Patents by Inventor Michael Nuttall

Michael Nuttall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070293123
    Abstract: An indexing stunt selector for a toy vehicle track set is provided. The indexing stunt selector may be disposed along a toy vehicle track and includes a first stunt element disposed in the vehicle pathway to cause a toy vehicle to perform a first stunt, where performance of a first stunt results in actuation of a first stunt trigger. The indexing stunt selector further includes a second stunt element adapted to be automatically disposed in the vehicle pathway following actuation of the first stunt trigger.
    Type: Application
    Filed: May 4, 2007
    Publication date: December 20, 2007
    Applicant: MATTEL, INC.
    Inventors: Michael Nuttall, Harold Garner
  • Patent number: 7270123
    Abstract: A nebulizer for efficiently and reliably delivering aerosolized fluid to an inhaling patient is disclosed. The nebulizer, in one embodiment, includes a fluid channel air inlet and fluid channel air inlet valve responsive to either a manual force external of the nebulizer, or a patient's breathing, to begin the nebulization process. The nebulizer also includes a fluid return channel to a fluid source, such as a removable vial, containing fluid to be aerosolized.
    Type: Grant
    Filed: August 12, 2004
    Date of Patent: September 18, 2007
    Assignee: Trudell Medical International
    Inventors: Jerry Grychowski, Martin P. Foley, Michael Nuttall
  • Publication number: 20070083691
    Abstract: An expansion device is provided for expanding the functionality of a mobile electronic device while in a mobile mode and/or in a desktop mode. The expansion device may be a media slice that provides multimedia functionality to a mobile electronic device. The media slice may be configured to receive an electromechanical interface from the mobile electronic device and to replicate the electromechanical interface for connecting to another expansion device, such as to a docking station or a port replicator. The expansion device and the mobile electronic device may be connected via a latch mechanism that easily couples and de-couples the devices. An expansion system is also provided that includes a support stand for providing orientation and support features for a computing device and/or an expansion device.
    Type: Application
    Filed: December 11, 2006
    Publication date: April 12, 2007
    Applicant: Microsoft Corporation
    Inventors: Leroy Keely, Matthew Lerner, Seiya Ohta, John Stoddard, Jon LeFors, Michael Nuttall
  • Patent number: 7200702
    Abstract: An expansion device is provided for expanding the functionality of a mobile electronic device while in a mobile mode and/or in a desktop mode. The expansion device may be a media slice that provides multimedia functionality to a mobile electronic device. The media slice may be configured to receive an electromechanical interface from the mobile electronic device and to replicate the electromechanical interface for connecting to another expansion device, such as to a docking station or a port replicator. The expansion device and the mobile electronic device may be connected via a latch mechanism that easily couples and de-couples the devices. An expansion system is also provided that includes a support stand for providing orientation and support features for a computing device and/or an expansion device.
    Type: Grant
    Filed: February 18, 2005
    Date of Patent: April 3, 2007
    Assignee: Microsoft Corporation
    Inventors: Leroy B. Keely, Matthew R. Lerner, Seiya Ohta, John Stoddard, Jon LeFors, Michael Nuttall
  • Patent number: 7193273
    Abstract: A method of selectively forming contact regions on a substrate having a plurality of exposed regions includes selectively forming a contact region on each of the exposed regions of the substrate. During formation, each contact region has a first growth rate in a first direction and a second growth rate in a second direction. While each contact region is being selectively formed on the respective exposed region, the contact region is heated to increase the first growth rate of the contact region in the first direction relative to the second growth rate of the contact region in the second direction. The first growth rate may be a vertical growth rate and the second growth rate may be a lateral growth rate. The contact may be heated by applying electromagnetic radiation to an upper surface of the substrate and not applying the radiation to the vertical portions of the contact region to thereby increase the vertical growth rate relative to the lateral growth rate.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: March 20, 2007
    Assignee: Micron Technology, Inc.
    Inventors: Michael Nuttall, Garry Anthony Mercaldi
  • Publication number: 20060275983
    Abstract: Structures and methods for making a semiconductor structure are discussed. The semiconductor structure includes a rough surface having protrusions formed from an undoped silicon film. If the semiconductor structure is a capacitor, the protrusions help to increase the capacitance of the capacitor. The semiconductor structure also includes a relatively smooth surface abutting the rough surface, wherein the relatively smooth surface is formed from a polycrystalline material.
