire images for determining relative positions of the scales. The scales may be coupled to rotary joints (e.g., as may be utilized to determine rotary motion as well as any motion transverse to a rotary axis), and/or to arm portions (e.g., as may be utilized to determine any bending or twisting of the arm portions). Such information may be utilized to achieve higher accuracy (e.g., for measurement operations and/or control of the robot, etc.).Type: GrantFiled: October 15, 2020Date of Patent: May 11, 2021Assignee: Mitutoyo CorporationInventor: Michael Nahum
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Patent number: 10913156Abstract: An end tool metrology position coordinates determination system is provided for use with a robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of a movable arm configuration of the robot) is based on using position sensors (e.g., encoders) included in the robot. The system includes the end tool, an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the end tool and the other is coupled to a stationary element (e.g., a frame located above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine a relative position that is indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: GrantFiled: September 24, 2018Date of Patent: February 9, 2021Assignee: Mitutoyo CorporationInventors: Michael Nahum, Casey Edward Emtman
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Publication number: 20210025692Abstract: A supplementary metrology position determination system is provided for use with a robot. The robot includes a movable arm configuration and a motion control system configured to control an end tool position with a robot accuracy (i.e., based on sensors included in the robot). The supplementary system includes cameras and 2D scales, each of which is attached to the movable arm configuration (e.g., as attached on arm portions and/or rotary joints). The cameras are operated to acquire images for determining relative positions of the scales. The scales may be coupled to rotary joints (e.g., as may be utilized to determine rotary motion as well as any motion transverse to a rotary axis), and/or to arm portions (e.g., as may be utilized to determine any bending or twisting of the arm portions). Such information may be utilized to achieve higher accuracy (e.g., for measurement operations and/or control of the robot, etc.).Type: ApplicationFiled: October 15, 2020Publication date: January 28, 2021Inventor: Michael Nahum
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Patent number: 10871366Abstract: A supplementary metrology position coordinates determination system is provided for use with a robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of a movable arm configuration of the robot) is based on using position sensors (e.g., encoders) included in the robot. The supplementary metrology position coordinates determination system includes an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the movable arm configuration and the other is coupled to a stationary element (e.g., a frame above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine metrology position coordinates that are indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: GrantFiled: September 28, 2018Date of Patent: December 22, 2020Assignee: Mitutoyo CorporationInventor: Michael Nahum
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Patent number: 10751883Abstract: A supplementary metrology position coordinates determination system is provided for use with an articulated robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is coupled to a robot arm portion that moves in an XY plane), is based on using position sensors (e.g., rotary encoders) included in the robot. The supplementary system includes an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the robot arm portion and the other is coupled to a stationary element (e.g., a frame located above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine a relative position that is indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: GrantFiled: August 16, 2018Date of Patent: August 25, 2020Assignee: Mitutoyo CorporationInventor: Michael Nahum
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Publication number: 20200094407Abstract: An end tool metrology position coordinates determination system is provided for use with a robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of a movable arm configuration of the robot) is based on using position sensors (e.g., encoders) included in the robot. The system includes the end tool, an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the end tool and the other is coupled to a stationary element (e.g., a frame located above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine a relative position that is indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: ApplicationFiled: September 24, 2018Publication date: March 26, 2020Inventors: Michael Nahum, Casey Edward Emtman
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Patent number: 10584955Abstract: A combined workpiece holder and calibration profile configuration (CWHACPC) is provided for integration into a surface profile measurement system. The CWHACPC may comprise at least a first calibration profile portion and a workpiece holding portion that holds a workpiece in a stable position during measurement. The first calibration profile portion comprises a plurality of reference surface regions that have known reference surface z heights or z height differences relative to one another. The first calibration profile portion and the workpiece holding portion are configured to fit within a profile scan path range of the surface profile measurement system, such that the surface profile measurement system can acquire measured surface profile data for the first calibration profile portion and the workpiece during a single pass along the profile scan path. The acquired surface profile data for the reference surface regions may be used to indicate and/or correct certain errors.Type: GrantFiled: June 29, 2018Date of Patent: March 10, 2020Assignee: Mitutoyo CorporationInventor: Michael Nahum
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Publication number: 20200056878Abstract: A supplementary metrology position coordinates determination system is provided for use with a robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of a movable arm configuration of the robot) is based on using position sensors (e.g., encoders) included in the robot. The supplementary metrology position coordinates determination system includes an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the movable arm configuration and the other is coupled to a stationary element (e.g., a frame above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine metrology position coordinates that are indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: ApplicationFiled: September 28, 2018Publication date: February 20, 2020Inventor: Michael Nahum
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Publication number: 20200055191Abstract: A supplementary metrology position coordinates determination system is provided for use with an articulated robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is coupled to a robot arm portion that moves in an XY plane), is based on using position sensors (e.g., rotary encoders) included in the robot. The supplementary system includes an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the robot arm portion and the other is coupled to a stationary element (e.g., a frame located above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine a relative position that is indicative of the end tool position, with an accuracy level that is better than the robot accuracy.Type: ApplicationFiled: August 16, 2018Publication date: February 20, 2020Inventor: Michael Nahum
