Abstract: A processing tool is provided that has a reaction chamber, a base, a flange, and an adjuster. The flange is coupled between the reaction chamber and the base and may be used to quickly connect/disconnect the reaction chamber for maintenance. The flange has a first, second and third bore extending therein. The first bore opens onto a first surface thereof, and the second and third bores open onto a second surface thereof. The reaction chamber is mounted to the flange via a first connector extending into the first opening, and the base is mounted to the flange via a second connector extending into the second opening. At least the second surface of said flange is accessible with the reaction chamber, base and flange in an assembled configuration. The adjuster extends through the base and into the third bore in the flange. The adjuster is adapted to cause movement of the flange in first and second opposite directions in response to movement thereof.

Abstract: A chromator for monitoring the end point of a plasma etching process is placed remotely from the window of a plasma etching chamber and is optically coupled to the window with a fiber optic cable bundle. The fiber optic cable bundle includes a first and a second bracket. Each bracket is specially designed to be compatible with existing chromator and plasma etching chambers. The first bracket, which attaches to the chamber, includes a plurality of slots for allowing the bracket to be axially and vertically adjusted to find the optimal optical point. Accordingly, the likelihood of the chromator properly detecting the end point is maximized. An inventive method a includes optically coupling the remotely located chromator by connecting a fiber optic cable bundle having a first bracket to the chamber, axially adjusting the bracket to find the optimal location for detecting the end point, and securing the first bracket to the chamber. The second bracket of the fiber optic cable bundle is connected to a chromator.