    Type: Application
    Filed: August 9, 2006
    Publication date: December 7, 2006
    Inventors: Randhir Thakur, Garry Mercaldi, Michael Nuttall, Shenlin Chen, Er-Xuan Ping
  • Publication number: 20060217627
    Abstract: A peak flow meter is described with a body having a sample channel and at least one bypass channel. One of at least two flow range scales may be selected using a flow range selector to adjust the sensitivity of the peak flow meter. A flow range selection indicator provides visual reference as to which flow range scale has been selected. A peak flow calculator used in cooperation with zone indicators on the peak flow meter permits a user to customize the peak flow meter for that user's predicted personal best exhalation range.
    Type: Application
    Filed: March 16, 2006
    Publication date: September 28, 2006
    Inventor: Michael Nuttall
  • Patent number: 7101756
    Abstract: Structures and methods for making a semiconductor structure are discussed. The semiconductor structure includes a rough surface having protrusions formed from an undoped silicon film. If the semiconductor structure is a capacitor, the protrusions help to increase the capacitance of the capacitor. The semiconductor structure also includes a relatively smooth surface abutting the rough surface, wherein the relatively smooth surface is formed from a polycrystalline material.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: September 5, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Randhir P. S. Thakur, Garry A. Mercaldi, Michael Nuttall, Shenlin Chen, Er-Xuan Ping
  • Publication number: 20060190652
    Abstract: An expansion device is provided for expanding the functionality of a mobile electronic device while in a mobile mode and/or in a desktop mode. The expansion device may be a media slice that provides multimedia functionality to a mobile electronic device. The media slice may be configured to receive an electromechanical interface from the mobile electronic device and to replicate the electromechanical interface for connecting to another expansion device, such as to a docking station or a port replicator. The expansion device and the mobile electronic device may be connected via a latch mechanism that easily couples and de-couples the devices. An expansion system is also provided that includes a support stand for providing orientation and support features for a computing device and/or an expansion device.
    Type: Application
    Filed: February 18, 2005
    Publication date: August 24, 2006
    Applicant: Microsoft Corporation
    Inventors: Leroy Keely, Matthew Lerner, Seiya Ohta, John Stoddard, Jon LeFors, Michael Nuttall
  • Patent number: 7087490
    Abstract: A dielectric insulating composite for insulating a floating gate from a control gate in a non-volatile memory is described. A material, such as an undoped polysilicon, amorphous silicon, or amorphous polysilicon or a silicon rich nitride, is inserted in the gate structure. The oxide film that results from the oxidation of these films is relatively free from impurities. As a result, charge leakage between the floating gate and control gate is reduced.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: August 8, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Michael Nuttall, Garry A. Mercaldi
  • Patent number: 7049231
    Abstract: In but one aspect of the invention, a method of depositing polysilicon comprises providing a substrate within a chemical vapor deposition reactor, with the substrate having an exposed substantially crystalline region and an exposed substantially amorphous region. A gaseous precursor comprising silicon is fed to the chemical vapor deposition reactor under conditions effective to substantially selectively deposit polysilicon on the crystalline region and not the amorphous region. In another aspect a method of fabricating a field effect transistor on a substrate comprises forming a gate dielectric layer and a gate over semiconductive material. Doped source/drain regions are formed within semiconductive material laterally proximate the gate. Substantially amorphous insulating material is formed over and laterally proximate the gate. The substrate is provided within a chemical vapor deposition reactor.
    Type: Grant
    Filed: June 7, 2004
    Date of Patent: May 23, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Michael Nuttall, Er-Xuan Ping, Yongjun Jeff Hu
  • Patent number: 7034353
    Abstract: Structures and methods for making a semiconductor structure are discussed. The semiconductor structure includes a rough surface having protrusions formed from an undoped silicon film. If the semiconductor structure is a capacitor, the protrusions help to increase the capacitance of the capacitor. The semiconductor structure also includes a relatively smooth surface abutting the rough surface, wherein the relatively smooth surface is formed from a polycrystalline material.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: April 25, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Randhir P. S. Thakur, Garry A. Mercaldi, Michael Nuttall, Shenlin Chen, Er-Xuan Ping
  • Publication number: 20060079150
    Abstract: Disclosed is a toy, comprising of rotating means for collecting and dispersing an item and power means coupled to said rotating means, said power means powering said rotating means at a first speed in a first direction to collect said toy, and powering said rotating means at a second speed in a second direction to disperse said toy, said first speed different from said second speed, and said first direction different from said second direction.