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Patent number: 10527397Abstract: A first position measurement device (“FPMD”) is configured to control and operate both standalone and combined device operating modes. During the combined device operating mode, the FPMD inputs second-device measurement sample outputs provided by a second position measurement device (“SPMD”) via an inter-device communication connection. The FPMD and the SPMD are held in a fixed relationship in a workpiece measurement arrangement (e.g., with transverse measuring axes). Concurrent measurement data sets are determined as including at least a first-device measurement sample output from the FPMD and a second-device measurement sample output from the SPMD corresponding to concurrent first-device and second-device sample periods. Each concurrent measurement data set is associated with a corresponding measurement sample region on the workpiece. A combined measurement data output (e.g.Type: GrantFiled: December 27, 2017Date of Patent: January 7, 2020Assignee: Mitutoyo CorporationInventor: Michael Nahum
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Publication number: 20200003544Abstract: A combined workpiece holder and calibration profile configuration (CWHACPC) is provided for integration into a surface profile measurement system. The CWHACPC may comprise at least a first calibration profile portion and a workpiece holding portion that holds a workpiece in a stable position during measurement. The first calibration profile portion comprises a plurality of reference surface regions that have known reference surface z heights or z height differences relative to one another. The first calibration profile portion and the workpiece holding portion are configured to fit within a profile scan path range of the surface profile measurement system, such that the surface profile measurement system can acquire measured surface profile data for the first calibration profile portion and the workpiece during a single pass along the profile scan path. The acquired surface profile data for the reference surface regions may be used to indicate and/or correct certain errors.Type: ApplicationFiled: June 29, 2018Publication date: January 2, 2020Inventor: Michael Nahum
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Publication number: 20190195607Abstract: A first position measurement device (“FPMD”) is configured to control and operate both standalone and combined device operating modes. During the combined device operating mode, the FPMD inputs second-device measurement sample outputs provided by a second position measurement device (“SPMD”) via an inter-device communication connection. The FPMD and the SPMD are held in a fixed relationship in a workpiece measurement arrangement (e.g., with transverse measuring axes). Concurrent measurement data sets are determined as including at least a first-device measurement sample output from the FPMD and a second-device measurement sample output from the SPMD corresponding to concurrent first-device and second-device sample periods. Each concurrent measurement data set is associated with a corresponding measurement sample region on the workpiece. A combined measurement data output (e.g.Type: ApplicationFiled: December 27, 2017Publication date: June 27, 2019Inventor: Michael Nahum
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Patent number: 10281700Abstract: A focus state reference subsystem comprising a focus state (FS) reference object is provided for use in a variable focal length (VFL) lens system comprising a VFL lens, a controller that modulates its optical power, and a camera located along an optical path including an objective lens and the VFL lens. Reference object image light from the FS reference object is transmitted along a portion of the optical path through the VFL lens to the camera. Respective FS reference regions (FSRRs) of the FS reference object include a contrast pattern fixed at respective focus positions. A camera image that includes a best-focus image of a particular FSRR defines a best-focus reference state associated with that FSRR, wherein that best-focus reference state comprises a VFL optical power and/or effective focus position of the VFL lens system through the objective lens.Type: GrantFiled: March 29, 2018Date of Patent: May 7, 2019Assignee: Mitutoyo CorporationInventors: Michael Nahum, Joseph Andrew Summers, Robert Kamil Bryll, Paul Gerard Gladnick
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Patent number: 10171725Abstract: A focus state reference subsystem comprising a focus state reference object (FSRO) and reference object optics (ROO) is for use in a variable focal length (VFL) lens system comprising a VFL lens, a controller that modulates its optical power, and a camera located along an imaging path including an objective lens and the VFL lens. The ROO transmits image light from the FSRO along a portion of the imaging path through the VFL lens to the camera. Respective FS reference regions (FSRRs) of the FSRO include a contrast pattern fixed at respective focus positions relative to the ROO. A camera image that includes a best-focus image of a particular FSRR defines a best-focus reference state associated with that FSRR, wherein that best-focus reference state comprises a VFL optical power and/or effective focus position of the VFL lens system through the objective lens.Type: GrantFiled: December 21, 2017Date of Patent: January 1, 2019Assignee: Mitutoyo CorporationInventors: Michael Nahum, Robert Kamil Bryll, Paul Gerard Gladnick
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Patent number: 10068465Abstract: A data transmission module is provided as a battery-less accessory for attachment to portable metrology devices (e.g., handheld digital calipers, micrometers, indicators, etc.). Rather than utilizing battery resources from the metrology devices, the data transmission module utilizes energy harvested wirelessly from a remote data node (e.g., a computer system, display, etc.) to power transmission of measurement data signals to the remote data node. The data transmission module may receive sufficient power when relatively close to the remote data node, such as when a user is near the remote data node when operating the metrology device to obtain dimensional measurements of a workpiece. A wireless data generator of the data transmission module may be configured to wirelessly communicate measurement data signals using: the harvested energy; or a modulated reflection of, or coupling to, a received energy supply field from the remote data node; or a combination thereof.Type: GrantFiled: December 29, 2016Date of Patent: September 4, 2018Assignee: Mitutoyo CorporationInventor: Michael Nahum
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Patent number: 9835473Abstract: An absolute electromagnetic position encoder comprises a readhead and an absolute scale. The readhead comprises field generation and detection configuration and a readhead processor. The absolute scale comprises an active periodic signal pattern, an active absolute signal pattern, and timing and activation circuitry connected to the active signal pattern. During an energy transfer cycle, the timing and activation circuitry is configured to receive and store energy from the readhead. During a first signal generating cycle, the timing and activation circuitry is configured to drive the periodic spatially modulated signal generating element in order to generate first cycle spatially periodic signals in the first cycle field detector. During a second signal generating cycle, the timing and activation circuitry is configured to drive the first spatially modulated signal generating element in order to provide at least one corresponding second cycle signal in the readhead.Type: GrantFiled: March 31, 2016Date of Patent: December 5, 2017Assignee: Mitutoyo CorporationInventor: Michael Nahum