Abstract: Disclosed herein is a passive vapor intrusion measurement device including a barrier layer having first and second major sides; an absorbent stack disposed on a first portion of the surface of the barrier layer first major side, the absorbent stack including a first absorbent layer, an optional second absorbent layer; and spacer layer(s) disposed between the first and second (if present) absorbent layer and the barrier layer; and an adhesive disposed on a second portion of the surface of the barrier layer first major side and transversely surrounding the absorbent stack. The device is applied to a substrate in need of vapor intrusion sampling. A method of vapor intrusion analysis includes individually collecting the first and second (if present) absorbent layers after a test period; analyzing the amount of an analyte the absorbent layer(s); and subtracting the amount of the analyte in the second absorbent layer (if present) from the amount of the analyte in the first absorbent layer.

Abstract: Disclosed herein is a passive vapor intrusion measurement device including a barrier layer having first and second major sides; an absorbent stack disposed on a first portion of the surface of the barrier layer first major side, the absorbent stack including a first absorbent layer, an optional second absorbent layer; and spacer layer(s) disposed between the first and second (if present) absorbent layer and the barrier layer; and an adhesive disposed on a second portion of the surface of the barrier layer first major side and transversely surrounding the absorbent stack. The device is applied to a substrate in need of vapor intrusion sampling. A method of vapor intrusion analysis includes individually collecting the first and second (if present) absorbent layers after a test period; analyzing the amount of an analyte the absorbent layer(s); and subtracting the amount of the analyte in the second absorbent layer (if present) from the amount of the analyte in the first absorbent layer.