    Type: Application
    Filed: October 8, 2004
    Publication date: April 13, 2006
    Inventors: Miva Filoseta, Eric So, Dave Sheltman, Michael Nuttall
  • Patent number: 7008845
    Abstract: A dielectric insulating composite for insulating a floating gate from a control gate in a non-volatile memory is described. A material, such as an undoped polysilicon, amorphous silicon, or amorphous polysilicon or a silicon rich nitride, is inserted in the gate structure. The oxide film that results from the oxidation of these films is relatively free from impurities. As a result, charge leakage between the floating gate and control gate is reduced.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: March 7, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Michael Nuttall, Garry A. Mercaldi
  • Publication number: 20060019442
    Abstract: A method of forming a capacitor includes forming a first capacitor electrode over a substrate. A substantially crystalline capacitor dielectric layer is formed over the first capacitor electrode. The substrate with the substantially crystalline capacitor dielectric layer is provided within a chemical vapor deposition reactor. Such substrate has an exposed substantially amorphous material. A gaseous precursor comprising silicon is fed to the chemical vapor deposition reactor under conditions effective to substantially selectively deposit polysilicon on the substantially crystalline capacitor dielectric layer relative to the exposed substantially amorphous material, and the polysilicon is formed into a second capacitor electrode.
    Type: Application
    Filed: September 23, 2005
    Publication date: January 26, 2006
    Inventors: Michael Nuttall, Er-Xuan Ping, Yongjun Hu
  • Publication number: 20060019475
    Abstract: A method of depositing polysilicon includes positioning a substrate within a chemical vapor deposition reactor. The substrate has an exposed substantially crystalline region and an exposed substantially amorphous region. A gaseous precursor comprising silicon is fed to the chemical vapor deposition reactor to provide a reactive atmosphere under conditions effective to substantially selectively deposit polysilicon on the crystalline region relative to the amorphous region. The reactive atmosphere during the depositing consists essentially of a gaseous silane precursor.
    Type: Application
    Filed: September 23, 2005
    Publication date: January 26, 2006
    Inventors: Michael Nuttall, Er-Xuan Ping, Yongjun Hu
  • Publication number: 20050081844
    Abstract: A nebulizer for efficiently and reliably delivering aerosolized fluid to an inhaling patient is disclosed. The nebulizer, in one embodiment, includes a fluid channel air inlet and fluid channel air inlet valve responsive to either a manual force external of the nebulizer, or a patient's breathing, to begin the nebulization process. The nebulizer also includes a fluid return channel to a fluid source, such as a removable vial, containing fluid to be aerosolized.
    Type: Application
    Filed: August 12, 2004
    Publication date: April 21, 2005
    Inventors: Jerry Grychowski, Martin Foley, Michael Nuttall
  • Publication number: 20050026370
    Abstract: A dielectric insulating composite for insulating a floating gate from a control gate in a non-volatile memory is described. A material, such as an undoped polysilicon, amorphous silicon, or amorphous polysilicon or a silicon rich nitride, is inserted in the gate structure. The oxide film that results from the oxidation of these films is relatively free from impurities. As a result, charge leakage between the floating gate and control gate is reduced.
    Type: Application
    Filed: August 31, 2004
    Publication date: February 3, 2005
    Inventors: Michael Nuttall, Garry Mercaldi
  • Publication number: 20040224485
    Abstract: In but one aspect of the invention, a method of depositing polysilicon comprises providing a substrate within a chemical vapor deposition reactor, with the substrate having an exposed substantially crystalline region and an exposed substantially amorphous region. A gaseous precursor comprising silicon is fed to the chemical vapor deposition reactor under conditions effective to substantially selectively deposit polysilicon on the crystalline region and not the amorphous region. In another aspect a method of fabricating a field effect transistor on a substrate comprises forming a gate dielectric layer and a gate over semiconductive material. Doped source/drain regions are formed within semiconductive material laterally proximate the gate. Substantially amorphous insulating material is formed over and laterally proximate the gate. The substrate is provided within a chemical vapor deposition reactor.
    Type: Application
    Filed: June 7, 2004
    Publication date: November 11, 2004
    Inventors: Michael Nuttall, Er-Xuan Ping, Yongjun Jeff Hu
  • Publication number: 20040209426
    Abstract: A dielectric insulating composite for insulating a floating gate from a control gate in a non-volatile memory is described. A material, such as an undoped polysilicon, amorphous silicon, or amorphous polysilicon or a silicon rich nitride, is inserted in the gate structure. The oxide film that results from the oxidation of these films is relatively free from impurities. As a result, charge leakage between the floating gate and control gate is reduced.
    Type: Application
    Filed: May 10, 2004
    Publication date: October 21, 2004
    Applicant: Micron Technology, Inc.
    Inventors: Michael Nuttall, Garry A. Mercaldi